Author:
Publisher:
ISBN:
Category : Measurement
Languages : en
Pages : 914
Book Description
Metrology, Inspection, and Process Control for Microlithography
Author:
Publisher:
ISBN:
Category : Measurement
Languages : en
Pages : 914
Book Description
Publisher:
ISBN:
Category : Measurement
Languages : en
Pages : 914
Book Description
Microlithography
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Metrology, Inspection, and Process Control for Microlithography XVIII
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 770
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 770
Book Description
Metrology, Inspection, and Process Control for Microlithography XXIX
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 440
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 440
Book Description
ISTFA 2019: Proceedings of the 45th International Symposium for Testing and Failure Analysis
Author: ASM International
Publisher: ASM International
ISBN: 1627082735
Category : Technology & Engineering
Languages : en
Pages : 540
Book Description
The theme for the 2019 conference is Novel Computing Architectures. Papers will include discussions on the advent of Artificial Intelligence and the promise of quantum computing that are driving disruptive computing architectures; Neuromorphic chip designs on one hand, and Quantum Bits on the other, still in R&D, will introduce new computing circuitry and memory elements, novel materials, and different test methodologies. These novel computing architectures will require further innovation which is best achieved through a collaborative Failure Analysis community composed of chip manufacturers, tool vendors, and universities.
Publisher: ASM International
ISBN: 1627082735
Category : Technology & Engineering
Languages : en
Pages : 540
Book Description
The theme for the 2019 conference is Novel Computing Architectures. Papers will include discussions on the advent of Artificial Intelligence and the promise of quantum computing that are driving disruptive computing architectures; Neuromorphic chip designs on one hand, and Quantum Bits on the other, still in R&D, will introduce new computing circuitry and memory elements, novel materials, and different test methodologies. These novel computing architectures will require further innovation which is best achieved through a collaborative Failure Analysis community composed of chip manufacturers, tool vendors, and universities.
Metrology, Inspection, and Process Control for Microlithography XXIX
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Proceedings of the 2022 International Petroleum and Petrochemical Technology Conference
Author: Jia'en Lin
Publisher: Springer Nature
ISBN: 9819926491
Category : Technology & Engineering
Languages : en
Pages : 654
Book Description
This book is a compilation of selected papers from the 6th International Petroleum and Petrochemical Technology Conference (IPPTC 2022). The work focuses on petroleum & petrochemical technologies and practical challenges in the field. It creates a platform to bridge the knowledge gap between China and the world. The conference not only provides a platform to exchanges experience but also promotes the development of scientific research in petroleum & petrochemical technologies. The book will benefit a broad readership, including industry experts, researchers, educators, senior engineers and managers.
Publisher: Springer Nature
ISBN: 9819926491
Category : Technology & Engineering
Languages : en
Pages : 654
Book Description
This book is a compilation of selected papers from the 6th International Petroleum and Petrochemical Technology Conference (IPPTC 2022). The work focuses on petroleum & petrochemical technologies and practical challenges in the field. It creates a platform to bridge the knowledge gap between China and the world. The conference not only provides a platform to exchanges experience but also promotes the development of scientific research in petroleum & petrochemical technologies. The book will benefit a broad readership, including industry experts, researchers, educators, senior engineers and managers.
Microscopy Methods in Nanomaterials Characterization
Author: Sabu Thomas
Publisher: Elsevier
ISBN: 0323461476
Category : Technology & Engineering
Languages : en
Pages : 434
Book Description
Microscopy Methods in Nanomaterials Characterization fills an important gap in the literature with a detailed look at microscopic and X-ray based characterization of nanomaterials. These microscopic techniques are used for the determination of surface morphology and the dispersion characteristics of nanomaterials. This book deals with the detailed discussion of these aspects, and will provide the reader with a fundamental understanding of morphological tools, such as instrumentation, sample preparation and different kinds of analyses, etc. In addition, it covers the latest developments and trends morphological characterization using a variety of microscopes. Materials scientists, materials engineers and scientists in related disciplines, including chemistry and physics, will find this to be a detailed, method-orientated guide to microscopy methods of nanocharacterization. - Takes a method-orientated approach that includes case studies that illustrate how to carry out each characterization technique - Discusses the advantages and disadvantages of each microscopy characterization technique, giving the reader greater understanding of conditions for different techniques - Presents an in-depth discussion of each technique, allowing the reader to gain a detailed understanding of each
Publisher: Elsevier
ISBN: 0323461476
Category : Technology & Engineering
Languages : en
Pages : 434
Book Description
Microscopy Methods in Nanomaterials Characterization fills an important gap in the literature with a detailed look at microscopic and X-ray based characterization of nanomaterials. These microscopic techniques are used for the determination of surface morphology and the dispersion characteristics of nanomaterials. This book deals with the detailed discussion of these aspects, and will provide the reader with a fundamental understanding of morphological tools, such as instrumentation, sample preparation and different kinds of analyses, etc. In addition, it covers the latest developments and trends morphological characterization using a variety of microscopes. Materials scientists, materials engineers and scientists in related disciplines, including chemistry and physics, will find this to be a detailed, method-orientated guide to microscopy methods of nanocharacterization. - Takes a method-orientated approach that includes case studies that illustrate how to carry out each characterization technique - Discusses the advantages and disadvantages of each microscopy characterization technique, giving the reader greater understanding of conditions for different techniques - Presents an in-depth discussion of each technique, allowing the reader to gain a detailed understanding of each
National Semiconductor Metrology Program
Author: National Institute of Standards and Technology (U.S.)
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 160
Book Description
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 160
Book Description
National Semiconductor Metrology Program
Author: National Semiconductor Metrology Program (U.S.)
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 160
Book Description
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 160
Book Description