Author: A. J. Purdes
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 698
Book Description
Proceedings of the Second International Symposium on Diamond Materials
Author: A. J. Purdes
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 698
Book Description
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 698
Book Description
Proceedings of the Second International Symposium on Electrochemical Processing of Tailored Materials
Author: R. C. Alkire
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 308
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 308
Book Description
Proceedings of the Third International Symposium on Diamond Materials
Author: John P. Dismukes
Publisher: The Electrochemical Society
ISBN: 9781566770606
Category : Nature
Languages : en
Pages : 1126
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566770606
Category : Nature
Languages : en
Pages : 1126
Book Description
Diamond: Electronic Properties and Applications
Author: Lawrence S. Pan
Publisher: Springer Science & Business Media
ISBN: 1461522579
Category : Technology & Engineering
Languages : en
Pages : 482
Book Description
The use of diamond for electronic applications is not a new idea. As early as the 1920's diamonds were considered for their use as photoconductive detectors. However limitations in size and control of properties naturally limited the use of diamond to a few specialty applications. With the development of diamond synthesis from the vapor phase has come a more serious interest in developing diamond-based electronic devices. A unique combination of extreme properties makes diamond partiCularly well suited for high speed, high power, and high temperature applications. Vapor phase deposition of diamond allows large area films to be deposited, whose properties can potentially be controlled. Since the process of diamond synthesis was first realized, great progress have been made in understanding the issues important for growing diamond and fabricating electronic devices. The quality of both intrinsic and doped diamond has improved greatly to the point that viable applications are being developed. Our understanding of the properties and limitations has also improved greatly. While a number of excellent references review the general properties of diamond, this volume summarizes the great deal of literature related only to electronic properties and applications of diamond. We concentrate only on diamond; related materials such as diamond-like carbon (DLC) and other wide bandgap semiconductors are not treated here. In the first chapter Profs. C. Y. Fong and B. M. Klein discuss the band structure of single-crystal diamond and its relation to electronic properties.
Publisher: Springer Science & Business Media
ISBN: 1461522579
Category : Technology & Engineering
Languages : en
Pages : 482
Book Description
The use of diamond for electronic applications is not a new idea. As early as the 1920's diamonds were considered for their use as photoconductive detectors. However limitations in size and control of properties naturally limited the use of diamond to a few specialty applications. With the development of diamond synthesis from the vapor phase has come a more serious interest in developing diamond-based electronic devices. A unique combination of extreme properties makes diamond partiCularly well suited for high speed, high power, and high temperature applications. Vapor phase deposition of diamond allows large area films to be deposited, whose properties can potentially be controlled. Since the process of diamond synthesis was first realized, great progress have been made in understanding the issues important for growing diamond and fabricating electronic devices. The quality of both intrinsic and doped diamond has improved greatly to the point that viable applications are being developed. Our understanding of the properties and limitations has also improved greatly. While a number of excellent references review the general properties of diamond, this volume summarizes the great deal of literature related only to electronic properties and applications of diamond. We concentrate only on diamond; related materials such as diamond-like carbon (DLC) and other wide bandgap semiconductors are not treated here. In the first chapter Profs. C. Y. Fong and B. M. Klein discuss the band structure of single-crystal diamond and its relation to electronic properties.
Proceedings of the 26th Intersociety Energy Conversion Engineering Conference
Author:
Publisher:
ISBN:
Category : Direct energy conversion
Languages : en
Pages : 672
Book Description
Publisher:
ISBN:
Category : Direct energy conversion
Languages : en
Pages : 672
Book Description
Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
Author: M. Meyyappan
Publisher: The Electrochemical Society
ISBN: 9781566771368
Category : Technology & Engineering
Languages : en
Pages : 366
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771368
Category : Technology & Engineering
Languages : en
Pages : 366
Book Description
Optical Diagnostics for Thin Film Processing
Author: Irving P. Herman
Publisher: Elsevier
ISBN: 0080538088
Category : Technology & Engineering
Languages : en
Pages : 815
Book Description
This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. - The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing - Useful as an introduction to the subject or as a resource handbook - Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing - Examples emphasize applications in microelectronics and optoelectronics - Introductory chapter serves as a guide to all optical diagnostics and their applications - Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic
Publisher: Elsevier
ISBN: 0080538088
Category : Technology & Engineering
Languages : en
Pages : 815
Book Description
This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. - The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing - Useful as an introduction to the subject or as a resource handbook - Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing - Examples emphasize applications in microelectronics and optoelectronics - Introductory chapter serves as a guide to all optical diagnostics and their applications - Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic
Proceedings of the Second International Conference on Long Wavelength Infrared Dectectors and Arrays, Physics and Applications
Author: V. Swaminathan
Publisher: The Electrochemical Society
ISBN: 9781566770897
Category : Science
Languages : en
Pages : 276
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566770897
Category : Science
Languages : en
Pages : 276
Book Description
The Cumulative Book Index
Author:
Publisher:
ISBN:
Category : American literature
Languages : en
Pages : 2266
Book Description
Publisher:
ISBN:
Category : American literature
Languages : en
Pages : 2266
Book Description
Thermal Plasma Torches and Technologies
Author: O. P. Solonenko
Publisher: Cambridge Int Science Publishing
ISBN: 1898326592
Category : Science
Languages : en
Pages : 397
Book Description
Volume 1 of a two-volume work publishes studies of scientific from a number of countries in the area of plasma torch design and properties. Topics covered include mathematical modelling of transformer discharge, physical phenomena in a hollow cathode, modelling of electric arc plasma, problems of turbulent arc modelling, erosion of multiarc cathodes, integrated methods of research of processes in thermal plasma, trends in thermal plasma technology, plasma metallurgy, analysis of induction plasma systems, and many others.
Publisher: Cambridge Int Science Publishing
ISBN: 1898326592
Category : Science
Languages : en
Pages : 397
Book Description
Volume 1 of a two-volume work publishes studies of scientific from a number of countries in the area of plasma torch design and properties. Topics covered include mathematical modelling of transformer discharge, physical phenomena in a hollow cathode, modelling of electric arc plasma, problems of turbulent arc modelling, erosion of multiarc cathodes, integrated methods of research of processes in thermal plasma, trends in thermal plasma technology, plasma metallurgy, analysis of induction plasma systems, and many others.