Structural, Dielectric, and Optical Properties of Potassium Tantalate Niobate Thin Films Prepared by Metalorganic Chemical Vapor Deposition PDF Download
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Author: Barbara Michelle Nichols
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Languages : en
Pages :
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The structure-property relations of potassium tantalate niobate (KTaxNb1-xO 3) thin films have been investigated to assess their viability as nonlinear optical materials. Single phase, epitaxial films were deposited by low pressure metalorganic chemical vapor deposition over the entire solid solution range. Under optimized growth conditions, the composition of the films could be controlled within 5 atomic percent.
Author: Barbara Michelle Nichols
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
The structure-property relations of potassium tantalate niobate (KTaxNb1-xO 3) thin films have been investigated to assess their viability as nonlinear optical materials. Single phase, epitaxial films were deposited by low pressure metalorganic chemical vapor deposition over the entire solid solution range. Under optimized growth conditions, the composition of the films could be controlled within 5 atomic percent.
Author: Venkatraman Gopalan
Publisher:
ISBN:
Category :
Languages : en
Pages : 638
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Author: Scott Kie Manlief
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ISBN:
Category : Ferroelectric
Languages : en
Pages : 139
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Author: Scott Kieth Manlief
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Category :
Languages : en
Pages :
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Author: Hilary Beatrix Baumann Cherry
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Category :
Languages : en
Pages : 272
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Author: Huyang Xie
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Category :
Languages : en
Pages : 320
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Author: Robert Edward Fontana
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Category : Integrated optics
Languages : en
Pages : 358
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Author: Chien-Hsiung Peng
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ISBN:
Category : Ferroelectric thin films
Languages : en
Pages : 452
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Author: Polly Wanda Chu
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ISBN:
Category :
Languages : en
Pages : 434
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Book Description
Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.
Author: Nageswara Rao Venkat Muntha
Publisher:
ISBN:
Category :
Languages : en
Pages : 162
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