Effect of Annealing on Copper Thin Films PDF Download
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Author: Parag Gadkari
Publisher:
ISBN:
Category :
Languages : en
Pages : 80
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Book Description
Lastly, it is also observed that the tendency for agglomeration can be reduced by encapsulating the metal film with an oxide overlayer, which in turn improves the resistivity of the thin film due to prolonged grain growth without film breakup.
Author: Milton Ohring
Publisher: Academic Press
ISBN: 9780125249904
Category : Science
Languages : en
Pages : 744
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Book Description
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.
Author: Daniela Nunes
Publisher: Elsevier
ISBN: 012811505X
Category : Technology & Engineering
Languages : en
Pages : 331
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Book Description
Metal Oxide Nanostructures: Synthesis, Properties and Applications covers the theoretical and experimental aspects related to design, synthesis, fabrication, processing, structural, morphological, optical and electronic properties on the topic. In addition, it reviews surface functionalization and hybrid materials, focusing on the advantages of these oxide nanostructures. The book concludes with the current and future prospective applications of these materials. Users will find a complete overview of all the important topics related to oxide nanostructures, from the physics of the materials, to its application. - Delves into hybrid structured metal oxides and their promising use in the next generation of electronic devices - Includes fundamental chapters on synthesis design and the properties of metal oxide nanostructures - Provides an in-depth overview of novel applications, including chromogenics, electronics and energy
Author: T W Duerig
Publisher: Butterworth-Heinemann
ISBN: 1483144755
Category : Technology & Engineering
Languages : en
Pages : 512
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Book Description
Engineering Aspects of Shape Memory Alloys provides an understanding of shape memory by defining terms, properties, and applications. It includes tutorials, overviews, and specific design examples—all written with the intention of minimizing the science and maximizing the engineering aspects. Although the individual chapters have been written by many different authors, each one of the best in their fields, the overall tone and intent of the book is not that of a proceedings, but that of a textbook. The book consists of five parts. Part I deals with the mechanism of shape memory and the alloys that exhibit the effect. It also defines many essential terms that will be used in later parts. Part II deals primarily with constrained recovery, but to some extent with free recovery. There is an introductory paper which defines terms and principles, then several specific examples of products based on constrained recovery. Both Parts III and IV deal with actuators. Part III introduces engineering principles while Part IV presents several of the specific examples. Finally, Part V deals with superelasticity, with an introductory paper and then several specific examples of product engineering.
Author: Alexander D. Pogrebnjak
Publisher: Springer
ISBN: 9811361339
Category : Technology & Engineering
Languages : en
Pages : 380
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Book Description
This book highlights the latest advances in chemical and physical methods for thin-film deposition and surface engineering, including ion- and plasma-assisted processes, focusing on explaining the synthesis/processing–structure–properties relationship for a variety of thin-film systems. It covers topics such as advances in thin-film synthesis; new thin-film materials: diamond-like films, granular alloys, high-entropy alloys, oxynitrides, and intermetallic compounds; ultra-hard, wear- and oxidation-resistant and multifunctional coatings; superconducting, magnetic, semiconducting, and dielectric films; electrochemical and electroless depositions; thin-film characterization and instrumentation; and industrial applications.
Author: C. Suryanarayana
Publisher: Springer Science & Business Media
ISBN: 1489901485
Category : Technology & Engineering
Languages : en
Pages : 275
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Book Description
In this, the only book available to combine both theoretical and practical aspects of x-ray diffraction, the authors emphasize a "hands on" approach through experiments and examples based on actual laboratory data. Part I presents the basics of x-ray diffraction and explains its use in obtaining structural and chemical information. In Part II, eight experimental modules enable the students to gain an appreciation for what information can be obtained by x-ray diffraction and how to interpret it. Examples from all classes of materials -- metals, ceramics, semiconductors, and polymers -- are included. Diffraction patterns and Bragg angles are provided for students without diffractometers. 192 illustrations.
Author: Sadao Adachi
Publisher: John Wiley & Sons
ISBN: 1119052785
Category : Technology & Engineering
Languages : en
Pages : 848
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Book Description
Systematically describes the physical and materials properties of copper-based quaternary chalcogenide semiconductor materials, enabling their potential for photovoltaic device applications. Intended for scientists and engineers, in particular, in the fields of multinary semiconductor physics and a variety of photovoltaic and optoelectronic devices.
Author: Anatolii Papyrin
Publisher: Elsevier
ISBN: 008046548X
Category : Science
Languages : en
Pages : 341
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Book Description
The topic of this book is Cold Spray technology. Cold Spray is a process of applying coatings by exposing a metallic or dielectric substrate to a high velocity (300 to 1200 m/s) jet of small (1 to 50 μm) particles accelerated by a supersonic jet of compressed gas. This process is based on the selection of the combination of particle temperature, velocity, and size that allows spraying at the lowest temperature possible. In the Cold Spray process, powder particles are accelerated by the supersonic gas jet at a temperature that is always lower than the melting point of the material, resulting in coating formation from particles in the solid state. As a consequence, the deleterious effects of high-temperature oxidation, evaporation, melting, crystallization, residual stresses, gas release, and other common problems for traditional thermal spray methods are minimized or eliminated. This book is the first of its kind on the Cold Spray process. Cold Spray Technology covers a wide spectrum of various aspects of the Cold Spray technology, including gas-dynamics, physics of interaction of high-speed solid particles with a substrate as well as equipment, technologies, and applications. Cold Spray Technology includes the results of more than 20 years of original studies (1984-2005) conducted at the Institute of Theoretical and Applied Mechanics of the Siberian Division of the Russian Academy of Science, as well as the results of studies conducted at most of the research centres around the world. The authors' goal is threefold. The first goal is to explain basic principles and advantages of the Cold Spray process. The second goal is, to give practical information on technologies and equipment. The third goal is to present the current state of research and development in this field over the world. The book provides coverage and data that will be of interest for users of Cold Spray technology as well as for other coating experts. At the present time the Cold Spray method is recognized by world leading scientists and specialists. A wide spectrum of research is being conducted at many research centres and companies in many countries. New approach to spray coatings Results are exceptionally pure coatings Low spray temperature without degradation of powder and substrate materials High productivity, high deposition efficiency High operational safety because of absence of high temperature gas jets, radiation and explosive gases Excellent thermal and electrical conductivity Wide spectrum of applications because of important advantages of the process
Author: Alberto Palmero
Publisher: MDPI
ISBN: 3039364294
Category : Science
Languages : en
Pages : 148
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Book Description
Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.
Author: Michael David Kriese
Publisher:
ISBN:
Category :
Languages : en
Pages : 426
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Book Description
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
