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Author:
Publisher:
ISBN:
Category : Dielectrics
Languages : en
Pages : 448
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Book Description
Author:
Publisher:
ISBN:
Category : Dielectrics
Languages : en
Pages : 448
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Book Description
Author: Nini Pryds
Publisher:
ISBN: 9780128104187
Category :
Languages : en
Pages : 562
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Book Description
Author:
Publisher:
ISBN:
Category : Dielectrics
Languages : en
Pages : 514
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Book Description
Author: Satishchandra B. Ogale
Publisher: Springer Science & Business Media
ISBN: 0387260897
Category : Technology & Engineering
Languages : en
Pages : 416
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Book Description
Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.
Author: James S. Speck
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 588
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Book Description
Our understanding and control of epitaxial oxide heterostructures has progressed along multiple frontiers including magnetic, dielectric, ferroelectric, and superconducting oxide materials. This has resulted in both independent rediscovery and the successful borrowing of ideas from ceramic science, solid-state physics, and semiconductor epitaxy. A new field of materials science has emerged which aims at the use of the intrinsic properties of various oxide materials in single-crystal thin-film form. Exploiting the potential of these materials, however, will only be possible if many fundamental and engineering questions can be answered. This book represents continued progress toward fulfilling that promise. Technical information on epitaxial oxide thin films from industry, academia and government laboratories is presented. Topics include: dielectrics; ferroelectrics; optics; superconductors; magnetics; magnetoresistance.
Author: Yuan Lin
Publisher: John Wiley & Sons
ISBN: 3527696458
Category : Technology & Engineering
Languages : en
Pages : 328
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Book Description
This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.
Author: Faezeh Alijan Farzad Lahiji
Publisher: Linköping University Electronic Press
ISBN: 9180759386
Category :
Languages : en
Pages : 90
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Book Description
** The abstract is shortened due to advanced notations. See the PDF for the full abstract ** In this thesis, the aim is to understand mechanisms behind epitaxial growth, control the crystallinity and properties of grown films, and differentiate between two types of epitaxy: conventional epitaxy, driven by strong chemical bonds between the film and substrate, and van der Waals epitaxy (vdWE), characterized by weaker van der Waals forces, enabling stress-free growth without strict lattice matching. I investigated the epitaxial growth of transition metal oxides and nitrides (NiO, CrN, MoOx (x = 2, 3)) thin films synthesized by reactive magnetron sputtering on various substrates, including silicon, sapphire (c-plane and r-plane) and mica.
Author: David K. Fork
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 432
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Uwe Schroeder
Publisher: Woodhead Publishing
ISBN: 0081024312
Category : Technology & Engineering
Languages : en
Pages : 572
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Book Description
Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. - Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices - Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more - Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face
Author: Vijay Narayanan
Publisher:
ISBN: 9789814740487
Category : Electronic books
Languages : en
Pages : 550
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Book Description
"This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted."--Publisher's website.
