Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Advances in Resist Technology and Processing XXI
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Advances in Resist Technology and Processing XXI
Author: John L. Sturtevant
Publisher:
ISBN: 9780819452894
Category : Microlithography
Languages : en
Pages : 1288
Book Description
Publisher:
ISBN: 9780819452894
Category : Microlithography
Languages : en
Pages : 1288
Book Description
Advances in Resist Technology and Processing XXI
Author:
Publisher:
ISBN:
Category : Microlithography
Languages : en
Pages : 688
Book Description
Publisher:
ISBN:
Category : Microlithography
Languages : en
Pages : 688
Book Description
Advances in Resist Technology and Processing
Author:
Publisher:
ISBN:
Category : Photoresists
Languages : en
Pages : 780
Book Description
Publisher:
ISBN:
Category : Photoresists
Languages : en
Pages : 780
Book Description
Handbook of Nanophysics
Author: Klaus D. Sattler
Publisher: CRC Press
ISBN: 1420075519
Category : Science
Languages : en
Pages : 782
Book Description
Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Publisher: CRC Press
ISBN: 1420075519
Category : Science
Languages : en
Pages : 782
Book Description
Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Advances in Resist Technology and Processing XXII.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Nanofabrication
Author: Andrew Sarangan
Publisher: CRC Press
ISBN: 1498725597
Category : Technology & Engineering
Languages : en
Pages : 299
Book Description
This book is designed to introduce typical cleanroom processes, techniques, and their fundamental principles. It is written for the practicing scientist or engineer, with a focus on being able to transition the information from the book to the laboratory. Basic theory such as electromagnetics and electrochemistry is described in as much depth as necessary to understand and explain the current practice and their limitations. Examples from various areas of interest will be covered, such as the fabrication of photonic devices including photo detectors, waveguides, and optical coatings, which are not commonly found in other fabrication texts.
Publisher: CRC Press
ISBN: 1498725597
Category : Technology & Engineering
Languages : en
Pages : 299
Book Description
This book is designed to introduce typical cleanroom processes, techniques, and their fundamental principles. It is written for the practicing scientist or engineer, with a focus on being able to transition the information from the book to the laboratory. Basic theory such as electromagnetics and electrochemistry is described in as much depth as necessary to understand and explain the current practice and their limitations. Examples from various areas of interest will be covered, such as the fabrication of photonic devices including photo detectors, waveguides, and optical coatings, which are not commonly found in other fabrication texts.
Advances in Resist Technology and Processing XVI.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Recent Topics on Modeling of Semiconductor Processes, Devices, and Circuits
Author: Rasit Onur Topaloglu
Publisher: Bentham Science Publishers
ISBN: 1608050742
Category : Technology & Engineering
Languages : en
Pages : 200
Book Description
"The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"
Publisher: Bentham Science Publishers
ISBN: 1608050742
Category : Technology & Engineering
Languages : en
Pages : 200
Book Description
"The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"
Advances in Resist Technology and Processing XX.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description