Author: Joginder Singh Galsin
Publisher: Springer Science & Business Media
ISBN: 9780306465741
Category : Science
Languages : en
Pages : 558
Book Description
Theoretical understanding of electronic properties of metallic alloys is of great importance from both fundamental and technological points of view.
Impurity Scattering in Metallic Alloys
Author: Joginder Singh Galsin
Publisher: Springer Science & Business Media
ISBN: 9780306465741
Category : Science
Languages : en
Pages : 558
Book Description
Theoretical understanding of electronic properties of metallic alloys is of great importance from both fundamental and technological points of view.
Publisher: Springer Science & Business Media
ISBN: 9780306465741
Category : Science
Languages : en
Pages : 558
Book Description
Theoretical understanding of electronic properties of metallic alloys is of great importance from both fundamental and technological points of view.
Impurities in Metals
Author: Colin James Smithells
Publisher:
ISBN:
Category : Metallography
Languages : en
Pages : 226
Book Description
Publisher:
ISBN:
Category : Metallography
Languages : en
Pages : 226
Book Description
Metal Impurities in Silicon-Device Fabrication
Author: Klaus Graff
Publisher: Springer Science & Business Media
ISBN: 3642975933
Category : Technology & Engineering
Languages : en
Pages : 228
Book Description
A discussion of the different mechanisms responsible for contamination together with a survey of their impact on device performance. The author examines the specific properties of main and rare impurities in silicon, as well as the detection methods and requirements in modern technology. Finally, impurity gettering is studied along with modern techniques to determine gettering efficiency. Throughout all of these subjects, the book presents only reliable and up-to-date data so as to provide a thorough review of recent scientific investigations.
Publisher: Springer Science & Business Media
ISBN: 3642975933
Category : Technology & Engineering
Languages : en
Pages : 228
Book Description
A discussion of the different mechanisms responsible for contamination together with a survey of their impact on device performance. The author examines the specific properties of main and rare impurities in silicon, as well as the detection methods and requirements in modern technology. Finally, impurity gettering is studied along with modern techniques to determine gettering efficiency. Throughout all of these subjects, the book presents only reliable and up-to-date data so as to provide a thorough review of recent scientific investigations.
Impurities in Engineering Materials
Author: Clyde Briant
Publisher: Routledge
ISBN: 1351439065
Category : Technology & Engineering
Languages : en
Pages : 328
Book Description
Provides a state-of-the-art account of the various effects of impurities on the properties of engineering alloys. Outlines a wide range of methods for producing cleaner alloys. Traces the technological advances that allow the economical manufacture of purer materials.
Publisher: Routledge
ISBN: 1351439065
Category : Technology & Engineering
Languages : en
Pages : 328
Book Description
Provides a state-of-the-art account of the various effects of impurities on the properties of engineering alloys. Outlines a wide range of methods for producing cleaner alloys. Traces the technological advances that allow the economical manufacture of purer materials.
Impurities in Metals
Author: Colin James Smithells
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
Metal Impurities in Silicon- and Germanium-Based Technologies
Author: Cor Claeys
Publisher: Springer
ISBN: 3319939254
Category : Technology & Engineering
Languages : en
Pages : 464
Book Description
This book provides a unique review of various aspects of metallic contamination in Si and Ge-based semiconductors. It discusses all of the important metals including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on electrical devices’ performance. Several control and possible gettering approaches are addressed. The book offers a valuable reference guide for all researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. Adopting an interdisciplinary approach, it combines perspectives from e.g. material science, defect engineering, device processing, defect and device characterization, and device physics and engineering.
Publisher: Springer
ISBN: 3319939254
Category : Technology & Engineering
Languages : en
Pages : 464
Book Description
This book provides a unique review of various aspects of metallic contamination in Si and Ge-based semiconductors. It discusses all of the important metals including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on electrical devices’ performance. Several control and possible gettering approaches are addressed. The book offers a valuable reference guide for all researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. Adopting an interdisciplinary approach, it combines perspectives from e.g. material science, defect engineering, device processing, defect and device characterization, and device physics and engineering.
Impurities and Imperfections
Author: American Society for Metals
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 248
Book Description
"Background information on the three major types of imperfections - point (lattice vacancies and interstitials), line (dislocations), and surface (grain and sub-grain boundaries) - is first presented. This is followed by discussions of the effects of both impurities and imperfections on metallurgical reactions (grain growth, diffusion, and transformation) and on properties (mechanical, electrical, chemical). Finally, papers on semiconductors, ionic crystals, and radiation effects are given because of the very significant contributions to this general field by physicists working on these materials."--Foreword.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 248
Book Description
"Background information on the three major types of imperfections - point (lattice vacancies and interstitials), line (dislocations), and surface (grain and sub-grain boundaries) - is first presented. This is followed by discussions of the effects of both impurities and imperfections on metallurgical reactions (grain growth, diffusion, and transformation) and on properties (mechanical, electrical, chemical). Finally, papers on semiconductors, ionic crystals, and radiation effects are given because of the very significant contributions to this general field by physicists working on these materials."--Foreword.
