Formation of Silicon Nitride from the 19th to the 21st Century PDF Download
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Author: Raymond C. Sangster
Publisher: Trans Tech Publications Ltd
ISBN: 3038269018
Category : Technology & Engineering
Languages : en
Pages : 1016
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Book Description
The elements: Si, N, O, C and H, have strong chemical affinities for one another. Under the correct conditions, Si-N bonding will occur in almost any Si-N-(O/C/H), and many related, reaction systems; although Si-O and Si-C are formidable competitors to Si-N. The most favored Si-N compound is stoichiometric Si3N4. It comes in three common varieties. How they interrelate, how one finds them and (above all ) how one makes them - and how sometimes they just happen to form - are the subjects of this book, with due attention being paid to closely related matters. This revised second edition summarizes and integrates what is recorded in the world literature from 1857through 2014 as being known about the formation of silicon nitride Si3N4 and itsclose relatives. The book is the key to all that has been learned, over the past 150 years, about how silicon nitride comes to exist: in nature, in the laboratory or in the factory and in many reaction systems; together with how it is used in ceramics, electronic films, optical coatings and many other ways (including an introduction to closely related substances). It will aid the researcher in designing new projects, the supervisor in briefing new employees, the salesman in working with new customers, the patent attorney in assessing patents and the professor in designing graduate course assignments. This comprehensive reference gathers information published on the chemistry of silicon nitride and its products, uses, and markets. Separate chapters overview the manufacture of silicon nitride powder, the production of silicon nitride ceramics via the reaction bonding process, the intrinsic reactions between crystalline silicon surfaces and N2 for silicon wafers, nitridation of Si-O based materials, and chemical vapor deposition of Si-H compounds.
Author: Raymond C. Sangster
Publisher: Trans Tech Publications Ltd
ISBN: 3038269018
Category : Technology & Engineering
Languages : en
Pages : 1016
Get Book Here
Book Description
The elements: Si, N, O, C and H, have strong chemical affinities for one another. Under the correct conditions, Si-N bonding will occur in almost any Si-N-(O/C/H), and many related, reaction systems; although Si-O and Si-C are formidable competitors to Si-N. The most favored Si-N compound is stoichiometric Si3N4. It comes in three common varieties. How they interrelate, how one finds them and (above all ) how one makes them - and how sometimes they just happen to form - are the subjects of this book, with due attention being paid to closely related matters. This revised second edition summarizes and integrates what is recorded in the world literature from 1857through 2014 as being known about the formation of silicon nitride Si3N4 and itsclose relatives. The book is the key to all that has been learned, over the past 150 years, about how silicon nitride comes to exist: in nature, in the laboratory or in the factory and in many reaction systems; together with how it is used in ceramics, electronic films, optical coatings and many other ways (including an introduction to closely related substances). It will aid the researcher in designing new projects, the supervisor in briefing new employees, the salesman in working with new customers, the patent attorney in assessing patents and the professor in designing graduate course assignments. This comprehensive reference gathers information published on the chemistry of silicon nitride and its products, uses, and markets. Separate chapters overview the manufacture of silicon nitride powder, the production of silicon nitride ceramics via the reaction bonding process, the intrinsic reactions between crystalline silicon surfaces and N2 for silicon wafers, nitridation of Si-O based materials, and chemical vapor deposition of Si-H compounds.
Author: Raymond C. Sangster
Publisher: Trans Tech Publications
ISBN:
Category : Science
Languages : en
Pages : 968
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Book Description
This comprehensive reference gathers information published on the chemistry of silicon nitride and its products, uses, and markets. Separate chapters overview the manufacture of silicon nitride powder, the production of silicon nitride ceramics via the reaction bonding process, the intrinsic reactions between crystalline silicon surfaces and N2 for silicon wafers, nitridation of Si-O based materials, and chemical vapor deposition of Si-H compounds. The author, who originally worked on a similar book for the Gmelin Institute, cites 4,000-plus source documents and points the researcher to relevant handbooks, papers, and review articles for further reading. Distributed in the U.S. by Enfield. Annotation : 2005 Book News, Inc., Portland, OR (booknews.com).
