Comprehensive Study of the Discharge Mode Transition in Inductively Coupled Radio Frequency Plasmas PDF Download
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Author: Thomas Wegner
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Languages : en
Pages : 0
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Author: Thomas Wegner
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Languages : en
Pages : 0
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Author: Philipp Kempkes
Publisher:
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Category :
Languages : en
Pages :
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Author: Yuri P. Raizer
Publisher: CRC Press
ISBN: 1351419951
Category : Science
Languages : en
Pages : 308
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Book Description
The first publication of its kind in the field, this book describes comprehensively and systematically radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. Text presents the physics underlying rf discharges along with techniques for obtaining such discharges, experimental methods and results, and theoretical and numerical modeling findings. Radio-Frequency Capacitive Discharges is written by well-known specialists in the field, authors of many theoretical and experimental works. They provide simple and clear discussions of complicated physical phenomena. A complete review on the state of the art is included. This interesting new book can be used as a textbook for students and postgraduates and as a comprehensive guidebook by specialists.
Author: Gerhard Franz
Publisher: Springer Science & Business Media
ISBN: 3540858490
Category : Technology & Engineering
Languages : en
Pages : 743
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Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Author:
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Category :
Languages : en
Pages : 0
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Author: V. P. Savinov
Publisher: CRC Press
ISBN: 0429894228
Category : Science
Languages : en
Pages : 405
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Book Description
This book describes the physical mechanism of high-frequency (radio-frequency) capacitive discharge (RFCD) of low and medium pressure and the properties of discharge plasma in detail. The main properties and characteristics of RFCD, the features of electric breakdown in a high-frequency field are also investigated. The properties of near-electrode layers of a spatial discharge, the nature of the electric field in them, and the processes of charge transport to electrodes are explored. The work is intended for scientists engaged in gas discharge physics and low-temperature plasmas, graduate students and students of physics, physical chemistry, and relevant specialties.
Author: Shu-Xia
Publisher:
ISBN:
Category : Electronic books
Languages : en
Pages : 0
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In this chapter, the characteristics of low-temperature inductively coupled plasma sources, that is, non-equilibrium, weakly ionized and bounded plasma, are described. The phenomenon of mode transition and hysteresis is one of the main physics aspects that happens in this source. Via a hybrid model, the behaviors of plasma parameters, electron kinetics and neutral species during mode transition are presented. Still, the role of metastables and multistep ionization on triggering the hysteresis is investigated. Using a fluid model that couples the equivalent circuit module, the discontinuity of mode transition and hysteresis are observed by tuning the matching network impedance. The work indicates the mutual interaction between the plasma and the circuit excites hysteresis. Besides these findings, the other important aspects of this phenomenon are briefly discussed. To the author, the exploration on the precursors that trigger hysteresis is the most attractive topic. The investigations advance the improvement of analytical theory, numerical modeling and experimental diagnostics of low-temperature plasma physics.
Author: Haikel Jelassi
Publisher: BoD – Books on Demand
ISBN: 1789852390
Category : Science
Languages : en
Pages : 330
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Usually called the "fourth state of matter," plasmas make up more than 99% of known material. In usual terminology, this term generally refers to partially or totally ionized gas and covers a large number of topics with very different characteristics and behaviors. Over the last few decades, the physics and engineering of plasmas was experiencing a renewed interest, essentially born of a series of important applications such as thin-layer deposition, surface treatment, isotopic separation, integrated circuit etchings, medicine, etc. Plasma Science
Author: Namjun Kang
Publisher:
ISBN:
Category :
Languages : en
Pages : 168
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Low pressure inductively coupled plasmas (ICPs) are investigated using theoretical modeling and experimental diagnostic methods. For various ICP discharges, time dependent global (volume averaged) models are developed and a number of diagnostic tools are used. In a low pressure argon discharge, a new method is proposed to improve the precision of the pressure-dependent electron temperature calculated by the line ratio method. Using the electron energy distribution functions (EEDFs) and the electron density from Langmuir probe, the coefficient of the cascade cross-section are provided as a function of the pressure for argon 4p1 and 4p5. The effective electron temperature calculated by the corrected cascade cross-section is shown and compared with Langmuir probe results. The production of argon excited states in the afterglow of pulse discharge is investigated. Experimentally time resolved optical emission spectroscopy (OES), optical absorption spectroscopy (OAS) and Langmuir probe are used to measure the emission of highly excited states, metastable atom density, electron density and electron temperature. From the time dependent global model, it is found that during the pulse-on time the electron impact excitation and the ionization from the ground state and Ar (3p54s) are the dominant population processes for all excited states. On the other hand, during the afterglow the main source of all excited states is the three body electron-ion recombination. As a consequence argon highly excited state can be populated more than during the pulse-on time. The E-H mode transition and hysteresis in low pressure argon inductively coupled discharges are investigated using the previous global model and a transformer model. The total absorbed power by plasma electrons and coil current are calculated as a function of the electron density at fixed injected power. We found that the transition is due to the difference of the absorbed power between the two modes. Moreover the calculation results show that the existence of an inaccessible region between E and H mode, as well as a threshold coil current and a minimum absorbed power for the H mode. The dissociation of the nitrogen molecule in an Ar-N2 ICP discharge is studied both experimentally and theoretically. Using the two-photon absorption laser-induced fluorescence (TALIF) an increase of the dissociation rate in highly Ar-diluted region is observed. A complete kinetic model is developed to understand the behavior of the Ar-N2 discharge. The calculated results are compared with the measured results, obtaining reasonably good agreement. In pure nitrogen discharge the N atoms are mainly created by electron impact dissociation at low pressure (20 mTorr) while it is due to metastable-metastable pooling dissociation at high pressure (200 mTorr). In Ar-N2 discharge, the N atom density increases despite less amount of N2 molecule in highly Ar-diluted region at 200 mTorr. From the model the charge transfer from Ar+ to N2 is an important source of nitrogen dissociation in Ar-N2 discharge. The global kinetic models are developed in low pressure He, Ne, Ar and Xe discharges to calculate the electron temperature and the electron density. The calculated results are compared with experiments and the dominant creation sources and the routes of loss for electron and metastable atoms are discussed as function of pressure. Finally the transformer model is used to calculate the electrical properties of He, Ne, Ar and Xe discharges.
Author: Jurgen Meichsner
Publisher: CRC Press
ISBN: 1420059211
Category : Science
Languages : en
Pages : 554
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Book Description
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant
