Chemical Vapor Deposition of Oriented Tungsten Foils for Thermionic Cathodes

Chemical Vapor Deposition of Oriented Tungsten Foils for Thermionic Cathodes PDF Author: L. Yang
Publisher:
ISBN:
Category :
Languages : en
Pages : 21

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Book Description
Efforts under the present contract were devoted to the preparation of CVD tungsten emitters containing a variety of preferred crystallographic orientations. The work is divided into two phases. In Phase I, a CVD tungsten deposition apparatus was built and CVD tungsten samples of various preferred crystallographic orientations were prepared and characterized with respect to microstructures and nature and degree of preferred orientations. These samples were delivered to NRL for the evaluation of their electron emission properties. In Phase II, efforts were made to produce a high degree of preferred crystallographic orientations in thin CVD tungsten deposits (approx. 25 micron thickness) which are amenable to hole drilling by laser. Techniques for preparing CVD tungsten cathode structure were established and samples of oriented tungsten cathode structure were prepared for NRL evaluation.

Chemical Vapor Deposition of Oriented Tungsten Foils for Thermionic Cathodes

Chemical Vapor Deposition of Oriented Tungsten Foils for Thermionic Cathodes PDF Author: L. Yang
Publisher:
ISBN:
Category :
Languages : en
Pages : 21

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Book Description
Efforts under the present contract were devoted to the preparation of CVD tungsten emitters containing a variety of preferred crystallographic orientations. The work is divided into two phases. In Phase I, a CVD tungsten deposition apparatus was built and CVD tungsten samples of various preferred crystallographic orientations were prepared and characterized with respect to microstructures and nature and degree of preferred orientations. These samples were delivered to NRL for the evaluation of their electron emission properties. In Phase II, efforts were made to produce a high degree of preferred crystallographic orientations in thin CVD tungsten deposits (approx. 25 micron thickness) which are amenable to hole drilling by laser. Techniques for preparing CVD tungsten cathode structure were established and samples of oriented tungsten cathode structure were prepared for NRL evaluation.

Scientific and Technical Aerospace Reports

Scientific and Technical Aerospace Reports PDF Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1390

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Book Description
Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.

Energy Research Abstracts

Energy Research Abstracts PDF Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 474

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Book Description


Modeling of Chemical Vapor Deposition of Tungsten Films

Modeling of Chemical Vapor Deposition of Tungsten Films PDF Author: Chris R. Kleijn
Publisher: Birkhäuser
ISBN: 3034877412
Category : Science
Languages : en
Pages : 138

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Book Description
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications PDF Author: John E.J. Schmitz
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 264

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Book Description
Publisher description.

Chemical Vapor Deposition

Chemical Vapor Deposition PDF Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686

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Nuclear Science Abstracts

Nuclear Science Abstracts PDF Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 764

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Proceedings of the ... International Conference on Chemical Vapor Deposition

Proceedings of the ... International Conference on Chemical Vapor Deposition PDF Author:
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 810

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CHEMICAL VAPOR DEPOSITION OF TUNGSTEN.

CHEMICAL VAPOR DEPOSITION OF TUNGSTEN. PDF Author: J. CHIN
Publisher:
ISBN:
Category :
Languages : en
Pages : 14

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The Kinetics of Chemical Vapor Deposition of Tungsten

The Kinetics of Chemical Vapor Deposition of Tungsten PDF Author: H. CHEUNG
Publisher:
ISBN:
Category :
Languages : en
Pages : 14

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Book Description