Author: Wei Lee
Publisher:
ISBN:
Category :
Languages : en
Pages : 76
Book Description
Studies of Low Pressure Chemical Vapor Deposition of AIN and SiC Films Using Organometallic Precursors
Author: Wei Lee
Publisher:
ISBN:
Category :
Languages : en
Pages : 76
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 76
Book Description
CVD of SiC and AlN Thin Films Using Designed Organometallic Precursors
Author: Leonard V. Interrante
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
High purity, crystalline AlN and SiC thin films have been prepared by the chemical vapor deposition of (CH3)2AlN2)3 and (CH3)HSiCH2)3, respectively, at temperatures under 800 C. The use of these 'designed precursors' results in film stoichiometries of nearly one-to-one and the evolution of non-corrosive reaction by-products. In addition, no carrier gas is required. Preliminary studies of the interaction of the (CH3)HSiCH2)3 system with a clean Si(100) surface indicate interesting precursor adsorption and decomposition behavior with epitaxial growth of SiC on Si(100) at or below 700 C. It is anticipated that information from these studies will be used to improve the deposition processes and aid in the design of new precursors. Keywords: Thin films, Aluminum nitride, Silicon carbide, Design precursors, Silicon. (mjm).
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
High purity, crystalline AlN and SiC thin films have been prepared by the chemical vapor deposition of (CH3)2AlN2)3 and (CH3)HSiCH2)3, respectively, at temperatures under 800 C. The use of these 'designed precursors' results in film stoichiometries of nearly one-to-one and the evolution of non-corrosive reaction by-products. In addition, no carrier gas is required. Preliminary studies of the interaction of the (CH3)HSiCH2)3 system with a clean Si(100) surface indicate interesting precursor adsorption and decomposition behavior with epitaxial growth of SiC on Si(100) at or below 700 C. It is anticipated that information from these studies will be used to improve the deposition processes and aid in the design of new precursors. Keywords: Thin films, Aluminum nitride, Silicon carbide, Design precursors, Silicon. (mjm).
CVD of SiC and AIN Thin Films Using Designed Organometallic Precursors
Author: Leonard V. Interrante
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 8
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 8
Book Description
Masters Theses in the Pure and Applied Sciences
Author: Wade H. Shafer
Publisher: Springer Science & Business Media
ISBN: 1461573947
Category : Science
Languages : en
Pages : 430
Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Oata Analysis and Synthesis (CINOAS) * at Purdue. University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dissemination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all con cerned if the printing and distribution of the volumes were handled by an interna tional publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Cor poration of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 33 (thesis year 1988) a total of 13,273 theses titles from 23 Canadian and 1 85 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this important annual reference work. While Volume 33 reports theses submitted in 1988, on occasion, certain univer sities do report theses submitted in previous years but not reported at the time.
Publisher: Springer Science & Business Media
ISBN: 1461573947
Category : Science
Languages : en
Pages : 430
Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Oata Analysis and Synthesis (CINOAS) * at Purdue. University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dissemination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all con cerned if the printing and distribution of the volumes were handled by an interna tional publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Cor poration of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 33 (thesis year 1988) a total of 13,273 theses titles from 23 Canadian and 1 85 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this important annual reference work. While Volume 33 reports theses submitted in 1988, on occasion, certain univer sities do report theses submitted in previous years but not reported at the time.
Chemical Vapor Deposition
Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
The Chemistry of Metal CVD
Author: Toivo T. Kodas
Publisher: John Wiley & Sons
ISBN: 3527615849
Category : Technology & Engineering
Languages : en
Pages : 562
Book Description
High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Publisher: John Wiley & Sons
ISBN: 3527615849
Category : Technology & Engineering
Languages : en
Pages : 562
Book Description
High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Scientific and Technical Aerospace Reports
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704
Book Description
Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition
Author: Theodore M. Besmann
Publisher: The Electrochemical Society
ISBN: 9781566771559
Category : Science
Languages : en
Pages : 922
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771559
Category : Science
Languages : en
Pages : 922
Book Description
Mechanistic Studies of the Chemical Vapor Deposition of Ceramic and Metal Films from Organometallic Precursors
Author: Jinwoo Cheon
Publisher:
ISBN:
Category :
Languages : en
Pages : 302
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 302
Book Description
Chemical Vapor Deposition for Microelectronics
Author: Arthur Sherman
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.