Author: O.S Serebryannikova
Publisher:
ISBN:
Category :
Languages : en
Pages : 5
Book Description
Structure of Copper Films Deposited on Porous Substrates by Magnetron Sputtering
Author: O.S Serebryannikova
Publisher:
ISBN:
Category :
Languages : en
Pages : 5
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 5
Book Description
Towards Delafossite Structure of Cu–Cr–O Thin Films Deposited by Reactive Magnetron Sputtering: Influence of Substrate Temperature Onoptoelectronics Properties
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
High Power Impulse Magnetron Sputtering
Author: Daniel Lundin
Publisher: Elsevier
ISBN: 0128124547
Category : Technology & Engineering
Languages : en
Pages : 398
Book Description
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Publisher: Elsevier
ISBN: 0128124547
Category : Technology & Engineering
Languages : en
Pages : 398
Book Description
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Thin Film Materials
Author: L. B. Freund
Publisher: Cambridge University Press
ISBN: 9781139449823
Category : Technology & Engineering
Languages : en
Pages : 772
Book Description
Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.
Publisher: Cambridge University Press
ISBN: 9781139449823
Category : Technology & Engineering
Languages : en
Pages : 772
Book Description
Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.
Metals Abstracts
Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1628
Book Description
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1628
Book Description
Materials Science and Information Technology
Author: Cai Suo Zhang
Publisher: Trans Tech Publications Ltd
ISBN: 3038137731
Category : Technology & Engineering
Languages : en
Pages : 8350
Book Description
These are the fully refereed proceedings of the International Conference on Materials Science and Information Technology (MSIT 2011), held during the 16-18 September 2011 in Singapore. The main goal of the event was to provide an international scientific forum for the exchange of new ideas in a number of fields by permitting in-depth interaction via discussions with peers from around the world. Core areas of materials science and information technology, plus multi-disciplinary and interdisciplinary aspects are covered. Volume is indexed by Thomson Reuters CPCI-S (WoS).
Publisher: Trans Tech Publications Ltd
ISBN: 3038137731
Category : Technology & Engineering
Languages : en
Pages : 8350
Book Description
These are the fully refereed proceedings of the International Conference on Materials Science and Information Technology (MSIT 2011), held during the 16-18 September 2011 in Singapore. The main goal of the event was to provide an international scientific forum for the exchange of new ideas in a number of fields by permitting in-depth interaction via discussions with peers from around the world. Core areas of materials science and information technology, plus multi-disciplinary and interdisciplinary aspects are covered. Volume is indexed by Thomson Reuters CPCI-S (WoS).
Effect of Substrate Bias on Properties and Microstructure of Nanotwinned Copper Thin Films Deposited by Magnetron Sputtering Systems
Author: Sun-Yi Chang
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Handbook of Thin Film Deposition
Author: Krishna Seshan
Publisher: William Andrew
ISBN: 0128123125
Category : Technology & Engineering
Languages : en
Pages : 472
Book Description
Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. - Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes - Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries - Features a new chapter discussing Gates Dielectrics
Publisher: William Andrew
ISBN: 0128123125
Category : Technology & Engineering
Languages : en
Pages : 472
Book Description
Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. - Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes - Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries - Features a new chapter discussing Gates Dielectrics
Chemical Abstracts
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2018
Book Description
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2018
Book Description
Physics Briefs
Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1146
Book Description
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1146
Book Description