Bulk Gallium Nitride Growth and Characterization PDF Download
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Author: P. Phanikumar Konkapaka
Publisher:
ISBN: 9780542350719
Category :
Languages : en
Pages : 131
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Book Description
It was found that kinetics of decomposition of pure GaN powder without oxygen resulted in incongruent evaporation leading to the formation of the liquid gallium in the powder. A flow through configuration was also used because of its high collection efficiency of growth species. A mixture of Ga 2O3 and carbon powder as well as commercial GaN powder was used as precursors of gallium suboxide in this configuration. This configuration also demonstrated growth rates that are comparable to flow over configuration.
Author: P. Phanikumar Konkapaka
Publisher:
ISBN: 9780542350719
Category :
Languages : en
Pages : 131
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Book Description
It was found that kinetics of decomposition of pure GaN powder without oxygen resulted in incongruent evaporation leading to the formation of the liquid gallium in the powder. A flow through configuration was also used because of its high collection efficiency of growth species. A mixture of Ga 2O3 and carbon powder as well as commercial GaN powder was used as precursors of gallium suboxide in this configuration. This configuration also demonstrated growth rates that are comparable to flow over configuration.
Author: Dirk Ehrentraut
Publisher: Springer Science & Business Media
ISBN: 3642048307
Category : Science
Languages : en
Pages : 337
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Book Description
This book discusses the important technological aspects of the growth of GaN single crystals by HVPE, MOCVD, ammonothermal and flux methods for the purpose of free-standing GaN wafer production.
Author: Cengiz Mustafa Balkas
Publisher:
ISBN:
Category :
Languages : en
Pages : 262
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Book Description
Author: Michael Shur
Publisher: World Scientific
ISBN: 9789812562364
Category : Technology & Engineering
Languages : en
Pages : 310
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Book Description
The unique materials properties of GaN-based semiconductors havestimulated a great deal of interest in research and developmentregarding nitride materials growth and optoelectronic andnitride-based electronic devices. High electron mobility andsaturation velocity, high sheet carrier concentration atheterojunction interfaces, high breakdown field, and low thermalimpedance of GaN-based films grown over SiC or bulk AlN substratesmake nitride-based electronic devices very promising.
Author: Biemann Alexander Martin
Publisher:
ISBN:
Category :
Languages : en
Pages : 208
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Book Description
Group III-nitrides, and in particular, aluminum nitride (AIN), gallium nitride (GaN), and indium nitride (InN) make up a class of compound semiconductors with direct bandgaps ranging from 1.2 electron volts to 6.2 electron volts (eV). They afford a broad range of applications including light emitting diodes (LED's) and laser diodes (LD's) emitting from the visible to the ultraviolet (UV) portions of the electromagnetic spectrum, radiation detectors, and high power, high frequency electronic devices capable of operating at high temperatures, and in hostile chemical environments. Materials studied in this work were grown on silicon substrates, Si(111) by Molecular Beam Epitaxy (MBE) under a broad range of growth parameters and characterized using X-ray diffraction (XRD), Energy Dispersive Spectroscopy (EDS), Atomic Force Microscopy (AFM), Photoluminescence (PL), and four-point probe resistivity measurements. Growth began with deposition of 0.3 monolayer (ML) of Al on the Si(111)7x7 surface leading to fully passivated Si(111) [root of]3x[root of]3-Al surface. Next, an AIN buffer layer and then the GaN layers were deposited. X-ray measurements indicated growth of single-crystalline hexagonal GaN(001) while PL measurement demonstrated a peak position corresponding to bulk hexagonal-GaN. Sample morphology and resistivity showed a strong dependence on growth conditions. The layer RMS roughness increased with increasing thickness for samples grown with low atomic-nitrogen (N) to molecular N ratio while smoother layers were obtained at the highest atomic N concentrations. Un-intentionally doped layers were n-type. P-type doping was achieved by doping with Mg.
Author: Hongyu Yu
Publisher: CRC Press
ISBN: 1351767607
Category : Science
Languages : en
Pages : 301
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Book Description
GaN is considered the most promising material candidate in next-generation power device applications, owing to its unique material properties, for example, bandgap, high breakdown field, and high electron mobility. Therefore, GaN power device technologies are listed as the top priority to be developed in many countries, including the United States, the European Union, Japan, and China. This book presents a comprehensive overview of GaN power device technologies, for example, material growth, property analysis, device structure design, fabrication process, reliability, failure analysis, and packaging. It provides useful information to both students and researchers in academic and related industries working on GaN power devices. GaN wafer growth technology is from Enkris Semiconductor, currently one of the leading players in commercial GaN wafers. Chapters 3 and 7, on the GaN transistor fabrication process and GaN vertical power devices, are edited by Dr. Zhihong Liu, who has been working on GaN devices for more than ten years. Chapters 2 and 5, on the characteristics of polarization effects and the original demonstration of AlGaN/GaN heterojunction field-effect transistors, are written by researchers from Southwest Jiaotong University. Chapters 6, 8, and 9, on surface passivation, reliability, and package technologies, are edited by a group of researchers from the Southern University of Science and Technology of China.
Author: Michael A. Mastro
Publisher:
ISBN:
Category :
Languages : en
Pages : 330
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 21
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Book Description
This report was developed under STTR contract for topic "A06-T019". Inlustra Technologies and the University of California, Santa Barbara conducted a Phase I STTR research program to grow and characterize thick non-polar and semi-polar gallium nitride (GaN) wafers that will act as seeds for subsequent GaN boule growth in Phase II. Inlustra developed non-polar a-plane and m-plane GaN films with smooth surfaces and minimal wafer bowing and cracking. The growth conditions for each crystallographic plane were primarily optimized with respect to surface morphology. Defect reduction methods were then applied to achieve low average extended defect density across the seed wafers. UCSB researchers conducted detailed microstructural characterization on these non-polar and semi-polar GaN thick films to evaluate their utility as seeds for equiaxed GaN boule growth in Phase II.
Author: Chih-Hsun Wei
Publisher:
ISBN: 9780599613294
Category :
Languages : en
Pages : 131
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Book Description
Author: Wengang (Wayne) Bi
Publisher: CRC Press
ISBN: 1351648055
Category : Science
Languages : en
Pages : 775
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Book Description
This book addresses material growth, device fabrication, device application, and commercialization of energy-efficient white light-emitting diodes (LEDs), laser diodes, and power electronics devices. It begins with an overview on basics of semiconductor materials, physics, growth and characterization techniques, followed by detailed discussion of advantages, drawbacks, design issues, processing, applications, and key challenges for state of the art GaN-based devices. It includes state of the art material synthesis techniques with an overview on growth technologies for emerging bulk or free standing GaN and AlN substrates and their applications in electronics, detection, sensing, optoelectronics and photonics. Wengang (Wayne) Bi is Distinguished Chair Professor and Associate Dean in the College of Information and Electrical Engineering at Hebei University of Technology in Tianjin, China. Hao-chung (Henry) Kuo is Distinguished Professor and Associate Director of the Photonics Center at National Chiao-Tung University, Hsin-Tsu, Taiwan, China. Pei-Cheng Ku is an associate professor in the Department of Electrical Engineering & Computer Science at the University of Michigan, Ann Arbor, USA. Bo Shen is the Cheung Kong Professor at Peking University in China.
