Synthesis and Some Properties of Fibrous Silicon Nitride PDF Download
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Author: Robert C. Johnson
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 34
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Book Description
Author: Robert C. Johnson
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 34
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Book Description
Author: Robert C. Johnson
Publisher:
ISBN:
Category :
Languages : en
Pages : 25
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Book Description
Author: Emiliano Jose Hierra
Publisher: Nova Science Publishers
ISBN: 9781619428652
Category : Silicon nitride
Languages : en
Pages : 0
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Book Description
Silicon nitride (Si3N4) ceramic is used in numerous applications because of its superior properties, such as high-temperature strength, good oxidation resistance and low thermal expansion coefficient. In this book, the authors present current research in the study of the synthesis, properties and applications of silicon nitride. Topics include the optical and vibration properties of silicon rich nitride; high temperature oxidation of silicon nitride based ceramics; low temperature preparation of phosphate bonded silicon nitride ceramics with high mechanical strength; the SPS-sintering process and use of ceramics for high-temperature engineering applications; synthesis and properties of silicon nitride coatings; and the use of silicon nitride as biomaterial.
Author:
Publisher:
ISBN:
Category : Mineral industries
Languages : en
Pages : 874
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Book Description
Author: A. Gene Collins
Publisher:
ISBN:
Category : Beryl
Languages : en
Pages : 680
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Book Description
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704
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Book Description
Author: Ramesh Raghunathan
Publisher:
ISBN:
Category :
Languages : en
Pages : 942
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Book Description
Author: John T. Milek
Publisher: Springer Science & Business Media
ISBN: 1468461621
Category : Technology & Engineering
Languages : en
Pages : 126
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Book Description
The large amount of literature on the technology of thin film silicon nitride indi cates the interest of the Department of Defense, NASA and the semiconductor industry in the development and full utilization of the material. This survey is concerned only with the thin film characteristics and properties of silicon nitride as currently utilized by the semiconductor or microelectronics industry. It also includes the various methods of preparation. Applications in microelectronic devices and circuits are to be provided in Part 2 of the survey. Some bulk silicon nitride property data is included for basic reference and comparison purposes. The survey specifically excludes references and information not within the public domain. ACKNOWLEDGEMENT This survey was generated under U.S. Air Force Contract F33615-70-C-1348, with Mr. B.R. Emrich (MAAM) Air Force Materials Laboratory, Wright-Patterson Air Force Base, Ohio acting as Project Engineer. The author would like to acknowledge the assis tance of Dr. Judd Q. Bartling, Litton Systems, Inc., Guidance and Control Systems Division, Woodland Hills, California and Dr. Thomas C. Hall, Hughes Aircraft Company, Culver City, California in reviewing the survey. v CONTENTS Preface. i Introduction 1 Literature Review. 1 Bulk Characteristics 1 Technology Overview. 2 References 4 Methods of Preparation • 5 Introduction • 5 Direct Nitridation Method 8 Evaporation Method • 9 Glow Discharge Method. 10 Ion Beam Method. 13 Sputtering Methods 13 Pyrolytic Methods. 15 Silane and Ammonia Reaction 15 Silicon Tetrachloride and Tetrafluoride Reaction. 24 Silane and Hydrazine Reaction 27 Production Operations. 28 Equipment.
Author: United States. Bureau of Mines
Publisher:
ISBN:
Category : Mineral industries
Languages : en
Pages : 308
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Book Description
Author: United States. Superintendent of Documents
Publisher:
ISBN:
Category : United States
Languages : en
Pages : 1250
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Book Description
