RF-harmonic Suppression in Langmuir Probe Measurements in RF Discharges PDF Download
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Author: U. Flender
Publisher:
ISBN:
Category :
Languages : en
Pages : 48
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Book Description
Author: U. Flender
Publisher:
ISBN:
Category :
Languages : en
Pages : 48
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Book Description
Author: Jörg Florian Friedrich
Publisher: John Wiley & Sons
ISBN: 1119364760
Category : Science
Languages : en
Pages : 805
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Book Description
NONTHERMAL PLASMAS FOR MATERIALS PROCESSING This unique book covers the physical and chemical aspects of plasma chemistry with polymers and gives new insights into the interaction of physics and chemistry of nonthermal plasmas and their applications in materials science for physicists and chemists. The properties and characteristics of plasmas, elementary (collision) processes in the gas phase, plasma surface interactions, gas discharge plasmas and technical plasma sources, atmospheric plasmas, plasma diagnostics, polymers and plasmas, plasma polymerization, post-plasma processes, plasma, and wet-chemical processing, plasma-induced generation of functional groups, and the chemical reactions on these groups along with a few exemplary applications are discussed in this comprehensive but condensed state-of-the-art book on plasma chemistry and its dependence on plasma physics. While plasma physics, plasma chemistry, and polymer science are often handled separately, the aim of the authors is to harmoniously join the physics and chemistry of low-pressure and atmospheric-pressure plasmas with polymer surface chemistry and polymerization and to compare such chemistry with classic chemistry. Readers will find in these chapters Interaction of plasma physics and chemistry in plasmas and at the surface of polymers; Explanation and interpretation of physical and chemical mechanisms on plasma polymerization and polymer surface modification; Introduction of modern techniques in plasma diagnostics, surface analysis of solids, and special behavior of polymers on exposure to plasmas; Discussion of the conflict of energy-rich plasma species with permanent energy supply and the much lower binding energies in polymers and alternatives to avoid random polymer decomposition Technical applications such as adhesion, cleaning, wettability, textile modification, coatings, films, etc. New perspectives are explained about how to use selective and mild processes to allow post-plasma chemistry on non-degraded polymer surfaces. Audience Physicists, polymer chemists, materials scientists, industrial engineers in biomedicine, coatings, printing, etc.
Author: Jurgen Meichsner
Publisher: CRC Press
ISBN: 1420059165
Category : Science
Languages : en
Pages : 566
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Book Description
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.
Author: Gerhard Franz
Publisher: Springer Science & Business Media
ISBN: 3540858490
Category : Technology & Engineering
Languages : en
Pages : 743
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Book Description
Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Author: Valery A. Godyak
Publisher:
ISBN:
Category : Electric discharges through gases
Languages : en
Pages : 204
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Book Description
Author: Yuri P. Raizer
Publisher: CRC Press
ISBN: 135141996X
Category : Science
Languages : en
Pages : 305
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Book Description
The first publication of its kind in the field, this book describes comprehensively and systematically radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. Text presents the physics underlying rf discharges along with techniques for obtaining such discharges, experimental methods and results, and theoretical and numerical modeling findings. Radio-Frequency Capacitive Discharges is written by well-known specialists in the field, authors of many theoretical and experimental works. They provide simple and clear discussions of complicated physical phenomena. A complete review on the state of the art is included. This interesting new book can be used as a textbook for students and postgraduates and as a comprehensive guidebook by specialists.
Author: Nathaniel P. Lockwood
Publisher:
ISBN:
Category : Electric discharges through gases
Languages : en
Pages : 616
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Book Description
Discharges in a flowing background gas are used to produce charged and excited species for numerous applications including etching semiconductors and pumping gas discharge lasers (Pinhero and others, 1998). The effect of a flowing background gas on the charged and excited neutral species generation by an RF discharge in a flow tube and the diagnostics of the resulting plasma with a Langmuir probe have been investigated for pressures between 0.001 to 1 Torr and flow velocities up to 1000 m/s. This investigation was performed using a fluid method coupled to a chemical kinetic model and a hybrid Particle-In-Cell/Monte Carlo Collision modeling method based on the approaches of Boeuf, 1987 and Cartwright and others, 2000. A factor of two reduction in the sheath length was realized for an increase in flow velocity from 25 m/s to 500 m/s. This resulted in an increased average ionization rate and factor of ten increases in positive and negative ion densities, while the electron densities remained approximately constant. At pressures less than 0.01 Torr, existing probe theory was adequate for performing diagnostics, however, at pressures of 1 Torr convection limited probe theory underestimated the positive ion density of the flowing electronegative plasma by up to 50%.
Author: O. Auciello
Publisher: Springer Science & Business Media
ISBN: 9400919468
Category : Science
Languages : en
Pages : 548
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Book Description
An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 520
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Book Description
Author: Swey Yan Shei
Publisher:
ISBN:
Category : Photovoltaic power generation
Languages : en
Pages : 150
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Book Description
