The Vacuum Deposition, Characterization and Device Applications of CuInTe2 Thin Films PDF Download
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Author: Yuh-Juh Juang
Publisher:
ISBN:
Category : Indium compounds
Languages : en
Pages : 160
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Book Description
Author: Yuh-Juh Juang
Publisher:
ISBN:
Category : Indium compounds
Languages : en
Pages : 160
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Book Description
Author: Matthew M. Hawkeye
Publisher: John Wiley & Sons
ISBN: 1118847334
Category : Technology & Engineering
Languages : en
Pages : 435
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Book Description
This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: Development and description of GLAD techniques for nanostructuring thin films Properties and characterization of nanohelices, nanoposts, and other porous films Design and engineering of optical GLAD films including fabrication and testing, and chiral films Post-deposition processing and integration to optimize film behaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.
Author: Rasmus Kromann
Publisher:
ISBN: 9788755018273
Category : High temperature superconductors
Languages : en
Pages : 102
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Book Description
Author: Werner Kern
Publisher: Elsevier
ISBN: 0080524214
Category : Technology & Engineering
Languages : en
Pages : 881
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Book Description
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Provides an all-new sequel to the 1978 classic, Thin Film Processes Introduces new topics, and several key topics presented in the original volume are updated Emphasizes practical applications of major thin film deposition and etching processes Helps readers find the appropriate technology for a particular application
Author: L. Holland
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 608
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Book Description
Author: Hua-shuang Kong
Publisher:
ISBN:
Category :
Languages : en
Pages : 366
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Book Description
Author: Krishna Seshan
Publisher: CRC Press
ISBN: 1482269686
Category : Science
Languages : en
Pages : 72
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Book Description
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 1510
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Book Description
Author: Vladislav Yu Vasilyev
Publisher:
ISBN: 9781633211865
Category : Chemical vapor deposition
Languages : en
Pages : 320
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Book Description
This monograph is a summary of equipment, methodology and thin film growth experience obtained by the author during his 30 years of research work in the field of Integrated Circuit (IC) device technology. The monograph is concerned with the analysis of different aspects of different types of inorganic thin films grown by Chemical Vapor Deposition (CVD) methods and dedicated to the use in IC technology and production. The author discusses the methodology issues of thin film CVD and the fundamentals of the chemical kinetics of thin film growth. The main core of this monograph is the analysis of thin film CVD kinetics features obtained using different types of reactors, chemical compounds, process conditions. The monograph covers a wide variety of CVD-related aspects: equipment analysis, chemical compound features, CVD process methodology analysis, CVD kinetic features and their quantitative characterization, implementation of obtained numerical equations for thin film step coverage and gap-fill issues, interrelation of the film properties and CVD process features, and CVD process classification. The author would like to highlight that all the data presented in this book has been experimentally obtained by a number of research groups. Most of the data has been double-checked and confirmed. Surely, some data could not be repeated because it was obtained a long time ago using some specific deposition tools and processes. Nevertheless, the author would like to stress that he considers this book as an attempt to create a whole view on the thin film CVD for IC device technology applications. In this regard, the author has tried to generalize a large amount of experimental data, selecting the most common features of the film growth, composition, structure, and properties.
Author: Dongfang Yang
Publisher: BoD – Books on Demand
ISBN: 1803564555
Category : Technology & Engineering
Languages : en
Pages : 224
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Book Description
A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, chemical, mechanical and thermal properties. Through ten chapters consisting of original research studies and literature reviews written by experts from the international scientific community, this book covers the deposition and application of thin films.
