Power Recovery of Radiation Damaged MOCVD Grown Indium Phosphide on Silicon Solar Cells Through Argon-ion Laser Annealing

Power Recovery of Radiation Damaged MOCVD Grown Indium Phosphide on Silicon Solar Cells Through Argon-ion Laser Annealing PDF Author: Lynn L. Boyer
Publisher:
ISBN:
Category :
Languages : en
Pages : 133

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Book Description
This thesis reports the results of a laser annealing technique used to remove defect sites from radiation damaged indium phosphide on silicon MOCVD grown solar cells. This involves the illumination of damaged solar cells with a continuous wave laser to produce a large forward-biased current. The InP/Si cells were irradiated with 1 MeV electrons to a given fluence, and tested for degradation. Light from an argon laser was used to illuminate four cells with an irradiance of 2.5 W/sq cm, producing a current density 3 to 5 times larger than AMO conditions. Cells were annealed at 19 deg C with the laser and at 25 deg C under AMO conditions. Annealing under laser illumination of n/p-type cells resulted in recovery of 48%. P/n type cells lost 4 to 12% of the assumed degradaton. Annealing under AMO conditions resulted in power recovery of 70% in n/p type cells. P/n-type cells recovered approximately 16% of lost power. Results indicate that significant power recovery results from the annealing of defects within n/p type InP/Si solar cells. Distribution Limitation(s).

Power Recovery of Radiation Damaged MOCVD Grown Indium Phosphide on Silicon Solar Cells Through Argon-ion Laser Annealing

Power Recovery of Radiation Damaged MOCVD Grown Indium Phosphide on Silicon Solar Cells Through Argon-ion Laser Annealing PDF Author: Lynn L. Boyer
Publisher:
ISBN:
Category :
Languages : en
Pages : 133

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Book Description
This thesis reports the results of a laser annealing technique used to remove defect sites from radiation damaged indium phosphide on silicon MOCVD grown solar cells. This involves the illumination of damaged solar cells with a continuous wave laser to produce a large forward-biased current. The InP/Si cells were irradiated with 1 MeV electrons to a given fluence, and tested for degradation. Light from an argon laser was used to illuminate four cells with an irradiance of 2.5 W/sq cm, producing a current density 3 to 5 times larger than AMO conditions. Cells were annealed at 19 deg C with the laser and at 25 deg C under AMO conditions. Annealing under laser illumination of n/p-type cells resulted in recovery of 48%. P/n type cells lost 4 to 12% of the assumed degradaton. Annealing under AMO conditions resulted in power recovery of 70% in n/p type cells. P/n-type cells recovered approximately 16% of lost power. Results indicate that significant power recovery results from the annealing of defects within n/p type InP/Si solar cells. Distribution Limitation(s).

Power Recovery of Radiation Damaged MOCVD Grown Indium Phosphide on Silicon Solar Cells Through Argon-Ion Laser Annealing

Power Recovery of Radiation Damaged MOCVD Grown Indium Phosphide on Silicon Solar Cells Through Argon-Ion Laser Annealing PDF Author: Lynn L. Boyer
Publisher:
ISBN: 9781423584957
Category :
Languages : en
Pages : 149

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Book Description
This thesis reports the results of a laser annealing technique used to remove defect sites from radiation damaged indium phosphide on silicon MOCVD grown solar cells. This involves the illumination of damaged solar cells with a continuous wave laser to produce a large forward-biased current. The InP/Si cells were irradiated with 1 MeV electrons to a given fluence, and tested for degradation. Light from an argon laser was used to illuminate four cells with an irradiance of 2.5 W/sq cm, producing a current density 3 to 5 times larger than AMO conditions. Cells were annealed at 19 deg C with the laser and at 25 deg C under AMO conditions. Annealing under laser illumination of n/p-type cells resulted in recovery of 48%. P/n type cells lost 4 to 12% of the assumed degradaton. Annealing under AMO conditions resulted in power recovery of 70% in n/p type cells. P/n-type cells recovered approximately 16% of lost power. Results indicate that significant power recovery results from the annealing of defects within n/p type InP/Si solar cells.

Annealing of Defect Sites in Radiation Damaged Indium Phosphide Solar Cells Through Laser Illumination

Annealing of Defect Sites in Radiation Damaged Indium Phosphide Solar Cells Through Laser Illumination PDF Author: Charles T. Chase
Publisher:
ISBN:
Category :
Languages : en
Pages : 113

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Book Description
This thesis reports the results of a laser annealing technique used to remove defect sites from radiation damaged indium phosphide diffused junction solar cells. This involves the illumination of damaged solar cells with a continuous wave laser to produce a moderate heating and a large forward-biased current. The InP cells were irradiated with 27 MeV electrons to a given fluence, and tested for degradation. Light from an argon laser was used to illuminate each cell with an irradiance of 2.5 W/sq cm, producing a current density 7 to 10 times larger than under AMO conditions. Cells were annealed at 48.5 deg C, 60 deg C, and 75 deg C for periods of 15 to 60 minutes, and cooled to 25 deg C for power recovery determination. Annealing at 48.5 deg C resulted in a recovery of 17 to 18% of the power lost due to irradiation, and annealing cells at 60 deg C produced a recovery of 43 to 48%. A single test of the technique at 75 deg C produced a net recovery of only 21% of the power lost. These results indicate that significant power recovery results from the annealing of defects within InP solar cells. Continuing research should involve the repeating of the test at 75 deg C, and irradiations with electrons or protons of energies expected in the space environment.

