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Author: R. J. Vetter
Publisher: CRC Press
ISBN: 9783718650897
Category : Science
Languages : en
Pages : 208
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Book Description
Author: R. J. Vetter
Publisher: CRC Press
ISBN: 9783718650897
Category : Science
Languages : en
Pages : 208
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Book Description
Author: Ian W. Boyd
Publisher:
ISBN:
Category : Ion bombardment
Languages : en
Pages : 467
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Book Description
Author: D.K. Evans
Publisher: CRC Press
ISBN: 1000104133
Category : Science
Languages : en
Pages : 445
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Book Description
This book provides an introduction on applications of lasers in Chemistry. It describes laser as a tool for chemistry, the consideration involved in describing a laser beam and what happens to beam as it is propagated through a gas. The book is useful for graduates and advanced undergraduates.
Author: Societe de chimie physique (France)
Publisher: Elsevier Science & Technology
ISBN:
Category : Science
Languages : en
Pages : 548
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Book Description
Author: Helmut H. Telle
Publisher: John Wiley & Sons
ISBN: 9780470059401
Category : Science
Languages : en
Pages : 516
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Book Description
Laser Chemistry: Spectroscopy, Dynamics and Applications provides a basic introduction to the subject, written for students and other novices. It assumes little in the way of prior knowledge, and carefully guides the reader through the important theory and concepts whilst introducing key techniques and applications.
Author: Koji Kaya
Publisher: CRC Press
ISBN: 9783718655175
Category : Science
Languages : en
Pages : 112
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Book Description
Author: Jagdish P. Singh
Publisher: Elsevier
ISBN: 0128188308
Category : Science
Languages : en
Pages : 624
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Book Description
Laser-Induced Breakdown Spectroscopy, Second Edition, covers the basic principles and latest developments in instrumentation and applications of Laser Induced Breakdown Spectroscopy (LIBS). Written by active experts in the field, it serves as a useful resource for analytical chemists and spectroscopists, as well as graduate students and researchers engaged in the fields of combustion, environmental science, and planetary and space exploration. This fully revised second edition includes several new chapters on new LIBS techniques as well as several new applications, including flame and off-gas measurement, pharmaceutical samples, defense applications, carbon sequestration and site monitoring, handheld instruments, and more. LIBS has rapidly developed into a major analytical technology with the capability of detecting all chemical elements in a sample, of real- time response, and of close-contact or stand-off analysis of targets. It does not require any sample preparation, unlike conventional spectroscopic analytical techniques. Samples in the form of solids, liquids, gels, gases, plasmas, and biological materials (like teeth, leaves, or blood) can be studied with almost equal ease. This comprehensive reference introduces the topic to readers in a simple, direct, and accessible manner for easy comprehension and maximum utility. Covers even more applications of LIBS beyond the first edition, including combustion, soil physics, environment, and life sciences Includes new chapters on LIBS techniques that have emerged in the last several years, including Femtosecond LIBS and Molecular LIBS Provides inspiration for future developments in this rapidly growing field in the concluding chapter
Author: Salman Rosenwaks
Publisher: Springer Science & Business Media
ISBN: 3642718590
Category : Science
Languages : en
Pages : 588
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Book Description
The Sixth International Symposium on Gas Flow and Chemical Lasers (GCL) was held in Jerusalem, Israel, on September 8-12, 1986. The charm and beauty of Jerusalem and the unique blending of ancient and modern made this Symposium an enjoyable experience for the 165 participants and the accompanying persons. Yet, it seems that the invited and contributed papers presented at the Symposium were equally attractive so that most of the participants attended most sessions, resisting the temptations outside the session hall. Indeed, many speakers presented up-to-date results that were obtained, or cleared, just a few days before the Symposium. This volume is a compi lation of 19 invited and 61 contributed papers and of a panel discussion on the prospects for short wavelength chemical lasers held at the closing session of the Symposium. This discussion is presented as recorded in order to re tain the flavour of spontaneous presentation at the risk - or advantage - of presenting some venturous ideas, and the danger of misquoting. In editing the book, a deductive approach has been attempted. The book starts with some fundamental issues, namely fluid dynamics and optics, and then deals with the design, diagnostics, propagation and applications of various gas laser systems, covering the wavelength spectrum from XUV to infrared. Then follow recent developments of general interest to the laser community and the book concludes with an eye to the future, i.e., with a section on short wavelength chemical lasers.
