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Author: Alson E. Hatheway
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819441584
Category : Technology & Engineering
Languages : en
Pages : 380
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Book Description
Author: Alson E. Hatheway
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819441584
Category : Technology & Engineering
Languages : en
Pages : 380
Get Book Here
Book Description
Author: Ronald G. Driggers
Publisher: CRC Press
ISBN: 9780824742508
Category : Science
Languages : en
Pages : 1240
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Book Description
PRINT/ONLINE PRICING OPTIONS AVAILABLE UPON REQUEST
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Author: Ronald G. Driggers
Publisher: CRC Press
ISBN: 9780824742522
Category : Science
Languages : en
Pages : 1100
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Book Description
Compiled by 330 of the most widely respected names in the electro-optical sciences, the Encyclopedia is destined to serve as the premiere guide in the field with nearly 2000 figures, 560 photographs, 260 tables, and 3800 equations. From astronomy to x-ray optics, this reference contains more than 230 vivid entries examining the most intriguing technological advances and perspectives from distinguished professionals around the globe. The contributors have selected topics of utmost importance in areas including digital image enhancement, biological modeling, biomedical spectroscopy, and ocean optics, providing thorough coverage of recent applications in this continually expanding field.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 56
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Book Description
Author: British Library. Document Supply Centre
Publisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 870
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Book Description
Author: Ivan Padron
Publisher: BoD – Books on Demand
ISBN: 9535104047
Category : Technology & Engineering
Languages : en
Pages : 233
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Book Description
This book provides a current overview of the theoretical and experimental aspects of some interferometry techniques applied to Topography and Astronomy. The first two chapters comprise interferometry techniques used for precise measurement of surface topography in engineering applications; while chapters three through eight are dedicated to interferometry applications related to Earth's topography. The last chapter is an application of interferometry in Astronomy, directed specifically to detection of planets outside our solar system. Each chapter offers an opportunity to expand the knowledge about interferometry techniques and encourage researchers in development of new interferometry applications.
Author: Mark A. Kahan
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819450517
Category : Science
Languages : en
Pages : 304
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Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author: Alson E. Hatheway
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819450494
Category : Technology & Engineering
Languages : en
Pages : 218
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Book Description
Author: Hwaiyu Geng
Publisher: McGraw Hill Professional
ISBN: 0071445595
Category : Technology & Engineering
Languages : en
Pages : 915
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Book Description
WORLD-CLASS SEMICONDUCTOR MANUFACTURING EXPERTISE AT YOUR FINGERTIPS This is a comprehensive reference to the semiconductor manufacturing process and ancillary facilities -- from raw material preparation to packaging and testing, applying basics to emerging technologies. Readers charged with optimizing the design and performance of manufacturing processes will find all the information necessary to produce the highest quality chips at the lowest price in the shortest time possible. The Semiconductor Manufacturing Handbook provides leading-edge information on semiconductor wafer processes, MEMS, nanotechnology, and FPD, plus the latest manufacturing and automation technologies, including: Yield Management Automated Material Handling System Fab and Cleanroom Design and Operation Gas Abatement and Waste Treatment Management And much more Written by 60 international experts, and peer reviewed by a seasoned advisory board, this handbook covers the fundamentals of relevant technology and its real-life application and operational considerations for planning, implementing, and controlling manufacturing processes. It includes hundreds of detailed illustrations and a list of relevant books, technical papers, and websites for further research. This inclusive, wide-ranging coverage makes the Semiconductor Manufacturing Handbook the most comprehensive single-volume reference ever published in the field. STATE-OF-THE-ART SEMICONDUCTOR TECHNOLOGIES AND MANUFACTURING PROCESSES: SEMICONDUCTOR FUNDAMENTALS How Chips Are Designed and Made * Substrates * Copper and Low-k Dielectrics * Silicide Formation * Plasma * Vacuum * Photomask WAFER PROCESSING TECHNOLOGIES Microlithography * Ion Implantation * Etch * PVD/ALD * CVD * ECD * Epitaxy * CMP * Wet Cleaning FINAL MANUFACTURING Packaging * Grinding, Stress Relief, Dicing * Inspection, Measurement, and Testing NANOTECHNOLOGY, MEMS, AND FPD GAS AND CHEMICALS Specialty Gas System and DCA * Gas Abatement Systems * Chemical and Slurries Delivery System * Ultra Pure Water FAB YIELD, OPERATIONS, AND FACILITIES Yield Management * Automated Materials Handling System * Metrology * Six Sigma * Advanced Process Control * EHS * Fab Design and Construction * Cleanroom * Vibration and Acoustic Control * ESD * Airborne Molecular Control * Particle Monitoring * Wastewater Neutralization Systems
Author:
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ISBN:
Category : Aeronautics
Languages : en
Pages : 980
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Book Description
