Infrared Frequency Selective Surfaces Fabricated Using Optical Lithography and Phase-Shift Masks PDF Download
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Author:
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Category :
Languages : en
Pages :
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Book Description
A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the bandgap of the thermophotovoltaic cell while transmitting the usable light above the bandgap. This behavior is relatively independent of the light's incident angle. The fabrication of the FSS was done using optical lithography and a phase-shift mask. The FSS cell consisted of circular slits spaced by 1100 nm. The diameters and widths of the circular slits were 870 nm and 120 nm, respectively. The FSS was predicted to pass wavelengths near 7 [mu]m and reflect wavelengths outside of this pass-band. The FSSs fabricated performed as expected with a pass-band centered near 5 [mu]m.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the bandgap of the thermophotovoltaic cell while transmitting the usable light above the bandgap. This behavior is relatively independent of the light's incident angle. The fabrication of the FSS was done using optical lithography and a phase-shift mask. The FSS cell consisted of circular slits spaced by 1100 nm. The diameters and widths of the circular slits were 870 nm and 120 nm, respectively. The FSS was predicted to pass wavelengths near 7 [mu]m and reflect wavelengths outside of this pass-band. The FSSs fabricated performed as expected with a pass-band centered near 5 [mu]m.
Author: Thomas Bauer
Publisher: Springer Science & Business Media
ISBN: 3642199658
Category : Technology & Engineering
Languages : en
Pages : 213
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Book Description
Thermophotovoltaics is the science and technology associated with the direct generation of electricity from high temperature heat. Potential applications include combined heat and power, portable and auxiliary power, radioisotope space power, industrial waste heat recovery and concentrated solar power. This book aims at serving as an introduction to the underlying theory, overview of present day components and system arrangements, and update of the latest developments in the field. The emphasis is placed on the understanding of the critical aspects of efficient thermophotovoltaic system design. The aim is to assist researchers in the field.
Author: Lincoln Laboratory
Publisher:
ISBN:
Category : Solids
Languages : en
Pages : 318
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Book Description
Author: Ashok Gopinath
Publisher: American Institute of Physics
ISBN:
Category : Science
Languages : en
Pages : 514
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Book Description
Thermophotovoltaic (TPV) technology is a promising new means for the direct conversion of thermal to electric energy. This conference volume presents a broad range of peer-reviewed papers on various potential and current applications.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 7
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Book Description
This paper describes the design and fabrication of multiband infrared frequency selective surfaces (FSSs) that consist of selfsimilar fractal cross dipole metallic elements patterned on flexible dielectric substrates. Two transmission stopbands centered at 6.4 THz (15.3 dB) and 17.5 THz ( -6.2 dB) were measured on FSSs with primary and secondary cross elements that are 17 m and 7 m long and 1 m wide. These properties correspond well to those predicted by a periodic method of moments model that was used to formulate electromagnetic scattering from this FSS. Future work will include modulating passband frequencies through field-controlled modulations of the physical properties of the substrate.
Author: Yang Liu
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 142
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Book Description
"The Semiconductor Industry Association Roadmap 2003 has put 157 nm optical lithography as the next generation lithography wavelength for the node of 70 nm integrated circuits and below. The small departure from 193 nm puts more challenge on imaging tools and processes. One of the crucial areas is the exploration of thin film optical materials for mask coatings at vacuum ultraviolet (VUV) wavelength. Attenuated Phase Shift Mask (APSM) is one of the optical enhancement technologies pushing critical dimension of lithography to diffraction limits. As no existing single material satisfies those demanding requirements of APSM, non-stoichiometric composite materials will be explored ... In this case, the individual dielectric response of those constituents must be combined in an effective model to reproduce composite film dielectric response. The relationships between thin film microstructure and optical properties are extremely useful for hte development and characterization of thin films. Effective Media Approximation (EMA) theory will bridge thin film composition and/or microstructure to optical properties. ... This thesis worked on several potential Al2O3 hosted composite materials. By carefully combining the absorbing and non-absorbing components based on the database of RIT lithography research group for optical properties of various materials, the optical properties of the composite thin film can be tailored to achieve the desired requirements by adjusting the deposition conditions, which include reactive gas partial pressure, power and time. Four promising Al2O3 hosted composite materials were proposed and two of them were fabricated and tested with satisfactory results"--Abstract.
Author:
Publisher:
ISBN:
Category : Electronic journals
Languages : en
Pages : 486
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Book Description
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 804
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Book Description
Author:
Publisher:
ISBN:
Category : Optical instruments
Languages : en
Pages : 996
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Book Description
Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
Author: Chris Mack
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
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Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
