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Author: Philip Gilbert Hamerton
Publisher:
ISBN:
Category : Etching
Languages : en
Pages : 174
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Book Description
Author: Philip Gilbert Hamerton
Publisher:
ISBN:
Category : Etching
Languages : en
Pages : 174
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Book Description
Author: Nigel Oxley
Publisher: A&C Black
ISBN: 9780713668209
Category : Crafts & Hobbies
Languages : en
Pages : 128
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Book Description
In this book, Nigel Oxley describes fully the techniques of etching and aquatint employed by the artists who worked with him at Kelpra Studio where he established a reputation for using intaglio processes to create full colour images. Dame Elisabeth Frink, John Piper, John Hoyland, Jim Dine and Patrick Heron are illustrated within and the use of multi-plates is written with great detail. The author introduced the use of carborundum and polymer plates to the studio and the book includes step-by-step descriptions of these techniques. Having editioned for many years the author relates his experience of complex colour and plate combinations clearly enabling the reader to hav comprehensive insight to the work of the many artists illustrated within this book. This book is a valuable practical guide for the beginner and for those wishing to develop their printing and etching skills. For those interested in printmaking it provides a unique insight into the demands of a professional print.
Author: Philip Gilbert HAMERTON
Publisher:
ISBN:
Category :
Languages : en
Pages : 128
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Book Description
Author: Perrin Walker
Publisher: CRC Press
ISBN: 9781439822531
Category : Science
Languages : en
Pages : 1434
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Book Description
This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.
Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Category : Technology & Engineering
Languages : en
Pages : 664
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Book Description
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author: G. Petzow
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 152
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Book Description
Author: Ann Norfield
Publisher: The Crowood Press
ISBN: 1785006169
Category : Art
Languages : en
Pages : 627
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Book Description
Etching can seem mysterious and inaccessible, but this practical book guides you through the process to reveal the potential of this distinctive means of creating artists' prints. With clear instructions and visual guides, it explains the many ways that marks are first made on a metal plate before ink is applied and the image transferred onto a sheet of paper. The book goes on to introduce a broad menu of techniques, allowing the visual artist to develop a uniquely personal approach. Explanations are given for photo-etching, aquatint, as well as related intaglio processes such as drypoint and photopolymer. This new book encourages artists to experiment and try combining techniques to explore their potential, and includes interviews with leading artists explaining their approaches.
Author: Kazuo Nojiri
Publisher: Springer
ISBN: 3319102958
Category : Technology & Engineering
Languages : en
Pages : 126
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Book Description
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Author: Mark Graver
Publisher: A&C Black Visual Arts
ISBN: 9781408113257
Category : Art
Languages : en
Pages : 0
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Book Description
In this book, Mark Graver puts the case for non-toxic printmaking and then discusses the various technical factors (both materials and equipment) to consider when etching with acrylic resists, making aquatints, etching in general, using drypoint, engraving, making mezzotints and collagraphs and using photopolymers as well as combining various printmaking techniques. There is also information on various inks and health and safety measures in the printing workshop. All in all, this book contains everything you need to know to clean up your printmaking practice.
Author: Edmund Beale Sargant
Publisher: London, Frowde
ISBN:
Category : Best books
Languages : en
Pages : 380
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Book Description