Author: Raymond C. Sangster
Publisher: Trans Tech Publications Ltd
ISBN: 3038130427
Category : Technology & Engineering
Languages : en
Pages : 960
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Book Description
The elements: Si, N, O, C and H, have strong chemical affinities for one another. Under the correct conditions, Si-N bonding will occur in almost any Si-N-(O/C/H), and many related, reaction systems; although Si-O and Si-C are formidable competitors to Si-N. The most favored Si-N compound is stoichiometric Si3N4. It comes in three common varieties. How they interrelate, how one finds them and (above all ) how one makes them - and how sometimes they just happen to form - are the subjects of this book, with due attention being paid to closely related matters.
Author: R. F. Horsley
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: Diego Campos-Loriz
Publisher:
ISBN:
Category :
Languages : en
Pages : 294
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Book Description
Author: Robert B. Heimann
Publisher: John Wiley & Sons
ISBN: 352763018X
Category : Technology & Engineering
Languages : en
Pages : 573
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Book Description
Based on the author's lectures to graduate students of geosciences, physics, chemistry and materials science, this didactic handbook covers basic aspects of ceramics such as composition and structure as well as such advanced topics as achieving specific functionalities by choosing the right materials. The focus lies on the thermal transformation processes of natural raw materials to arrive at traditional structural ceramics and on the general physical principles of advanced functional ceramics. The book thus provides practice-oriented information to readers in research, development and engineering on how to understand, make and improve ceramics and derived products, while also serving as a rapid reference for the practitioner. The choice of topics and style of presentation make it equally useful for chemists, materials scientists, engineers and mineralogists.
Author: Emiliano Jose Hierra
Publisher: Nova Science Publishers
ISBN: 9781619428652
Category : Silicon nitride
Languages : en
Pages : 0
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Book Description
Silicon nitride (Si3N4) ceramic is used in numerous applications because of its superior properties, such as high-temperature strength, good oxidation resistance and low thermal expansion coefficient. In this book, the authors present current research in the study of the synthesis, properties and applications of silicon nitride. Topics include the optical and vibration properties of silicon rich nitride; high temperature oxidation of silicon nitride based ceramics; low temperature preparation of phosphate bonded silicon nitride ceramics with high mechanical strength; the SPS-sintering process and use of ceramics for high-temperature engineering applications; synthesis and properties of silicon nitride coatings; and the use of silicon nitride as biomaterial.
Author: Robert C. Johnson
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 34
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Book Description
Author: S. P. Rathband
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Book Description
Author: John T. Milek
Publisher: Springer Science & Business Media
ISBN: 1468461621
Category : Technology & Engineering
Languages : en
Pages : 126
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Book Description
The large amount of literature on the technology of thin film silicon nitride indi cates the interest of the Department of Defense, NASA and the semiconductor industry in the development and full utilization of the material. This survey is concerned only with the thin film characteristics and properties of silicon nitride as currently utilized by the semiconductor or microelectronics industry. It also includes the various methods of preparation. Applications in microelectronic devices and circuits are to be provided in Part 2 of the survey. Some bulk silicon nitride property data is included for basic reference and comparison purposes. The survey specifically excludes references and information not within the public domain. ACKNOWLEDGEMENT This survey was generated under U.S. Air Force Contract F33615-70-C-1348, with Mr. B.R. Emrich (MAAM) Air Force Materials Laboratory, Wright-Patterson Air Force Base, Ohio acting as Project Engineer. The author would like to acknowledge the assis tance of Dr. Judd Q. Bartling, Litton Systems, Inc., Guidance and Control Systems Division, Woodland Hills, California and Dr. Thomas C. Hall, Hughes Aircraft Company, Culver City, California in reviewing the survey. v CONTENTS Preface. i Introduction 1 Literature Review. 1 Bulk Characteristics 1 Technology Overview. 2 References 4 Methods of Preparation • 5 Introduction • 5 Direct Nitridation Method 8 Evaporation Method • 9 Glow Discharge Method. 10 Ion Beam Method. 13 Sputtering Methods 13 Pyrolytic Methods. 15 Silane and Ammonia Reaction 15 Silicon Tetrachloride and Tetrafluoride Reaction. 24 Silane and Hydrazine Reaction 27 Production Operations. 28 Equipment.
