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Author: Oleg A. Popov
Publisher: Elsevier
ISBN: 0815517890
Category : Science
Languages : en
Pages : 467
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Book Description
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Author: Oleg A. Popov
Publisher: Elsevier
ISBN: 0815517890
Category : Science
Languages : en
Pages : 467
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Book Description
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1056
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Book Description
Author: Bernhard Wolf
Publisher: CRC Press
ISBN: 1351829947
Category : Technology & Engineering
Languages : en
Pages : 558
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Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Author:
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ISBN:
Category : Aeronautics
Languages : en
Pages : 990
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Book Description
Author: Cyril Bernard Lucas
Publisher: CRC Press
ISBN: 1466561033
Category : Science
Languages : en
Pages : 396
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Book Description
Atomic and molecular beams are employed in physics and chemistry experiments and, to a lesser extent, in the biological sciences. These beams enable atoms to be studied under collision-free conditions and allow the study of their interaction with other atoms, charged particles, radiation, and surfaces. Atomic and Molecular Beams: Production and Collimation explores the latest techniques for producing a beam from any substance as well as from the dissociation of hydrogen, oxygen, nitrogen, and the halogens. The book not only provides the basic expressions essential to beam design but also offers in-depth coverage of: Design of ovens and furnaces for atomic beam production Creation of atomic beams that require higher evaporation temperatures Theory of beam formation including the Clausing equation and the transmission probability Construction of collimating arrays in metals, plastics, glass, and other materials Optimization of the design of atomic beam collimators While many review articles and books discuss the application of atomic beams, few give technical details of their production. Focusing on practical application in the laboratory, the author critically reviews over 800 references to compare the atomic and molecular beam formation theories with actual experiments. Atomic and Molecular Beams: Production and Collimation is a comprehensive source of material for experimentalists facing the design of any atomic or molecular beam and theoreticians wishing to extend the theory.
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 646
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Book Description
Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 1090
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Book Description
Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 806
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Book Description
Semiannual, with semiannual and annual indexes. References to all scientific and technical literature coming from DOE, its laboratories, energy centers, and contractors. Includes all works deriving from DOE, other related government-sponsored information, and foreign nonnuclear information. Arranged under 39 categories, e.g., Biomedical sciences, basic studies; Biomedical sciences, applied studies; Health and safety; and Fusion energy. Entry gives bibliographical information and abstract. Corporate, author, subject, report number indexes.
Author: Gerhard Franz
Publisher: Springer Science & Business Media
ISBN: 3540858490
Category : Technology & Engineering
Languages : en
Pages : 743
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Book Description
Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
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ISBN:
Category : Science
Languages : en
Pages : 1776
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Book Description
