Infrared Matrix Isolation Studies of the Reaction of Trimethylaluminum with Ozone PDF Download

Author: Huongtrandiep Phan
Publisher:
ISBN:
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Languages : en
Pages : 40

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Book Description
The utilization of metal oxide thin films in the microelectronics field as well as in solar energy conversion, laser production and in many other areas has grown rapidly together with the methods to produce these films. In this study, we will discuss the mechanism of the reaction of ozone with trimethylaluminum Al(CH3)3, which has been utilized for the synthesis of aluminum oxide thin films in industry. Al2O3 thin films have attracted substantial interest due to its relatively high dielectric constant, high radiation resistance and high thermal conductivity, also thermal and chemical stability on Si substrates. A detailed understanding of the mechanism of the reaction of O3 with Al(CH3)3 in gas phase can be useful for the engineers to modify the reactor design to synthesize higher quality thin films. Matrix isolation technique, combined with infrared spectroscopy, has been used in this study to isolate and characterize the reactive intermediates of this reaction. Merged jet, twin jet and concentric jet codeposition of the samples, together with 18O isotopic labeling experiments led to the isolation of formaldehyde and ethane as primary products and other initial products. Those results suggest a mechanism in which the initial step involves the formation of an excited H3CO radical by the oxidation of the Al-C bond. Twin jet codeposition led to the final spectra with extremely weak intensity of the product bands. Density functional theory calculations at the B3LYP/6-311++G(d,2p) level have been carried out to support the identification of the possible products.