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Author: Jianguo Zhu
Publisher: World Scientific
ISBN: 9811224005
Category : Science
Languages : en
Pages : 706
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Book Description
Thin films have an extremely broad range of applications from electronics and optics to new materials and devices. Collaborative and multidisciplinary efforts from physicists, materials scientists, engineers and others have established and advanced a field with key pillars constituting (i) the synthesis and processing of thin films, (ii) the understanding of physical properties in relation to the nanometer scale, (iii) the design and fabrication of nano-devices or devices with thin film materials as building blocks, and (iv) the design and construction of novel tools for characterization of thin films.Against the backdrop of the increasingly interdisciplinary field, this book sets off to inform the basics of thin film physics and thin film devices. Readers are systematically introduced to the synthesis, processing and application of thin films; they will also study the formation of thin films, their structure and defects, and their various properties — mechanical, electrical, semiconducting, magnetic, and superconducting. With a primary focus on inorganic thin film materials, the book also ventures on organic materials such as self-assembled monolayers and Langmuir-Blodgett films.This book will be effective as a teaching or reference material in the various disciplines, ranging from Materials Science and Engineering, Electronic Science and Engineering, Electronic Materials and Components, Semiconductor Physics and Devices, to Applied Physics and more. The original Chinese publication has been instrumental in this purpose across many Chinese universities and colleges.
Author: Jianguo Zhu
Publisher: World Scientific
ISBN: 9811224005
Category : Science
Languages : en
Pages : 706
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Book Description
Thin films have an extremely broad range of applications from electronics and optics to new materials and devices. Collaborative and multidisciplinary efforts from physicists, materials scientists, engineers and others have established and advanced a field with key pillars constituting (i) the synthesis and processing of thin films, (ii) the understanding of physical properties in relation to the nanometer scale, (iii) the design and fabrication of nano-devices or devices with thin film materials as building blocks, and (iv) the design and construction of novel tools for characterization of thin films.Against the backdrop of the increasingly interdisciplinary field, this book sets off to inform the basics of thin film physics and thin film devices. Readers are systematically introduced to the synthesis, processing and application of thin films; they will also study the formation of thin films, their structure and defects, and their various properties — mechanical, electrical, semiconducting, magnetic, and superconducting. With a primary focus on inorganic thin film materials, the book also ventures on organic materials such as self-assembled monolayers and Langmuir-Blodgett films.This book will be effective as a teaching or reference material in the various disciplines, ranging from Materials Science and Engineering, Electronic Science and Engineering, Electronic Materials and Components, Semiconductor Physics and Devices, to Applied Physics and more. The original Chinese publication has been instrumental in this purpose across many Chinese universities and colleges.
Author: William S. Wong
Publisher: Springer Science & Business Media
ISBN: 0387743634
Category : Technology & Engineering
Languages : en
Pages : 474
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Book Description
This excellent volume covers a range of materials used for flexible electronics, including semiconductors, dielectrics, and metals. The functional integration of these different materials is treated as well. Fundamental issues for both organic and inorganic materials systems are included. A corresponding overview of technological applications, based on each materials system, is presented to give both the non-specialist and the researcher in the field relevant information on the status of the flexible electronics area.
Author: Milton Ohring
Publisher: Academic Press
ISBN: 9780125249904
Category : Science
Languages : en
Pages : 744
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Book Description
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.
