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Author: Xiaogan Liang
Publisher:
ISBN: 9780549525646
Category :
Languages : en
Pages : 310
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Book Description
The third part addresses an additional application of structured templates or stamps in engineering the functional material - graphenes. We use structured stamps to cut and exfoliate graphene islands from a graphite substrate, and then transfer-print the islands from the stamp into the device active-areas on a substrate. The placement accuracy is potentially nanometers. The process can be repeated to cover all device active-areas over an entire wafer. Transistors fabricated from the printed graphenes exhibit excellent performance.
Author: Xiaogan Liang
Publisher:
ISBN: 9780549525646
Category :
Languages : en
Pages : 310
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Book Description
The third part addresses an additional application of structured templates or stamps in engineering the functional material - graphenes. We use structured stamps to cut and exfoliate graphene islands from a graphite substrate, and then transfer-print the islands from the stamp into the device active-areas on a substrate. The placement accuracy is potentially nanometers. The process can be repeated to cover all device active-areas over an entire wafer. Transistors fabricated from the printed graphenes exhibit excellent performance.
Author: Bo Cui
Publisher: BoD – Books on Demand
ISBN: 953307602X
Category : Science
Languages : en
Pages : 630
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Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: Weimin Zhou
Publisher: Springer Science & Business Media
ISBN: 3642344283
Category : Technology & Engineering
Languages : en
Pages : 270
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Book Description
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Author: Clivia M. Sotomayor Torres
Publisher: Springer Science & Business Media
ISBN: 1441992049
Category : Science
Languages : en
Pages : 343
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Book Description
Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Author: Jagannathan Thirumalai
Publisher: BoD – Books on Demand
ISBN: 1789230306
Category : Technology & Engineering
Languages : en
Pages : 136
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Book Description
The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.
Author: Matthias Golibrzuch
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Book Description
Author: Wei Wu
Publisher:
ISBN:
Category :
Languages : en
Pages : 282
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Book Description
Author: Hongbo Lan
Publisher:
ISBN:
Category : Technology
Languages : en
Pages :
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Book Description
Large-area nanoimprint lithography (NIL) has been regarded as one of the most promising micro/nano-manufacturing technologies for mass production of large-area micro/nanoscale patterns and complex 3D structures and high aspect ratio features with low cost, high throughput, and high resolution. That opens the door and paves the way for many commercial applications not previously conceptualized or economically feasible. Great progresses in large-area nanoimprint lithography have been achieved in recent years. This chapter mainly presents a comprehensive review of recent advances in large-area NIL processes. Some promising solutions of large-area NIL and emerging methods, which can implement mass production of micro-and nanostructures over large areas on various substrates or surfaces, are described in detail. Moreover, numerous industrial-level applications and innovative products based on large-area NIL are also demonstrated. Finally, prospects, challenges, and future directions for industrial scale large-area NIL are addressed. An infrastructure of large-area nanoimprint lithography is proposed. In addition, some recent progresses and research activities in large-area NIL suitable for high volume manufacturing environments from our Labs are also introduced. This chapter may provide a reference and direction for the further explorations and studies of large-area micro/nanopatterning technologies.
Author: Xing Cheng
Publisher:
ISBN:
Category :
Languages : en
Pages : 330
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Book Description
Author: X. He
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
