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Author: British Standards Institute Staff
Publisher:
ISBN: 9780580496103
Category :
Languages : en
Pages : 34
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Book Description
Surface chemistry, Chemical analysis and testing, Surfaces, Spectroscopy, Auger electron spectroscopy, Photoelectron spectroscopy, X-ray photoelectron spectroscopy, Electron emission, Side, Resolution, Dimensional measurement, Straight, Electron physics
Author: British Standards Institute Staff
Publisher:
ISBN: 9780580496103
Category :
Languages : en
Pages : 34
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Book Description
Surface chemistry, Chemical analysis and testing, Surfaces, Spectroscopy, Auger electron spectroscopy, Photoelectron spectroscopy, X-ray photoelectron spectroscopy, Electron emission, Side, Resolution, Dimensional measurement, Straight, Electron physics
Author: British Standards Institute Staff
Publisher:
ISBN: 9780580457142
Category :
Languages : en
Pages : 26
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Book Description
Surface chemistry, Chemical analysis and testing, Surfaces, Spectroscopy, Auger electron spectroscopy, Electron emission, Photoelectron spectroscopy, X-ray photoelectron spectroscopy, Chemical composition, Resolution, Area
Author: British Standards Institute Staff
Publisher:
ISBN: 9780580711862
Category :
Languages : en
Pages : 126
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Book Description
Surface chemistry, Chemical analysis and testing, Surfaces, Spectroscopy, Auger electron spectroscopy, Electron emission, Photoelectron spectroscopy, X-ray photoelectron spectroscopy, Chemical composition, Resolution, Area
Author: Siegfried Hofmann
Publisher: Springer Science & Business Media
ISBN: 3642273815
Category : Science
Languages : en
Pages : 545
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Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author: Standards Australia Limited
Publisher:
ISBN: 9780733777837
Category : Auger effect
Languages : en
Pages : 20
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Book Description
Author: John F. Watts
Publisher: John Wiley & Sons
ISBN: 1119417643
Category : Technology & Engineering
Languages : en
Pages : 307
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Book Description
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Author: Graham C. Smith
Publisher: Springer Science & Business Media
ISBN: 1489909672
Category : Science
Languages : en
Pages : 165
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Book Description
This book is t~e fifth in aseries of scientific textbooks designed to cover advances in selected research fields from a basic and general view point. The reader is taken carefully but rapidly through the introductory material in order that t~e significance of recent developments can be understood with only limited initial knowledge. The inclusion in the Appendix of the abstracts of many of the more important papers in the field provides further assistance for the non-specialist, and acts as aspringboard to supplementary reading for those who wish to consult the original liter ature. Surface analysis has been the subject of numerous books and review articles, and the fundamental scientific principles of t~e more popular techniques are now reasonably weIl established. This book is concerned with the very powerful techniques of Auger electron and X-ray photoelectron spectroscopy (AES and XPS), with an emphasis on how they may be performed as part of a modern analytical facility. Since the development of AES and XPS in the late 1960s and early 1970s there have been great strides forward in the sensitivities and resolutions of the instrumentation. Simultaneously, these spectroscopies have undergone a veritable explosion, both in their acceptance alongside more routine ana1ytical techniques and in the range of problems and materials to which they are applied. As a result, many researchers in industry and in academia now come into contact with AES and XPS not as specialists, but as users.
Author: D. Briggs
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 694
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Book Description
The aim of this text is to present the background, the important concepts, and tabulated data of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) in a practical context for those involved in applied surface analysis techniques.
Author: Siegfried Hofmann
Publisher: Springer Science & Business Media
ISBN: 3642273807
Category : Science
Languages : en
Pages : 544
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Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author: J. M. Walls
Publisher: CUP Archive
ISBN: 9780521386906
Category : Science
Languages : en
Pages : 356
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Book Description