Author: King-Ning Tu
Publisher: Prentice Hall
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 456
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Book Description
Author: Yiyang Gong
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Novel materials, including zinc oxide (ZnO) and 2D transition metal dichalcogenides (TMDs), have been investigated in this dissertation for the realization of high-performance large-area integrated circuits. These novel materials may provide differential advantages over the established large-area thin film technology based on silicon, which has been extensively employed in applications such as large-area flat panel displays, high-speed active matrix thin film circuits, flexible and wearable electronics, etc. The dissertation begins with the discussion of high-performance plasma-enhanced atomic layer deposition (PEALD) of ZnO thin films and ZnO thin film transistors (TFTs) with a field effect mobility of ~ 10 to 20 cm2/Vs, which have been demonstrated. Offset-drain ZnO TFTs, which are able to withstand or switch voltage beyond 80 V, have also been demonstrated. These results shed light on the realization of large-area active-matrix circuits beyond the capabilities of the current display industry where high circuit speed or high operation voltage is required. To further improve the performance of ZnO-based electronics, many related materials, including doped ZnO, zinc nitride, and aluminum nitride, have been investigated. Doped ZnO has been proposed as the carrier injection layer that can improve the conductivity of metal-semiconductor contact in ZnO TFTs. Aluminum-doped ZnO thin films have been deposited using triisobutyl aluminum (TIBA) as the dopant precursor instead of trimethyl aluminum (TMA) in order to improve the uniformity of dopant distribution because TIBA has much lower vapor pressure than TMA. AZO thin films with resistivity ~ 10-2 cm have been achieved by PEALD. Besides, aluminum nitride and zinc nitride thin films have also been studied using PEALD. In addition to the showerhead PEALD system, a novel inductively coupled plasma ALD system has been designed and set up that provides RF power up to 500 W in order to generate a highly reactive nitrogen plasma source and enable the deposition of high-quality metal nitride at relatively low temperature. These metal nitride thin films may provide additional building blocks to enhance the speed and thermal stability of ZnO-based thin film devices and circuits.Owing to their excellent electrical and mechanical properties, 2D-TMD thin films have been studied for flexible electronics applications. High quality MoS2 and WS2 thin films have been achieved via mechanical exfoliation and chemical vapor deposition. To fabricate MoS2- and WS2-based TFTs, a 5-step device fabrication process has been developed, which is compatible to both the conventional rigid substrate and the ~ 4.8 nm thick solution-cast polyimide (PI) flexible substrate. The MoS2 and WS2 TFTs fabricated on PI substrate exhibit a field effect mobility of between 1 to 20 cm2/Vs, which is similar to that of those fabricated on rigid silicon substrate. More importantly, extraordinary mechanical strength and stability have been demonstrated for MoS2 and WS2 TFTs fabricated on PI substrate. A reasonably small degradation in device performance has been observed in these flexible 2D-TMD TFTs under static bending to the radius of ~ 2mm and after cyclic bending up to 100,000 cycles. Finally, attempts to create integratable 2D-TMD circuits have been demonstrated. To realize large-area 2D-TMD based circuits, growth of wafer-scale continuous WSe2 thin films has been demonstrated using metal organic chemical vapor deposition (MOCVD). Deposition has been achieved at as low as 400 C, which allows deposition on glass and polymeric substrate and enables the transfer-free fabrication of WSe2 TFTs and circuits on arbitrary platforms. Patterning and post-growth thickness modulation of continuous WSe2 thin film have been demonstrated using CF4 plasma and O2 plasma, whereby high-speed etching and nanometer-scale film thinning can be realized. With the capability of depositing and patterning wafer-scale WSe2 thin films, an array of p-channel WSe2 TFTs have been fabricated with a field effect mobility of ~0.01 cm2/Vs and an on-off ratio greater than 104.
Author: King-Ning Tu
Publisher: Cambridge University Press
ISBN: 1139492705
Category : Technology & Engineering
Languages : en
Pages : 413
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Book Description
Thin films are widely used in the electronic device industry. As the trend for miniaturization of electronic devices moves into the nanoscale domain, the reliability of thin films becomes an increasing concern. Building on the author's previous book, Electronic Thin Film Science by Tu, Mayer and Feldman, and based on a graduate course at UCLA given by the author, this new book focuses on reliability science and the processing of thin films. Early chapters address fundamental topics in thin film processes and reliability, including deposition, surface energy and atomic diffusion, before moving onto systematically explain irreversible processes in interconnect and packaging technologies. Describing electromigration, thermomigration and stress migration, with a closing chapter dedicated to failure analysis, the reader will come away with a complete theoretical and practical understanding of electronic thin film reliability. Kept mathematically simple, with real-world examples, this book is ideal for graduate students, researchers and practitioners.
Author: Milton Ohring
Publisher: Academic Press
ISBN: 0125249756
Category : Science
Languages : en
Pages : 817
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Book Description
This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.
Author: Gertjan Koster
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 295
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Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques
Author: Angela Piegari
Publisher: Woodhead Publishing
ISBN: 0081020996
Category : Technology & Engineering
Languages : en
Pages : 862
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Book Description
Optical Thin Films and Coatings: From Materials to Applications, Second Edition, provides an overview of thin film materials and their properties, design and manufacture across a wide variety of application areas. Sections explore their design and manufacture and their unconventional features, including the scattering properties of random structures in thin films, optical properties at short wavelengths, thermal properties and color effects. Other chapters focus on novel materials, including organic optical coatings, surface multiplasmonics, optical thin films containing quantum dots, and optical coatings, including laser components, solar cells, displays and lighting, and architectural and automotive glass. The book presents a technical resource for researchers and engineers working with optical thin films and coatings. It is also ideal for professionals in the security, automotive, space and other industries who need an understanding of the topic. Provides thorough review of applications of optical coatings including laser components, solar cells, glazing, displays and lighting One-stop reference that addresses deposition techniques, properties, and applications of optical thin films and coatings Novel methods, suggestions for analysis, and applications makes this a valuable resource for experts in the field as well
Author:
Publisher:
ISBN: 9781558999633
Category : Organic electronics
Languages : en
Pages :
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Book Description