Author: Ian W. Boyd
Publisher: North Holland
ISBN:
Category : Science
Languages : en
Pages : 494
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Book Description
This volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field. A selection of contents: Deposition. Photo-assisted MOVPE growth of calcium fluoride (K.J. Mackey et al.). XPS characterization of chromium films deposited from Cr(CO) 6 at 248 nm (R. Nowak et al.). The chemistry of alkyl - aluminum compounds during laser-assisted chemical vapor deposition (G.S. Higashi). Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm. (E. Boch et al.). Growth processes of epitaxial metal films on semiconductor and insulator substrates by ionized cluster beam (I. Yamada). Kinetics and mechanisms of CW laser induced deposition of metals for microelectronics (G. Auvert). Damage Mechanisms. Modelling of lattice damage accumulation during high energy ion implantation (N. Hecking, E.H. te Kaat). Defects created by 3.5 GeV xenon ions in silicon (P. Mary et al.). Mixing, Crystallisation and Synthesis. Material transformations in semiconductor and magnetic thin films (E.E. Marinero). Explosive crystallization of amorphous silicon: triggering and propagation (W.C. Sinke et al.). Structural changes in Au x Si 1-x alloy films under laser irradiation (J. Marfaing et al.). Ion-assisted recrystallization of amorphous silicon (F. Priola et al.). Ion beam synthesis of buried compound layers: accomplishments and perspectives (A. Golanski). Epitaxial lateral overgrowth of amorphous CVD silicon films induced by ion irradiation (M. Voelskow et al.). Wear resistant coatings produced by C + implantation (C. Neelmeijer et al.). Laser surface alloying of Ni film on A1-based alloy (E. Gaffet et al.). Dielectrics. Photoenhanced CVD of hydrogenated amorphous silicon using an internal hydrogen discharge lamp (W.I. Milne et al.). Laser assisted synthesis of ultrafine silicon powder (R. Fantoni et al.). Doping. Excimer laser induced melting of heavily doped silicon: a contribution to the optimization of the laser doping process (E. Fogarassy et al.). In-situ doping of silicon using the gas immersion laser doping (GILD) process (P.G. Carey et al.). Laser solid-phase doping of semiconductors (A.M. Prokhorov et al.). Ablation. Photoablation of polyimide with IR and UV laser radiation (R. Braun et al.). Resputtering of low-energy implanted inert gases: an angle-resolved time-of-flight study (J. van Zwol et al.). Deposition of Y-Ba-Cu oxide superconducting thin films by Nd:YAG laser evaporation (W. Marine et al.). Cluster ion formation by laser evaporation of solid complex oxides (A. Mele et al.). Geometric optimisation for the deposition of high temperature superconductors (M. Brown et al.). Nucleation and growth of laser-plasma deposited thin films (S. Metev, K. Meteva). Etching. Time of flight study of low pressure laser etching of silicon by chlorine (J. Boulmer et al.). Nanosecond excimer laser-enhanced chemical etching (T.S. Baller, J. Dieleman). Laser patterned desorption within an upflow metalorganic chemical vapor deposition reactor (J.E. Epler et al.). Ion beam assisted etching of silicon with bromine. The role of the adsorbed state (G.C. Tyrrell et al.). Surface modification of low density polyethylene by N + , Ar + ion implantation for space charge devices (S. Kuniyoshi e
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 838
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