Elastic Properties of Advanced Superhard Thin Films by Surface Brillouin Scattering: Effects of Structure and P-T Environments PDF Download
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Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 189
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Book Description
Recent theoretical predictions of the new superhard materials and production of the new superhard films such as cubic boron nitride (cBN), carbon nitride Beta-C3N4, B4C and chemical vapor deposited (CVD) diamond films have surged considerable interest in mechanical properties of thin hard and superhard films. Their hardness and abrasive qualities, highly valued in applied technology and defense industry, are controlled by their large elastic moduli. Elastic properties of the superhard films need to be determined experimentally because they strongly depend on the synthesis conditions, and they cannot be derived from theoretical considerations and modeling alone. The goals of this project were to determine the elastic properties and microstructure of the new superhard thin (30-500 nm) coatings, such as those based on the B-C-N triangle, by surface Brillouin spectroscopy (SBS), in conjunction with atomic force microscopy, as a function of composition, structure and P-T environments. We focused our research work on thin films that had best mechanical properties. Results of the research conducted have so far resulted in 17 publications.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 189
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Book Description
Recent theoretical predictions of the new superhard materials and production of the new superhard films such as cubic boron nitride (cBN), carbon nitride Beta-C3N4, B4C and chemical vapor deposited (CVD) diamond films have surged considerable interest in mechanical properties of thin hard and superhard films. Their hardness and abrasive qualities, highly valued in applied technology and defense industry, are controlled by their large elastic moduli. Elastic properties of the superhard films need to be determined experimentally because they strongly depend on the synthesis conditions, and they cannot be derived from theoretical considerations and modeling alone. The goals of this project were to determine the elastic properties and microstructure of the new superhard thin (30-500 nm) coatings, such as those based on the B-C-N triangle, by surface Brillouin spectroscopy (SBS), in conjunction with atomic force microscopy, as a function of composition, structure and P-T environments. We focused our research work on thin films that had best mechanical properties. Results of the research conducted have so far resulted in 17 publications.
Author: K. N. Tu
Publisher: Elsevier
ISBN: 1483218295
Category : Technology & Engineering
Languages : en
Pages : 351
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Book Description
Treatise on Materials Science and Technology, Volume 24: Preparation and Properties of Thin Films covers the progress made in the preparation of thin films and the corresponding study of their properties. The book discusses the preparation and property correlations in thin film; the variation of microstructure of thin films; and the molecular beam epitaxy of superlattices in thin film. The text also describes the epitaxial growth of silicon structures (thermal-, laser-, and electron-beam-induced); the characterization of grain boundaries in bicrystalline thin films; and the mechanical properties of thin films on substrates. The ion beam modification of thin film; the use of thin alloy films for metallization in microelectronic devices; and the fabrication and physical properties of ultrasmall structures are also encompassed. Materials scientists and materials engineers will find the book invaluable.
Author: Hari Singh Nalwa
Publisher: Academic Press
ISBN: 0125129084
Category : Science
Languages : en
Pages : 661
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Book Description
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Book Description
We have developed new approaches to synthesize superhard/ultrastrong thin films and coatings by chemical vapor deposition (CVD) of unimolecular precursors, and to monitor and characterize the film-growth process in situ and in real time. To this end, we have designed and constructed an ultrahigh vacuum CVD chamber fitted with energy-dispersive x-ray reflectivity (XRR) and multiple- beam optical stress sensor (MOSS) for in situ monitoring of surface morphology and stress evolution of the films under growth. Both of these techniques were applied to the CVD growth of boron and GaN films. We have synthesized novel precursors of C3N3P, Si4CN4, LiBC4N4, BC3N3, BeC2N2, MgC2N2 for CVD growth of films with properties of superhardness. We have also deposited thin films by CVD with the composition of Zr-B-Si-N via reactions of Zr(BH4)4 with SiH4, and Zr(BH4)4 with N(SiH3)4. The elastic constants cli and c44 of these films measured by Brillouin scattering in collaboration with Prof. Sooryakumar of Ohio State University produced results suggesting that films and coatings based on the Zr-B-Si-N system exhibit promising superhard properties.
