2011 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors (ULSIC vs. TFT) PDF Download
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Author:
Publisher: The Electrochemical Society
ISBN: 1566778999
Category : Integrated circuits
Languages : en
Pages : 256
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Book Description
Author:
Publisher: The Electrochemical Society
ISBN: 1566778999
Category : Integrated circuits
Languages : en
Pages : 256
Get Book Here
Book Description
Author: Yue Kuo
Publisher:
ISBN: 9781607682516
Category :
Languages : en
Pages : 242
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Book Description
Author: Yue Kuo
Publisher: The Electrochemical Society
ISBN: 1566777356
Category : Science
Languages : en
Pages : 350
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Book Description
This issue of ECS Transactions includes 33 papers that were presented at the Second International Conference on Semiconductor Technology for Ultra Large Integrated Circuits and Thin Film Transistors (ULSIC vs. TFT II), held in the Xi¿an Garden Hotel, Xian, China, July 5-10, 2009. This symposium was sponsored by the Engineering Conferences International.
Author:
Publisher:
ISBN: 9781623320911
Category :
Languages : en
Pages : 331
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Book Description
Author: Y. Kuo
Publisher: Curran Associates Incorporated
ISBN: 9781604238921
Category : Technology & Engineering
Languages : en
Pages : 297
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Book Description
Author: Kuo, Yue
Publisher:
ISBN: 9781607682646
Category :
Languages : en
Pages : 336
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Book Description
Author: Y. Kuo
Publisher:
ISBN: 9781607686309
Category :
Languages : en
Pages :
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Book Description
Author: Y. Kuo
Publisher:
ISBN: 9781623324582
Category :
Languages : en
Pages :
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Book Description
Author: Y. Kuo
Publisher:
ISBN: 9781510896765
Category :
Languages : en
Pages :
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Book Description
Author: Vyas Krishnan
Publisher: Springer
ISBN: 9789400718920
Category : Technology & Engineering
Languages : en
Pages : 250
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Book Description
The exponential scaling in CMOS transistor sizes over the past three decades have enabled spectacular advances in integrated circuit technology, allowing the integration of more than a billion transistors in modern very large-scale integrated (VLSI) circuits. Over the last four decades, transistor scaling has followed Moore's law, and according to projections made by the International Technology Roadmap for Semiconductors (ITRS), minimum feature sizes are expected to reach 22nm by 2012. The primary drivers for transistor scaling are the associated benefits of lower system costs, improved performance, and system reliability. However, continuous device and interconnect scaling trends in deep submicron designs have created new challenges for integrated circuit designers such as increased interconnect delays due to rising parasitic resistance and capacitance of on-chip wiring, increased on-chip power densities, and performance and reliability problems posed by on-chip thermal gradients and thermal-hotspots. Thus, the major challenge is in achieving reliable, high-performance system implementations, all the way from the micro-architecture level down to the layout level. In order to realize such an implementation, a unified physical-level and high-level synthesis method becomes paramount, to ensure predictability of HLS design flows and minimize design iterations.
