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Technology & Engineering
2017-06-26 2017-06-26

Spacer Engineered FinFET Architectures

Author: Sudeb Dasgupta
Publisher: CRC Press
ISBN: 1351751042
Category : Technology & Engineering
Languages : en
Pages : 138

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Book Description
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.