Sputter Deposition and Thallination of Thallium-barium-calcium- Copper-oxide Superconducting Thin Films PDF Download
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Author: Tushar Heramb Dhayagude
Publisher:
ISBN:
Category : High temperature superconductors
Languages : en
Pages : 196
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Book Description
Author: Tushar Heramb Dhayagude
Publisher:
ISBN:
Category : High temperature superconductors
Languages : en
Pages : 196
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Book Description
Author: Wade H. Shafer
Publisher: Springer Science & Business Media
ISBN: 1461519691
Category : Science
Languages : en
Pages : 426
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Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 38 (thesis year 1993) a total of 13,787 thesis titles from 22 Canadian and 164 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 38 reports theses submitted in 1993, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.
Author: Robert Glenn Florence
Publisher:
ISBN:
Category : Sputtering (Physics)
Languages : en
Pages : 210
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Book Description
Author: Vijay Dattatraya Parkhe
Publisher:
ISBN:
Category :
Languages : en
Pages : 260
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Book Description
Author: Sade H Shafer
Publisher: Springer Science & Business Media
ISBN:
Category : Education
Languages : en
Pages : 440
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Book Description
Cited in Sheehy, Chen, and Hurt . Volume 38 (thesis year 1993) reports a total of 13,787 thesis titles from 22 Canadian and 164 US universities. As in previous volumes, thesis titles are arranged by discipline and by university within each discipline. Any accredited university or college with a grad
Author: Kiyotaka Wasa
Publisher: William Andrew
ISBN: 1437734847
Category : Technology & Engineering
Languages : en
Pages : 657
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Book Description
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Author: Charles Wesley Tanger
Publisher:
ISBN:
Category : High temperature superconductivity
Languages : en
Pages : 198
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 31
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Book Description
Magnetron sputtering deposition is potentially the most economical deposition method for thin films. Presently sputtering can't deposit high temperature superconductors like Yttrium Barium Copper Oxide (YBCO) because of negative oxygen ion bombardment damage. Lowering the plasma discharge voltage to less than 100 volts would decrease such damage and make YBCO economically practical. The goal of this phase I effort was to lower plasma discharge voltages using high magnetic fields. Our results showed that high magnetic fields alone can lower plasma voltages to about 200 volts. Just as important, we showed that plasma impedance was lowered by more than ten times. Low plasma impedance allows high magnetic fields and electron injection into the plasma to be combined to lower plasma voltage to 30 volts. This combination removes the power limitations of electron injection. It should also produce epitaxial quality thin film semiconductors because low voltages allow 'self-bombardment' where the adatoms have the optimum energy to form a crystalline matrix at lower temperatures. The method is also applicable to thin film semiconductors such as II-VI solar cells and III-V films.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
A process for preparing a superconducting film, such as a thallium-barium-calcium-copper oxide superconducting film, having substantially uniform phase development. The process comprises providing an electrodeposition bath having one or more soluble salts of one or more respective potentially superconducting metals in respective amounts adequate to yield a superconducting film upon subsequent appropriate treatment. Should all of the metals required for producing a superconducting film not be made available in the bath, such metals can be a part of the ambient during a subsequent annealing process. A soluble silver salt in an amount between about 0.1% and about 4.0% by weight of the provided other salts is also provided to the bath, and the bath is electrically energized to thereby form a plated film. The film is annealed in ambient conditions suitable to cause formation of a superconductor film. Doping with silver reduces the temperature at which the liquid phase appears during the annealing step, initiates a liquid phase throughout the entire volume of deposited material, and influences the nucleation and growth of the deposited material.
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 496
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Book Description
"Education, arts and social sciences, natural and technical sciences in the United States and Canada".