Impurities in Metals. Their Influence on Structure and Properties. 2. Ed. Rev
Author: Colin J. Smithells
Publisher:
ISBN:
Category :
Languages : en
Pages : 190
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 190
Book Description
Impurities in Engineering Materials
Author: Clyde Briant
Publisher: Routledge
ISBN: 1351439073
Category : Technology & Engineering
Languages : en
Pages : 319
Book Description
Provides a state-of-the-art account of the various effects of impurities on the properties of engineering alloys. Outlines a wide range of methods for producing cleaner alloys. Traces the technological advances that allow the economical manufacture of purer materials.
Publisher: Routledge
ISBN: 1351439073
Category : Technology & Engineering
Languages : en
Pages : 319
Book Description
Provides a state-of-the-art account of the various effects of impurities on the properties of engineering alloys. Outlines a wide range of methods for producing cleaner alloys. Traces the technological advances that allow the economical manufacture of purer materials.
Measuring Elemental Impurities in Pharmaceuticals
Author: Robert Thomas
Publisher: CRC Press
ISBN: 1351984403
Category : Medical
Languages : en
Pages : 474
Book Description
Recent regulations on heavy metal testing have required the pharmaceutical industry to monitor a suite of elemental impurities in pharmaceutical raw materials, drug products and dietary supplements. These new directives s are described in the new United States Pharmacopeia (USP) Chapters , , and , together with Q3D, Step 4 guidelines for elemental impurities, drafted by the ICH (International Conference on Harmonization of Technical Requirements for Registration of Pharmaceuticals for Human Use), a consortium of global pharmaceutical associations, including the European Pharmacopeia (Ph.Eur.), the Japanese Pharmacopeia (JP) and the USP. This book provides a complete guide to the analytical methodology, instrumental techniques and sample preparation procedures used for measuring elemental impurities in pharmaceutical and nutraceutical materials. It offers readers the tools to better understand plasma spectrochemistry to optimize detection capability for the full suite of elemental PDE (Permitted Daily Exposure) levels in the various drug delivery categories. Other relevant information covered in the book includes: The complete guide to measuring elemental impurities in pharmaceutical and nutraceutical materials. Covers heavy metals testing in the pharmaceutical industry from an historical perspective. Gives an overview of current USP Chapters and and ICH Q3D Step 4 Guidelines. Explains the purpose of validation protocols used in Chapter , including how J-values are calculated Describes fundamental principles and practical capabilities of ICP-MS and ICP-OES. Offers guidelines about the optimum strategy for risk assessment Provides tips on how best to prepare and present your data for regulatory inspection. An indispensable resource, the fundamental principles and practical benefits of ICP-OES and ICP-MS are covered in a reader-friendly format that a novice, who is carrying out elemental impurities testing in the pharmaceutical and nutraceutical communities, will find easy to understand.
Publisher: CRC Press
ISBN: 1351984403
Category : Medical
Languages : en
Pages : 474
Book Description
Recent regulations on heavy metal testing have required the pharmaceutical industry to monitor a suite of elemental impurities in pharmaceutical raw materials, drug products and dietary supplements. These new directives s are described in the new United States Pharmacopeia (USP) Chapters , , and , together with Q3D, Step 4 guidelines for elemental impurities, drafted by the ICH (International Conference on Harmonization of Technical Requirements for Registration of Pharmaceuticals for Human Use), a consortium of global pharmaceutical associations, including the European Pharmacopeia (Ph.Eur.), the Japanese Pharmacopeia (JP) and the USP. This book provides a complete guide to the analytical methodology, instrumental techniques and sample preparation procedures used for measuring elemental impurities in pharmaceutical and nutraceutical materials. It offers readers the tools to better understand plasma spectrochemistry to optimize detection capability for the full suite of elemental PDE (Permitted Daily Exposure) levels in the various drug delivery categories. Other relevant information covered in the book includes: The complete guide to measuring elemental impurities in pharmaceutical and nutraceutical materials. Covers heavy metals testing in the pharmaceutical industry from an historical perspective. Gives an overview of current USP Chapters and and ICH Q3D Step 4 Guidelines. Explains the purpose of validation protocols used in Chapter , including how J-values are calculated Describes fundamental principles and practical capabilities of ICP-MS and ICP-OES. Offers guidelines about the optimum strategy for risk assessment Provides tips on how best to prepare and present your data for regulatory inspection. An indispensable resource, the fundamental principles and practical benefits of ICP-OES and ICP-MS are covered in a reader-friendly format that a novice, who is carrying out elemental impurities testing in the pharmaceutical and nutraceutical communities, will find easy to understand.