Tracer Diffusion Data for Metals, Alloys, and Simple Oxides PDF Download
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Author: John Askill
Publisher: Springer Science & Business Media
ISBN: 1468460757
Category : Technology & Engineering
Languages : en
Pages : 108
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Book Description
Atomic diffusion in metals was first discovered some sixty-five years ago, and since then a considerable wealth of data has ac cumulated on diffusion in various systems. However, work prior to about the year 1940 is now mainly of historical interest, since ex periments were often carried out under experimental conditions and with methods of analysis leading to uncertainties in inter preting the measured diffusion coefficients. Data on diffusion rates are of importance in processes which are controlled by rates of atomic migration such as growth of phases and homogenization of alloys. In addition diffusion plays an important part in theories of such phenomena as oxidation, plastic deformation, sintering, and creep. A tremendous advance in diffusion studies was made possible by the availability of radioactive isotopes of sufficiently high spe cific activity after the second world war. Measurements of self diffusion rates then became possible using radioactive isotopes having the same chemical properties as the solvent material, and it also became possible to study tracer impurity diffusion when the concentration of the impurity is so small as not to alter the chemi cal homogeneity of the system. In the last ten to fifteen years the purity of materials used in diffusion studies has increased con siderably and the methods of analysis have become more stand ardized.
Author: John Askill
Publisher: Springer Science & Business Media
ISBN: 1468460757
Category : Technology & Engineering
Languages : en
Pages : 108
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Book Description
Atomic diffusion in metals was first discovered some sixty-five years ago, and since then a considerable wealth of data has ac cumulated on diffusion in various systems. However, work prior to about the year 1940 is now mainly of historical interest, since ex periments were often carried out under experimental conditions and with methods of analysis leading to uncertainties in inter preting the measured diffusion coefficients. Data on diffusion rates are of importance in processes which are controlled by rates of atomic migration such as growth of phases and homogenization of alloys. In addition diffusion plays an important part in theories of such phenomena as oxidation, plastic deformation, sintering, and creep. A tremendous advance in diffusion studies was made possible by the availability of radioactive isotopes of sufficiently high spe cific activity after the second world war. Measurements of self diffusion rates then became possible using radioactive isotopes having the same chemical properties as the solvent material, and it also became possible to study tracer impurity diffusion when the concentration of the impurity is so small as not to alter the chemi cal homogeneity of the system. In the last ten to fifteen years the purity of materials used in diffusion studies has increased con siderably and the methods of analysis have become more stand ardized.
Author:
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Category : Nuclear energy
Languages : en
Pages : 722
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Book Description
Author:
Publisher:
ISBN:
Category : Mass spectrometry
Languages : en
Pages : 900
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Book Description
Author: Paul Mason
Publisher: Springer
ISBN: 3319578642
Category : Technology & Engineering
Languages : en
Pages : 374
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Book Description
This book represents a collection of papers presented at the 4th World Congress on Integrated Computational Materials Engineering (ICME 2017), a specialty conference organized by The Minerals, Metals & Materials Society (TMS). The contributions offer topics relevant to the global advancement of ICME as an engineering discipline. Topics covered include the following:ICME Success Stories and ApplicationsVerification, Validation, Uncertainty Quantification Issues and Gap AnalysisIntegration Framework and UsageAdditive ManufacturingPhase Field ModelingMicrostructure EvolutionICME Design Tools and ApplicationMechanical Performance Using Multi-Scale Modeling
Author: John H. Lau
Publisher: Springer Science & Business Media
ISBN: 1461539102
Category : Technology & Engineering
Languages : en
Pages : 649
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Book Description
Solders have given the designer of modern consumer, commercial, and military electronic systems a remarkable flexibility to interconnect electronic components. The properties of solder have facilitated broad assembly choices that have fueled creative applications to advance technology. Solder is the electrical and me chanical "glue" of electronic assemblies. This pervasive dependency on solder has stimulated new interest in applica tions as well as a more concerted effort to better understand materials properties. We need not look far to see solder being used to interconnect ever finer geo metries. Assembly of micropassive discrete devices that are hardly visible to the unaided eye, of silicon chips directly to ceramic and plastic substrates, and of very fine peripheral leaded packages constitute a few of solder's uses. There has been a marked increase in university research related to solder. New electronic packaging centers stimulate applications, and materials engineering and science departments have demonstrated a new vigor to improve both the materials and our understanding of them. Industrial research and development continues to stimulate new application, and refreshing new packaging ideas are emerging. New handbooks have been published to help both the neophyte and seasoned packaging engineer.
Author: Murray L. Scott
Publisher: Woodhead Publishing
ISBN: 9781855733534
Category : Composite materials
Languages : en
Pages : 836
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Book Description
Author: Martin Eden Glicksman
Publisher: John Wiley & Sons
ISBN: 1394172559
Category : Science
Languages : en
Pages : 498
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Book Description
This book offers a modern treatment of diffusion in solids, covering such core topics as the transport of mass through the lattice of a crystalline solid. Part I of the book develops basic concepts in diffusion field theory and illustrates them with several applications, while Part II focuses on key solid-state principles needed to apply diffusion theory to real materials.
Author: Michele Manuel
Publisher: Springer
ISBN: 3319481851
Category : Technology & Engineering
Languages : en
Pages : 465
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Book Description
The Magnesium Technology Symposium, the event on which this collection is based, is one of the largest yearly gatherings of magnesium specialists in the world. Papers represent all aspects of the field, ranging from primary production to applications to recycling. Moreover, papers explore everything from basic research findings to industrialization. Magnesium Technology 2015 covers a broad spectrum of current topics, including alloys and their properties; cast products and processing; wrought products and processing; forming, joining, and machining; corrosion and surface finishing; ecology; and structural applications. In addition, there is coverage of new and emerging applications.
Author: Y. Pauleau
Publisher: Springer Science & Business Media
ISBN: 9401100772
Category : Technology & Engineering
Languages : en
Pages : 652
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Book Description
Materials and Processes for Surface and Interface Engineering, which has been written by experts in the fields of deposition technology and surface modification techniques, offers up to date tutorial papers on the latest advances in surface and interface engineering. The emphasis is on fundamental aspects, principles and applications of plasma and ion beam processing technology. A handbook for the engineer and scientist as well as an introduction for students in several branches of materials science and surface engineering.
Author: Cor Claeys
Publisher: Springer
ISBN: 3319939254
Category : Technology & Engineering
Languages : en
Pages : 464
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Book Description
This book provides a unique review of various aspects of metallic contamination in Si and Ge-based semiconductors. It discusses all of the important metals including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on electrical devices’ performance. Several control and possible gettering approaches are addressed. The book offers a valuable reference guide for all researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. Adopting an interdisciplinary approach, it combines perspectives from e.g. material science, defect engineering, device processing, defect and device characterization, and device physics and engineering.