Author: Maurice H. Francombe
Publisher: Elsevier
ISBN: 1483103307
Category : Science
Languages : en
Pages : 262
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Book Description
Physics of Thin Films: Advances in Research and Development primarily deals with the influence of ions or optical energy on the deposition, properties, and etching on thin films. The book is a collection of five articles, with one article per chapter. Chapter 1 covers ionized cluster beam deposition; epitaxy; and film-formation mechanism. Chapter 2 discusses the activated reactive evaporation process; the deposition of refractory compounds; the role of plasma in the process; and its applications. Chapter 3 focuses on ion-beam processing of optical thin films; ion sources and ion-surface interactions; and the different kinds of bombardment involved. Chapter 4 deals with laser induced etching - its mechanisms, methods, and applications. Chapter 5 talks about contacts to GaAs devices; Fermi-level pinning; and heterojunction contacts. The book is recommended for physicists and engineers in the field of electronics who would like to know more about thin films and the progresses in the field.
Author: Hari Singh Nalwa
Publisher: Elsevier
ISBN: 0080533248
Category : Technology & Engineering
Languages : en
Pages : 3436
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Book Description
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures.Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices.Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
Author: Jagannathan Thirumalai
Publisher: BoD – Books on Demand
ISBN: 9535130676
Category : Science
Languages : en
Pages : 222
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Book Description
The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.
Author: Francesco Cino Matacotta
Publisher: World Scientific
ISBN: 9814500747
Category : Technology & Engineering
Languages : en
Pages : 369
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Book Description
This book brings together detailed discussions by leading experts on the various innovative aspects of thin films growth, deposition and characterization techniques, and new thin film materials and devices. It addresses through the different viewpoints of the contributors, the major problem of thin films science - the relation between the energy of the condensing species and the resulting properties of the films. Some of the issues considered include energetic condensation, bombardment stabilization, pulsed electron beam ablation, orientation and self-organization of organic, ferroelectric and nanoparticle thin films. Several chapters focus on applications such as the recent developments in organic optoelectronics, large area electronic technology and superconducting thin film devices.
Author: Jianguo Zhu
Publisher: World Scientific
ISBN: 9811224005
Category : Science
Languages : en
Pages : 706
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Book Description
Thin films have an extremely broad range of applications from electronics and optics to new materials and devices. Collaborative and multidisciplinary efforts from physicists, materials scientists, engineers and others have established and advanced a field with key pillars constituting (i) the synthesis and processing of thin films, (ii) the understanding of physical properties in relation to the nanometer scale, (iii) the design and fabrication of nano-devices or devices with thin film materials as building blocks, and (iv) the design and construction of novel tools for characterization of thin films.Against the backdrop of the increasingly interdisciplinary field, this book sets off to inform the basics of thin film physics and thin film devices. Readers are systematically introduced to the synthesis, processing and application of thin films; they will also study the formation of thin films, their structure and defects, and their various properties — mechanical, electrical, semiconducting, magnetic, and superconducting. With a primary focus on inorganic thin film materials, the book also ventures on organic materials such as self-assembled monolayers and Langmuir-Blodgett films.This book will be effective as a teaching or reference material in the various disciplines, ranging from Materials Science and Engineering, Electronic Science and Engineering, Electronic Materials and Components, Semiconductor Physics and Devices, to Applied Physics and more. The original Chinese publication has been instrumental in this purpose across many Chinese universities and colleges.
Author: Alfred Wagendristel
Publisher: World Scientific
ISBN: 9789810216160
Category : Science
Languages : en
Pages : 170
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Book Description
Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics ? ferromagnetic films, diffusion in thin films and mechanical properties of thin films ? are discussed.Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.
