Ultra-Clean Technology Handbook PDF Download
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Author: Ohmi
Publisher: Routledge
ISBN: 1351406426
Category : Science
Languages : en
Pages : 948
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Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Ohmi
Publisher: Routledge
ISBN: 1351406426
Category : Science
Languages : en
Pages : 948
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Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Tadahiro Ōmi
Publisher:
ISBN:
Category : Manufacturing processes
Languages : en
Pages :
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Book Description
Author: Ohmi
Publisher: CRC Press
ISBN: 9780367402341
Category :
Languages : en
Pages : 944
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Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Zeman
Publisher: Routledge
ISBN: 135143151X
Category : Medical
Languages : en
Pages : 642
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Book Description
Integrates knowledge on microfiltration and ultrification, membrane chemistry, and characterization methods with the engineering and economic aspects of device performance, device and module design, processes, and applications. The text provides a discussion of membrane fundamentals and an analytical framework for designing and developing new filtrations systems for a broad range of technologically important functions. It offers information on membrane liquid precursors, fractal and stochastic pore space analysis, novel and advanced module designs, and original process design calculations.
Author: Karen Reinhardt
Publisher: William Andrew
ISBN: 032351085X
Category : Technology & Engineering
Languages : en
Pages : 794
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Book Description
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. - Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits - Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries - Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Author: David L. Elliott
Publisher: Academic Press
ISBN: 1483296512
Category : Science
Languages : en
Pages : 367
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Book Description
Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications in various fields. The text enables practicing engineers and researchers to utilize concepts and innovations to solve actual problems encountered in UV optical technology applications. It also offers a wealth of information for equipment designers and manufacturers. Those in laser fields (including medical, electronics, and semiconductors), students, engineers, technicians, as well as newcomers to the subject who require a basic introduction to the topic, will all find Ultraviolet Laser Technology and Applications to be an essential resource. Serves as a valuable, practical reference to UV laser technology Presents detailed technical data and techniques Offers highly illustrated optics designs and beam delivery systems Includes an extensive bibliography, references, and glossary Covers all major UV laser markets and technology systems
Author: Norman N Li
Publisher: John Wiley & Sons
ISBN: 1118211545
Category : Technology & Engineering
Languages : en
Pages : 1105
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Book Description
Advanced membranes-from fundamentals and membrane chemistry to manufacturing and applications A hands-on reference for practicing professionals, Advanced Membrane Technology and Applications covers the fundamental principles and theories of separation and purification by membranes, the important membrane processes and systems, and major industrial applications. It goes far beyond the basics to address the formulation and industrial manufacture of membranes and applications. This practical guide: Includes coverage of all the major types of membranes: ultrafiltration; microfiltration; nanofiltration; reverse osmosis (including the recent high-flux and low-pressure membranes and anti-fouling membranes); membranes for gas separations; and membranes for fuel cell uses Addresses six major topics: membranes and applications in water and wastewater; membranes for biotechnology and chemical/biomedical applications; gas separations; membrane contractors and reactors; environmental and energy applications; and membrane materials and characterization Includes discussions of important strategic issues and the future of membrane technology With chapters contributed by leading experts in their specific areas and a practical focus, this is the definitive reference for professionals in industrial manufacturing and separations and research and development; practitioners in the manufacture and applications of membranes; scientists in water treatment, pharmaceutical, food, and fuel cell processing industries; process engineers; and others. It is also an excellent resource for researchers in industry and academia and graduate students taking courses in separations and membranes and related fields.
Author: Richard E. Novak
Publisher: The Electrochemical Society
ISBN: 9781566771153
Category : Technology & Engineering
Languages : en
Pages : 642
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Book Description
Author: Karen A. Reinhardt
Publisher: John Wiley & Sons
ISBN: 1118099516
Category : Technology & Engineering
Languages : en
Pages : 596
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Book Description
Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.
Author: Chue San Yoo
Publisher: World Scientific Publishing Company
ISBN: 9813106719
Category : Technology & Engineering
Languages : en
Pages : 483
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Book Description
This textbook contains all the materials that an engineer needs to know to start a career in the semiconductor industry. It also provides readers with essential background information for semiconductor research. It is written by a professional who has been working in the field for over two decades and teaching the material to university students for the past 15 years. It includes process knowledge from raw material preparation to the passivation of chips in a modular format.
