Pulsed Laser Deposition of AlMgB14 Thin Films PDF Download
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Author: Jason Curtis Britson
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: Jason Curtis Britson
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 129
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Book Description
Hard, wear-resistant coatings of thin film borides based on AlMgB14 have the potential to be applied industrially to improve the tool life of cutting tools and pump vanes and may account for several million dollars in savings as a result of reduced wear on these parts. Past work with this material has shown that it can have a hardness of up to 45GPa and be fabricated into thin films with a similar hardness using pulsed laser deposition. These films have already been shown to be promising for industrial applications. Cutting tools coated with AlMgB14 used to mill titanium alloys have been shown to substantially reduce the wear on the cutting tool and extend its cutting life. However, little research into the thin film fabrication process using pulsed laser deposition to make AlMgB14 has been conducted. In this work, research was conducted into methods to optimize the deposition parameters for the AlMgB14 films. Processing methods to eliminate large particles on the surface of the AlMgB14 films, produce films that were at least 1m thick, reduce the surface roughness of the films, and improve the adhesion of the thin films were investigated. Use of a femtosecond laser source rather than a nanosecond laser source was found to be effective in eliminating large particles considered detrimental to wear reduction properties from the films. Films produced with the femtosecond laser were also found to be deposited at a rate 100 times faster than those produced with the nanosecond laser. However, films produced with the femtosecond laser developed a relatively high RMS surface roughness around 55nm. Attempts to decrease the surface roughness were largely unsuccessful. Neither increasing the surface temperature of the substrate during deposition nor using a double pulse to ablate the material was found to be extremely successful to reduce the surface roughness. Finally, the adhesion of the thin films to M2 tool steel substrates, assessed using the Rockwell C indentation adhesion test, was found to be substantially improved by the deposition of a titanium interlayer, but unaffected by increasing the temperature of the substrates. The titanium was found to improve the adhesion strength of the films because it reacted with both the steel and the AlMgB14 compound to form new compounds. Ultimately, it was concluded that the films with the best properties were produced with a femtosecond pulsed laser and were deposited on top of a titanium interlayer to improve the thin film adhesion.
Author: Liviu Duta
Publisher: MDPI
ISBN: 3036510443
Category : Medical
Languages : en
Pages : 224
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Book Description
Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.
Author: Robert Eason
Publisher: John Wiley & Sons
ISBN: 0470052112
Category : Science
Languages : en
Pages : 754
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Book Description
Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.
Author: Yun Tian
Publisher:
ISBN:
Category :
Languages : en
Pages : 190
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Book Description
Boron-rich borides are a special group of materials possessing complex structures typically comprised of B12 icosahedra. All of the boron-rich borides sharing this common structural unit exhibit a variety of exceptional physical and electrical properties. In this work, a new ternary boride compound AlMgB14, which has been extensively studied in bulk form due to its novel mechanical properties, was fabricated into thin film coatings by pulsed laser deposition (PLD) technology. The effect of processing conditions (laser operating modes, vacuum level, substrate temperature, and postannealing, etc.) on the composition, microstructure evolution, chemical bonding, and surface morphology of AlMgB14 thin film coatings has been investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), atomic force microscopy (AFM) and Fourier transform infrared (FTIR) spectrometry; the mechanical, electrical, and optical properties of AlMgB14 thin films have been characterized by nanoindentation, four-point probe, van der Pauw Hall measurement, activation energy measurement, and UV-VIS-NIR spectrophotometer. Experimental results show that AlMgB14 films deposited in the temperature range of 300 K - 873 K are amorphous. Depositions under a low vacuum level (5 X 10−5 Torr) can introduce a significant amount of C and O impurities into AlMgB14 films and lead to a complex oxide glass structure. Orthorhombic AlMgB14 phase cannot be obtained by subsequent high temperature annealing. By contrast, the orthorhombic AlMgB14 crystal structure can be attained via high temperature-annealing of AlMgB14 films deposited under a high vacuum level (
Author: Michael Joseph Stock
Publisher:
ISBN:
Category :
Languages : en
Pages : 102
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Book Description
Procedural variables such as fluence, polarization, pulse width, machining speed, and material properties are investigated to determine their effects on the PLD and laser micromachining of aluminum magnesium boride. In this work, a 120-fs pulsed, 800-nm wavelength Ti: Sapphire laser was used for micromachining thin films of ultra-hard AlMgB14 and polysilicon thin films on silicon substrate. Polysilicon was first deposited by low-pressure chemical vapor deposition followed by boride using femtosecond pulsed laser deposition. Channels were then machined in thin films to pattern a device that would produce a linear resistance/deflection curve. Results show that the ultrafast laser has precisely ablated the thin films. However, the high-energy fluence used in single-pass surface micromachining enabled the formation of recast layer of molten silicon substrate ejected by vapor pressure, and conglomerates of re-condensed material at a distance from the feature. Multi-pass surface micromachining at low energy fluences eliminated the recast layers and produced clean features. Ultrafast laser micromachining is certainly beneficial over wet and dry etching in reproducibility, material choice, and minimal number of processing steps. Thin films of ultra-hard AlMgB14 were grown on Si (100) substrates at 300 K using femtosecond pulsed Ti:sapphire laser and subsequently annealed in argon gas up to 1373 K for two hours. X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscope, and nanoindentation were employed to study the composition, microstructure and hardness of thin films. Results were compared with nanosecond pulsed KrF excimer laser-deposited films. The as-deposited and post-annealed films (up to 1173 K), independent of the pulse width, exhibited amorphous structures with a hardness of 40 GPa. However, post-annealing at higher temperatures has varied effects on crystallization depending on the pulse width. The effect of pulse width on the microstructure and quality of thin films is discussed.
Author: Armando Luches
Publisher: Nova Science Publishers
ISBN: 9781611224207
Category : Boron nitride
Languages : en
Pages : 0
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Book Description
Pulsed laser deposition (PLD) is at present one of the most interesting technique for thin film deposition. In the PLD process a film is formed by ablating a solid target with energetic laser pulses and collecting the material of interest on a substrate placed a few cm from the target. According to its ability to carry the stoichiometry from the target to the substrate and to its relatively high growth rate (~0.1 nm/pulse), PLD is an attractive technique for compound thin film deposition. This technique offers the possibility of depositing thin films on room-temperature or low-temperature substrates, due to the high energy of the species forming the laser plasma plume expanding from the target to the substrate. This book reviews research on the depositon of c-BN films by using PLD, ion-assisted PLD and other laser-assisted procedures.
Author: Fan Qian
Publisher:
ISBN:
Category :
Languages : en
Pages : 194
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Book Description
Author: Gregory Edward Triplett
Publisher:
ISBN:
Category : Boron nitride
Languages : en
Pages : 112
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Book Description
Author: Dongfang Yang
Publisher: BoD – Books on Demand
ISBN: 9535128116
Category : Technology & Engineering
Languages : en
Pages : 430
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Book Description
Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.
