Physics and Technology of High-k Gate Dielectrics I PDF Download
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Author: Samares Kar
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 330
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Book Description
Author: Gang He
Publisher: John Wiley & Sons
ISBN: 3527646361
Category : Technology & Engineering
Languages : en
Pages : 560
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Book Description
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
Author: Samares Kar
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 330
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Book Description
Author: Samares Kar
Publisher: The Electrochemical Society
ISBN: 9781566774055
Category : Science
Languages : en
Pages : 512
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Book Description
"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.
Author: Samares Kar
Publisher: The Electrochemical Society
ISBN: 1566775035
Category : Dielectrics
Languages : en
Pages : 565
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Book Description
This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author: Samares Kar
Publisher: The Electrochemical Society
ISBN: 1566775701
Category : Dielectrics
Languages : en
Pages : 676
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Book Description
This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author: S. Kar
Publisher: The Electrochemical Society
ISBN: 1566776511
Category : Dielectrics
Languages : en
Pages : 550
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Book Description
The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author: Michel Houssa
Publisher: CRC Press
ISBN: 1420034146
Category : Science
Languages : en
Pages : 614
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Book Description
The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ
Author: D. Misra
Publisher: The Electrochemical Society
ISBN: 1607688182
Category :
Languages : en
Pages : 411
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Book Description
Author: S. Kar
Publisher: The Electrochemical Society
ISBN: 1607685450
Category :
Languages : en
Pages : 203
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Book Description
Author: Samares Kar
Publisher: Springer Science & Business Media
ISBN: 3642365353
Category : Technology & Engineering
Languages : en
Pages : 515
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Book Description
"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