Masters Theses in the Pure and Applied Sciences Accepted by Colleges and Universities of the United States and Canada

Masters Theses in the Pure and Applied Sciences Accepted by Colleges and Universities of the United States and Canada PDF Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 442

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Book Description


Government Reports Annual Index

Government Reports Annual Index PDF Author:
Publisher:
ISBN:
Category : Research
Languages : en
Pages : 1686

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Book Description
Sections 1-2. Keyword Index.--Section 3. Personal author index.--Section 4. Corporate author index.-- Section 5. Contract/grant number index, NTIS order/report number index 1-E.--Section 6. NTIS order/report number index F-Z.

Laser Annealing of Ion Implanted CZ Silicon for Solar Cell Junction Formation

Laser Annealing of Ion Implanted CZ Silicon for Solar Cell Junction Formation PDF Author: J. S. Katzeff
Publisher:
ISBN:
Category : Silicon solar cells
Languages : en
Pages : 36

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Book Description


Laser Annealing of Amorphous/Poly

Laser Annealing of Amorphous/Poly PDF Author: National Aeronautics and Space Administration (NASA)
Publisher: Createspace Independent Publishing Platform
ISBN: 9781722334758
Category :
Languages : en
Pages : 32

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Book Description
The preliminary design proposed for the microelectronics materials processing equipment is presented. An overall mission profile, description of all processing steps, analysis methods and measurement techniques, data acquisition and storage, and a preview of the experimental hardware are included. The goal of the project is to investigate the viability of material processing of semiconductor microelectronics materials in a micro-gravity environment. The two key processes are examined: (1) Rapid Thermal Annealing (RTA) of semiconductor thin films and damaged solar cells, and (2) thin film deposition using a filament evaporator. The RTA process will be used to obtain higher quality crystalline properties from amorphous/poly-silicon films. RTA methods can also be used to repair radiation-damaged solar cells. On earth this technique is commonly used to anneal semiconductor films after ion-implantation. The damage to the crystal lattice is similar to the defects found in solar cells which have been exposed to high-energy particle bombardment. Cole, Eric E. Unspecified Center NAG5-1294...

Laser Annealing of Ion Implanted CZ Silicon for Solar Cell Junction Formation. Quarterly Report

Laser Annealing of Ion Implanted CZ Silicon for Solar Cell Junction Formation. Quarterly Report PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Book Description
A project to evaluate the merits of large spot size pulsed laser annealing of ion implanted silicon wafers for junction formation on solar cells is described. A Q-switched Nd:Glass laser system is used operating in the 1064 (regular) and 532 (with frequency doubler) nm wavelengths. The laser output is in excess of 30 joules with a 20 to 50 ns pulse duration. Material used in this investigation is 3-inch diameter CZ silicon, P-type 0.014 inches thick, 10.cap omega.-cm resistivity, 100 orientation. Three wafer surface conditions are being evaluated in this pulse annealing investigation: chem-polished, texture etched, and flash etched. Annealing was performed with and without beam homogenization. Both modes showed excellent lattice recovery from the implant-induced damage as analyzed using Rutherford backscattering techniques. Homogenization of the beam was performed using a fused silica rod configured with a 90° bend. The unhomogenized annealing was performed using a plano-concave lens. Fabrication of laser annealed cells using both modes is forthcoming.

Laser Annealing of Ion Implanted CZ Silicon for Solar Cell Junction Formation. Quarterly Report

Laser Annealing of Ion Implanted CZ Silicon for Solar Cell Junction Formation. Quarterly Report PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Book Description
Results on a contract to evaluate the merits of large spot size pulsed laser annealing of ion implanted silicon wafers for junction formation in solar cells are reported. Investigations on homogenization of the laser beam were continued. In addition to the 30 mm diameter fused silica rod with a 90° bend configuration, quartz tubes were obtained and briefly tried. Best results were obtained with the rod homogenizer. Laser annealing experimentation resulted in complete recrystallization of ion implanted silicon substrates as confirmed by TEM and RBS analysis. Single pulse laser annealed, functional cells (2 x 2cm) were fabricated using varying process conditions, yielding conversion efficiencies predominantly in the 13% to slightly less than 15%.

Photovoltaic and Photoactive Materials

Photovoltaic and Photoactive Materials PDF Author: Joseph M. Marshall
Publisher: Springer Science & Business Media
ISBN: 9401006326
Category : Technology & Engineering
Languages : en
Pages : 361

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Book Description
The primary objective of this NATO Advanced Study Institute (ASI) was to present an up-to-date overview of various current areas of interest in the field of photovoltaic and related photoactive materials. This is a wide-ranging subject area, of significant commercial and environmental interest, and involves major contributions from the disciplines of physics, chemistry, materials, electrical and instrumentation engineering, commercial realisation etc. Therefore, we sought to adopt an inter disciplinary approach, bringing together recognised experts in the various fields while retaining a level of treatment accessible to those active in specific individual areas of research and development. The lecture programme commenced with overviews of the present relevance and historical development of the subject area, plus an introduction to various underlying physical principles of importance to the materials and devices to be addressed in later lectures. Building upon this, the ASI then progressed to more detailed aspects of the subject area. We were also fortunately able to obtain a contribution from Thierry Langlois d'Estaintot of the European Commission Directorate, describing present and future EC support for activities in this field. In addition, poster sessions were held throughout the meeting, to allow participants to present and discuss their current activities. These were supported by what proved to be very effective feedback sessions (special thanks to Martin Stutzmann), prior to which groups of participants enthusiastically met (often in the bar) to identify and agree topics of common interest.