Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 442
Book Description
Masters Theses in the Pure and Applied Sciences Accepted by Colleges and Universities of the United States and Canada
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 442
Book Description
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 442
Book Description
Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII
Author: Ram Ekwal Sah
Publisher: The Electrochemical Society
ISBN: 9781566774598
Category : Nature
Languages : en
Pages : 606
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566774598
Category : Nature
Languages : en
Pages : 606
Book Description
Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films
Author: David Christopher Gilmer
Publisher:
ISBN:
Category :
Languages : en
Pages : 314
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 314
Book Description
Chemical Vapor Deposition
Author: S Neralla
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292
Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292
Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Modeling of Chemical Vapor Deposition of Tungsten Films
Author: Chris R. Kleijn
Publisher: Birkhäuser
ISBN: 3034877412
Category : Science
Languages : en
Pages : 138
Book Description
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Publisher: Birkhäuser
ISBN: 3034877412
Category : Science
Languages : en
Pages : 138
Book Description
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Chemical Vapor Deposition
Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Characterization in Silicon Processing
Author: Yale Strausser
Publisher: Elsevier
ISBN: 0080523420
Category : Technology & Engineering
Languages : en
Pages : 255
Book Description
This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Publisher: Elsevier
ISBN: 0080523420
Category : Technology & Engineering
Languages : en
Pages : 255
Book Description
This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Handbook of Chemical Vapor Deposition (CVD)
Author: Hugh O. Pierson
Publisher: William Andrew Publishing
ISBN: 9780815513001
Category : Technology & Engineering
Languages : en
Pages : 436
Book Description
A comprehensive overview of the principles, technology and application of chemical vapor deposition (CVD), an extremely versatile process which can be used to manufacture coatings, powders, fibers and monolithic components. It presents a clear, objective, systematic assessment of CVD, including an e
Publisher: William Andrew Publishing
ISBN: 9780815513001
Category : Technology & Engineering
Languages : en
Pages : 436
Book Description
A comprehensive overview of the principles, technology and application of chemical vapor deposition (CVD), an extremely versatile process which can be used to manufacture coatings, powders, fibers and monolithic components. It presents a clear, objective, systematic assessment of CVD, including an e
Novel Carbon Materials and Composites
Author: Xin Jiang
Publisher: John Wiley & Sons
ISBN: 1119313392
Category : Technology & Engineering
Languages : en
Pages : 300
Book Description
Connects knowledge about synthesis, properties, and applications of novel carbon materials and carbon-based composites This book provides readers with new knowledge on the synthesis, properties, and applications of novel carbon materials and carbon-based composites, including thin films of silicon carbide, carbon nitrite, and their related composites. It examines the direct bottom-up synthesis of the carbon-based composite systems and their potential applications, and discusses the growth mechanism of the composite structures. It features applications that range from mechanical, electronic, chemical, biochemical, medical, and environmental to functional devices. Novel Carbon Materials and Composites: Synthesis, Properties and Applications covers an overview of the synthesis, properties, and applications of novel carbon materials and composites. Especially, it covers everything from chemical vapor deposition of silicon carbide films and their electrochemical applications to applications of various novel carbon materials for the construction of supercapacitors to chemical vapor deposition of diamond/silicon carbide composite films to the covering and fabrication processes of nanodot composites. Looks at the recent progress and achievements in the fields of novel carbon materials and composites, including thin films of silicon carbide, carbon nitrite, and their related composites Discusses the many applications of carbon materials and composites Focuses on the hot topic of the fabrication of carbon-based composite materials and their abilities to extend the potential applications of carbon materials Published as a title in the new Wiley book series Nanocarbon Chemistry and Interfaces. Novel Carbon Materials and Composites: Synthesis, Properties and Applications is an important book for academic researchers and industrial scientists working in the fabrication and application of carbon materials and carbon-based composite materials and related fields.
Publisher: John Wiley & Sons
ISBN: 1119313392
Category : Technology & Engineering
Languages : en
Pages : 300
Book Description
Connects knowledge about synthesis, properties, and applications of novel carbon materials and carbon-based composites This book provides readers with new knowledge on the synthesis, properties, and applications of novel carbon materials and carbon-based composites, including thin films of silicon carbide, carbon nitrite, and their related composites. It examines the direct bottom-up synthesis of the carbon-based composite systems and their potential applications, and discusses the growth mechanism of the composite structures. It features applications that range from mechanical, electronic, chemical, biochemical, medical, and environmental to functional devices. Novel Carbon Materials and Composites: Synthesis, Properties and Applications covers an overview of the synthesis, properties, and applications of novel carbon materials and composites. Especially, it covers everything from chemical vapor deposition of silicon carbide films and their electrochemical applications to applications of various novel carbon materials for the construction of supercapacitors to chemical vapor deposition of diamond/silicon carbide composite films to the covering and fabrication processes of nanodot composites. Looks at the recent progress and achievements in the fields of novel carbon materials and composites, including thin films of silicon carbide, carbon nitrite, and their related composites Discusses the many applications of carbon materials and composites Focuses on the hot topic of the fabrication of carbon-based composite materials and their abilities to extend the potential applications of carbon materials Published as a title in the new Wiley book series Nanocarbon Chemistry and Interfaces. Novel Carbon Materials and Composites: Synthesis, Properties and Applications is an important book for academic researchers and industrial scientists working in the fabrication and application of carbon materials and carbon-based composite materials and related fields.
MEMS/NEMS Sensors
Author: Goutam Koley
Publisher: MDPI
ISBN: 3039216341
Category : Technology & Engineering
Languages : en
Pages : 242
Book Description
Due to the ever-expanding applications of micro/nano-electromechanical systems (NEMS/MEMS) as sensors and actuators, interest in their development has rapidly expanded over the past decade. Encompassing various excitation and readout schemes, the MEMS/NEMS devices transduce physical parameter changes, such as temperature, mass or stress, caused by changes in desired measurands, to electrical signals that can be further processed. Some common examples of NEMS/MEMS sensors include pressure sensors, accelerometers, magnetic field sensors, microphones, radiation sensors, and particulate matter sensors.
Publisher: MDPI
ISBN: 3039216341
Category : Technology & Engineering
Languages : en
Pages : 242
Book Description
Due to the ever-expanding applications of micro/nano-electromechanical systems (NEMS/MEMS) as sensors and actuators, interest in their development has rapidly expanded over the past decade. Encompassing various excitation and readout schemes, the MEMS/NEMS devices transduce physical parameter changes, such as temperature, mass or stress, caused by changes in desired measurands, to electrical signals that can be further processed. Some common examples of NEMS/MEMS sensors include pressure sensors, accelerometers, magnetic field sensors, microphones, radiation sensors, and particulate matter sensors.