Linking the Gaseous and Condensed Phases of Matter

Linking the Gaseous and Condensed Phases of Matter PDF Author: Loucas G. Christophorou
Publisher: Springer Science & Business Media
ISBN: 1461525403
Category : Science
Languages : en
Pages : 578

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Book Description
The Advanced Study Institute (ASI) on "Linking the Gaseous and Condensed Phases of Matter: The Behavior of Slow Electrons" was held at Patras, Greece, September 5-18, 1993. The organizers of the Patras ASI felt that the study of the electronic properties of matter in various states of aggregation has advanced to a point where further progress required the interfacing of the phases of matter in order to find out and to understand how the microscopic and macroscopic properties of materials and processes change as we go from low pressure gas to the condensed phase. This approach is of foremost significance both from the point of view of basic research and of applications. Linking the electronic properties of the gaseous and condensed phases of matter is a fascinating new frontier of science embracing scientists not only from physics and chemistry but also from the life sciences and engineering. The Patras ASI brought together some of the world's foremost experts who work in the field of electronic properties of molecular gases, clusters, liquids, and solids. The thirty five lectures given at the meeting as well as the twenty nine poster papers presented and the formal and informal discussions that took place focused largely on the behavior of slow electrons in matter.

Linking the Gaseous and Condensed Phases of Matter

Linking the Gaseous and Condensed Phases of Matter PDF Author: Loucas G. Christophorou
Publisher: Springer Science & Business Media
ISBN: 1461525403
Category : Science
Languages : en
Pages : 578

Get Book

Book Description
The Advanced Study Institute (ASI) on "Linking the Gaseous and Condensed Phases of Matter: The Behavior of Slow Electrons" was held at Patras, Greece, September 5-18, 1993. The organizers of the Patras ASI felt that the study of the electronic properties of matter in various states of aggregation has advanced to a point where further progress required the interfacing of the phases of matter in order to find out and to understand how the microscopic and macroscopic properties of materials and processes change as we go from low pressure gas to the condensed phase. This approach is of foremost significance both from the point of view of basic research and of applications. Linking the electronic properties of the gaseous and condensed phases of matter is a fascinating new frontier of science embracing scientists not only from physics and chemistry but also from the life sciences and engineering. The Patras ASI brought together some of the world's foremost experts who work in the field of electronic properties of molecular gases, clusters, liquids, and solids. The thirty five lectures given at the meeting as well as the twenty nine poster papers presented and the formal and informal discussions that took place focused largely on the behavior of slow electrons in matter.

Linking the Gaseous and the Condensed Phases of Matter: The Slow Electron and Its Interactions

Linking the Gaseous and the Condensed Phases of Matter: The Slow Electron and Its Interactions PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Book Description


Ions and Electrons in Liquid Helium

Ions and Electrons in Liquid Helium PDF Author: Armando Francesco Borghesani
Publisher: OUP Oxford
ISBN: 0191526711
Category : Science
Languages : en
Pages : 559

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Book Description
Electrons and ions have been used for over 40 years as probes to investigate the fascinating properties of helium liquids. The study of the transport properties of microscopic charge carriers sheds light on superfluidity, on quantum hydrodynamics, and on the interactions with collective excitations in quantum liquids. The structure of the probes themselves depends on their coupling with the liquid environment in a way that gives further insight into the microscopic behavior of the liquid in different thermodynamic conditions, such as in the superfluid phase, in the normal phase, or near the liquid-vapor critical point. This book provides a comprehensive review of the experiments and theories of transport properties of charge carriers in liquid helium. It is a subject about which no other monograph exists to date. The book is intended for graduate and postgraduate students and for condensed matter physicists who will benefit from its completeness and accuracy.

Fundamental Electron Interactions with Plasma Processing Gases

Fundamental Electron Interactions with Plasma Processing Gases PDF Author: Loucas G. Christophorou
Publisher: Springer Science & Business Media
ISBN: 1441989714
Category : Science
Languages : en
Pages : 791

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Book Description
This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

Liquid State Electronics of Insulating Liquids

Liquid State Electronics of Insulating Liquids PDF Author: Werner Schmidt
Publisher: CRC Press
ISBN: 9780849344459
Category : Technology & Engineering
Languages : en
Pages : 372

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Book Description
Under certain conditions, liquids that usually do not conduct electrical currents become conductors, a phenomenon that is of interest to scientists in several different fields. In Liquid State Electronics of Insulating Liquids, one of the world's leading experts in dielectric liquids discusses the theoretical basis and the experiments on electronic conduction in nonpolar liquids. It provides a sound description of the concepts involved in electronic and ionic charge transport in these liquids. This text also includes experimental techniques that graduate students, university researchers, and laboratory scientists will all find useful. Data tables provide first-order information on the magnitude of relevant quantities.

Chemistry for Colleges and Schools

Chemistry for Colleges and Schools PDF Author: David A. Robinson
Publisher:
ISBN: 9780333261927
Category : Chemistry
Languages : en
Pages : 696

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Book Description


Advances in Atomic, Molecular, and Optical Physics

Advances in Atomic, Molecular, and Optical Physics PDF Author:
Publisher: Academic Press
ISBN: 012812184X
Category : Science
Languages : en
Pages : 690

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Book Description
Advances in Atomic, Molecular, and Optical Physics, Volume 66, provides a comprehensive compilation of recent developments in a field that is in a state of rapid growth as new experimental and theoretical techniques are used on many problems, both old and new. Topics covered include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics, with timely articles written by distinguished experts that contain relevant review materials and detailed descriptions of important developments in the field. Presents the work of international experts in the field Contains comprehensive articles that compile recent developments in a field that is experiencing rapid growth, with new experimental and theoretical techniques emerging Ideal for users interested in optics, excitons, plasmas, and thermodynamics Topics covered include atmospheric science, astrophysics, surface physics, and laser physics, amongst others

Gaseous Dielectrics VIII

Gaseous Dielectrics VIII PDF Author: Loucas G. Christophorou
Publisher: Springer Science & Business Media
ISBN: 1461548993
Category : Technology & Engineering
Languages : en
Pages : 600

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Book Description
Gaseous Dielectrics VIII covers recent advances and developments in a wide range of basic, applied, and industrial areas of gaseous dielectrics.

Nanofabrication Using Focused Ion and Electron Beams

Nanofabrication Using Focused Ion and Electron Beams PDF Author: Ivo Utke
Publisher: Oxford University Press
ISBN: 0199920990
Category : Technology & Engineering
Languages : en
Pages : 840

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Book Description
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.

Materials and Processes for Next Generation Lithography

Materials and Processes for Next Generation Lithography PDF Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Technology & Engineering
Languages : en
Pages : 634

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Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place