Author: Publisher:
ISBN:
Category : Masks (Electronics)
Languages : en
Pages : 644
Book Description
Photomask and X-ray Mask Technology
Author: Publisher:
ISBN:
Category : Masks (Electronics)
Languages : en
Pages : 644
Book Description
Handbook of Photomask Manufacturing Technology
Author: Syed RizviPublisher: CRC Press
ISBN: 1420028782
Category : Technology & Engineering
Languages : en
Pages : 730
Book Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Photomask and Next-generation Lithography Mask Technology
Author: Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 1104
Book Description
National Semiconductor Metrology Program
Author: National Semiconductor Metrology Program (U.S.)Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 120
Book Description
Fundamental Aspects of Electrochemical Deposition and Dissolution
Author: M. MatloszPublisher: The Electrochemical Society
ISBN: 9781566772563
Category : Technology & Engineering
Languages : en
Pages : 456
Book Description
Thin Film Transistor Technologies V
Author: Yue KuoPublisher: The Electrochemical Society
ISBN: 9781566772983
Category : Technology & Engineering
Languages : en
Pages : 356
Book Description
Laser Induced Damage in Optical Materials
Author: Publisher:
ISBN:
Category : Laser materials
Languages : en
Pages : 732
Book Description
Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography
Author: P. Rai-ChoudhuryPublisher: SPIE Press
ISBN: 9780819423788
Category : Technology & Engineering
Languages : en
Pages : 780
Book Description
The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Photomask and X-ray Mask Technology V
Author: Naoaki AizakiPublisher: Society of Photo Optical
ISBN: 9780819428646
Category : Technology & Engineering
Languages : en
Pages : 616
Book Description
An overview of photomask and X-ray mask technology. The papers are divided into sections which explore topics such as: device trends; equipment; X-ray masks; and advanced mask fabrication processes.
Electrical & Electronics Abstracts
Author: Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 1860
Book Description
