The Preparation and Structure of Thin Films of Boron on Silicon PDF Download
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Author: E. T. Peters
Publisher:
ISBN:
Category : Boron
Languages : en
Pages : 14
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Book Description
Author: E. T. Peters
Publisher:
ISBN:
Category : Boron
Languages : en
Pages : 14
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Book Description
Author: E. T. Peters
Publisher:
ISBN:
Category : Boron
Languages : en
Pages : 0
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Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: R. W. Dodson
Publisher:
ISBN:
Category : Boron
Languages : en
Pages : 10
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Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 828
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Author: Vladislav I︠U︡rʹevich Vasilʹev
Publisher: Nova Science Publishers
ISBN: 9781624179594
Category : Boron compounds
Languages : en
Pages : 0
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Book Description
This comprehensive monograph summarises the 30-year studies of borophosphosilicate glass (BPSG) thin film used in electronic technologies, including the authors personal experience with the film deposition, characterisation, and implementation in microelectronic technology. The main core of the monograph is the interrelation of chemical vapour deposition (CVD) kinetic features, thin film material properties, and electronic device technology aspects. Part one of the monograph is devoted to the analysis of thin film synthesis, such as: CVD methodology and BPSG film processes, silicon dioxide and glass film growth kinetics, CVD step coverage and gap-fill features. Part two of the book is a description of BPSG film properties, film structure, glass flow capability, BPSG film-moisture interaction and the film defect formation phenomenon. A number of experimental data are presented and discussed in detail.
Author: V Eiiu Vasilev
Publisher: Nova Science Publishers
ISBN: 9781626180345
Category : Science
Languages : en
Pages : 261
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Book Description
This comprehensive monograph summarizes the 30-year studies of borophosphosilicate glass (BPSG) thin film used in electronic technologies, including the authors personal experience with the film deposition, characterization, and implementation in microelectronic technology. The main core of the monograph is the interrelation of chemical vapor deposition (CVD) kinetic features, thin film material properties, and electronic device technology aspects. Part one of the monograph is devoted to the analysis of thin film synthesis, such as: CVD methodology and BPSG film processes, silicon dioxide and glass film growth kinetics, CVD step coverage and gap-fill features. Part two of the book is a description of BPSG film properties, film structure, glass flow capability, BPSG film-moisture interaction and the film defect formation phenomenon. A number of experimental data are presented and discussed in detail.
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 328
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Author: R. Freer
Publisher: Springer Science & Business Media
ISBN: 9400921012
Category : Technology & Engineering
Languages : en
Pages : 716
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Book Description
Carbides, nitrides and borides are families of related refractory materials. Traditionally they have been employed in applications associated with engineering ceramics where either high temperature strength or stability is of primary importance. In recent years there has been a growing awareness of the interesting electrical, thermal and optical properties exhibited by these materials, and the fact that many can be prepared as monolithic ceramics, single crystals and thin films. In practical terms carbides, nitrides and borides offer the prospect of a new generation of semiconductor materials, for example, which can function at very high temperatures in severe environmental conditions. However, as yet, we have only a limited understanding of the detailed physics and chemistry of the materials and how the preparation techniques influence the properties. Under the auspices of the NATO Science Committee an Advanced Research Workshop (ARW) was held on the Physics and Chemistry of Carbides, Nitrides and Borides (University of Manchester, 18-22 September, 1989) in order to assess progress to date and identify the most promising themes and materials for future research. An international group of 38 scientists considered developments in 5 main areas: The preparation of powders, monolithic ceramics, single crystals and thin films; Phase transformations, microstructure, defect structure and mass transport; Materials stability; Theoretical studies; Electrical, thermal and optical properties of bulk materials and thin films.
Author: Jeffrey Gerard Hershberger
Publisher:
ISBN:
Category :
Languages : en
Pages : 250
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Book Description
