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Author: Symposium on Progress in Quantitative Surface Analysis
Publisher: ASTM International
ISBN: 9780803105430
Category : Analytical chemistry
Languages : en
Pages : 220
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Book Description
Author: Symposium on Progress in Quantitative Surface Analysis
Publisher: ASTM International
ISBN: 9780803105430
Category : Analytical chemistry
Languages : en
Pages : 220
Get Book Here
Book Description
Author: Graham C. Smith
Publisher: Maney Publishing
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 194
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Book Description
Discusses the range of methods used to describe the structure, composition, and chemical nature of material surfaces, comparing the merits of each. The techniques standardly used in analytical laboratories auger electron and x-ray photoelectron spectroscopy, and secondary mass ion spectrometry are d
Author: D.J. O'Connor
Publisher: Springer Science & Business Media
ISBN: 366205227X
Category : Technology & Engineering
Languages : en
Pages : 588
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Book Description
This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.
Author: John F. Watts
Publisher: John Wiley & Sons
ISBN: 1119417643
Category : Technology & Engineering
Languages : en
Pages : 320
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Book Description
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Author: John P. Sibilia
Publisher: John Wiley & Sons
ISBN: 9780471186335
Category : Science
Languages : en
Pages : 404
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Book Description
Written both for the novice and for the experienced scientist, this miniature encyclopedia concisely describes over one hundred materials methodologies, including evaluation, chemical analysis, and physical testing techniques. Each technique is presented in terms of its use, sample requirements, and the engineering principles behind its methodology. Real life industrial and academic applications are also described to give the reader an understanding of the significance and utilization of technique. There is also a discussion of the limitations of each technique.
Author: Tery L. Barr
Publisher: ASTM International
ISBN:
Category :
Languages : en
Pages : 215
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Book Description
Author: J. R. Cuthill
Publisher: ASTM International
ISBN:
Category : Metallography
Languages : en
Pages : 156
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Book Description
Author: M. Grasserbauer
Publisher: Springer Science & Business Media
ISBN: 3709139430
Category : Technology & Engineering
Languages : en
Pages : 348
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Book Description
The 11th Colloquium on Metallurgical Analysis - a joint venture of the Institute of Analytical Chemistry of the Technical University in Vienna, the Austrian Society for Analytical Chemistry and Microchemistry, the German Metals Society (DGM), and the Society of German Iron and Steel Engineers (VDEh) - was attended by 120 scientists from 12 nations. The major topics covered were surface, micro and trace analysis of materials with a heavy emphasis on metals. According to the strategy of the meeting attention was focussed on an interdisciplinary approach to materials science - combining analytical chemistry, solid state physics and tech nology. Therefore progress reports on analytical techniques (like SIMS, SNMS, Positron Annihilation Spectroscopy, AES, XPS) were given as well as pre sentations on the development of materials (like for the fusion reactor). The majority of the discussion papers centered on the treatment of important technical problems in materials science and technology by a (mostly sophis ticated) combination of physical and chemical analytical techniques. The intensive exchange of ideas and results between the scientists oriented towards basic research and the industrial materials technologists was very fruitful and resulted in the establishment of several scientific cooperations. Major trends in materials analysis were also dealt with in a plenary discussion of which a short summary is contained in this volume. In order to facilitate international communication in the field of materials analysis and in view of the important questions treated in the various contri butions this proceedings volume was edited in English.
Author: Siegfried Hofmann
Publisher: Springer Science & Business Media
ISBN: 3642273815
Category : Science
Languages : en
Pages : 545
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Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author: Alvin W. Czanderna
Publisher: Springer Science & Business Media
ISBN: 0306469146
Category : Technology & Engineering
Languages : en
Pages : 447
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Book Description
Many books are available that detail the basic principles of the different methods of surface characterization. On the other hand, the scientific literature provides a resource of how individual pieces of research are conducted by particular labo- tories. Between these two extremes the literature is thin but it is here that the present volume comfortably sits. Both the newcomer and the more mature scientist will find in these chapters a wealth of detail as well as advice and general guidance of the principal phenomena relevant to the study of real samples. In the analysis of samples, practical analysts have fairly simple models of how everything works. Superimposed on this ideal world is an understanding of how the parameters of the measurement method, the instrumentation, and the char- teristics of the sample distort this ideal world into something less precise, less controlled, and less understood. The guidance given in these chapters allows the scientist to understand how to obtain the most precise and understood measu- ments that are currently possible and, where there are inevitable problems, to have clear guidance as the extent of the problem and its likely behavior.
