Author: Leonard Raumann
Publisher:
ISBN: 9783958065079
Category :
Languages : en
Pages :
Book Description
Modeling and Validation of Chemical Vapor Deposition for Tungsten Fiber Reinforced Tungsten
Author: Leonard Raumann
Publisher:
ISBN: 9783958065079
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN: 9783958065079
Category :
Languages : en
Pages :
Book Description
Modeling of Chemical Vapor Deposition of Tungsten Films
Author: Chris R. Kleijn
Publisher: Birkhäuser
ISBN: 3034877412
Category : Science
Languages : en
Pages : 138
Book Description
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Publisher: Birkhäuser
ISBN: 3034877412
Category : Science
Languages : en
Pages : 138
Book Description
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Transient Modeling of Selective Chemical Vapor Deposition of Tungsten During a Via Filling Process
Author: Yeongdae Shon
Publisher:
ISBN:
Category : Tungsten
Languages : en
Pages : 394
Book Description
Publisher:
ISBN:
Category : Tungsten
Languages : en
Pages : 394
Book Description
Model for the elongation of boron on tungsten during chemical vapor deposition
Author: Franklin Edward Wawner
Publisher:
ISBN:
Category :
Languages : en
Pages : 17
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 17
Book Description
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
Author: John E.J. Schmitz
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 264
Book Description
Publisher description.
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 264
Book Description
Publisher description.
Application of Chemical Vapor Deposition to the Production of Tungsten Tubing
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 27
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 27
Book Description
CHEMICAL VAPOR DEPOSITION OF TUNGSTEN.
Author: J. CHIN
Publisher:
ISBN:
Category :
Languages : en
Pages : 14
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 14
Book Description
Chemical Vapor Deposition
Author: John Milton Blocher
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 484
Book Description
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 484
Book Description
Optimal Programmed Rate Chemical Vapor Deposition of Tungsten
Author: John Joseph Kristof
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 216
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 216
Book Description
The Kinetics of Chemical Vapor Deposition of Tungsten
Author: H. CHEUNG
Publisher:
ISBN:
Category :
Languages : en
Pages : 14
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 14
Book Description