Reflection High-Energy Electron Diffraction and Reflection Electron Imaging of Surfaces PDF Download
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Author: P.K. Larsen
Publisher: Springer Science & Business Media
ISBN: 146845580X
Category : Science
Languages : en
Pages : 526
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Book Description
This volume contains the papers presented at the NATO Advanced Research Workshop in "Reflection High Energy Electron Diffraction and Reflection Electron Imaging of Surfaces" held at the Koningshof conference center, Veldhoven, the Netherlands, June 15-19, 1987. The main topics of the workshop, Reflection High Energy Electron Diffraction (RHEED) and Reflection Electron Microscopy (REM), have a common basis in the diffraction processes which high energy electrons undergo when they interact with solid surfaces at grazing angles. However, while REM is a new technique developed on the basis of recent advances in transmission electron microscopy, RHEED is an old method in surface crystallography going back to the discovery of electron diffraction in 1927 by Davisson and Germer. Until the development of ultra high vacuum techniques in the 1960's made instruments using slow electrons more accessable, RHEED was the dominating electron diffraction technique. Since then and until recently the method of Low Energy Electron Diffraction (LEED) largely surpassed RHEED in popularity in surface studies. The two methods are closely related of course, each with its own specific advantages. The grazing angle geometry of RHEED has now become a very useful feature because this makes it ideally suited for combination with the thin growth technique of Molecular Beam Epitaxy (MBE). This combination allows in-situ studies of freshly grown and even growing surfaces, opening up new areas of research of both fundamental and technological importance.
Author: P.K. Larsen
Publisher: Springer Science & Business Media
ISBN: 146845580X
Category : Science
Languages : en
Pages : 526
Get Book Here
Book Description
This volume contains the papers presented at the NATO Advanced Research Workshop in "Reflection High Energy Electron Diffraction and Reflection Electron Imaging of Surfaces" held at the Koningshof conference center, Veldhoven, the Netherlands, June 15-19, 1987. The main topics of the workshop, Reflection High Energy Electron Diffraction (RHEED) and Reflection Electron Microscopy (REM), have a common basis in the diffraction processes which high energy electrons undergo when they interact with solid surfaces at grazing angles. However, while REM is a new technique developed on the basis of recent advances in transmission electron microscopy, RHEED is an old method in surface crystallography going back to the discovery of electron diffraction in 1927 by Davisson and Germer. Until the development of ultra high vacuum techniques in the 1960's made instruments using slow electrons more accessable, RHEED was the dominating electron diffraction technique. Since then and until recently the method of Low Energy Electron Diffraction (LEED) largely surpassed RHEED in popularity in surface studies. The two methods are closely related of course, each with its own specific advantages. The grazing angle geometry of RHEED has now become a very useful feature because this makes it ideally suited for combination with the thin growth technique of Molecular Beam Epitaxy (MBE). This combination allows in-situ studies of freshly grown and even growing surfaces, opening up new areas of research of both fundamental and technological importance.
Author: Ayahiko Ichimiya
Publisher: Cambridge University Press
ISBN: 9780521453738
Category : Science
Languages : en
Pages : 370
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Book Description
Publisher Description
Author: Zhong Lin Wang
Publisher: Cambridge University Press
ISBN: 0521482666
Category : Science
Languages : en
Pages : 457
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Book Description
A self-contained book on electron microscopy and spectrometry techniques for surface studies.
Author: Wolfgang Braun
Publisher: Springer Science & Business Media
ISBN: 9783540651994
Category : Science
Languages : en
Pages : 240
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Book Description
The book describes RHEED (reflection high-energy electron diffraction) used as a tool for crystal growth. New methods using RHEED to characterize surfaces and interfaces during crystal growth by MBE (molecular beam epitaxy) are presented. Special emphasis is put on RHEED intensity oscillations, segregation phenomena, electron energy-loss spectroscopy and RHEED with rotating substrates.
Author: L.-M. Peng
Publisher: Oxford University Press, USA
ISBN: 9780198500742
Category : Science
Languages : en
Pages : 580
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Book Description
This book is an in-depth treatment of the theoretical background relevant to an understanding of materials that can be obtained by using high-energy electron diffraction and microscopy.
Author: The Surface Science Society of Japan
Publisher: Springer
ISBN: 9811061564
Category : Technology & Engineering
Languages : en
Pages : 807
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Book Description
This book concisely illustrates the techniques of major surface analysis and their applications to a few key examples. Surfaces play crucial roles in various interfacial processes, and their electronic/geometric structures rule the physical/chemical properties. In the last several decades, various techniques for surface analysis have been developed in conjunction with advances in optics, electronics, and quantum beams. This book provides a useful resource for a wide range of scientists and engineers from students to professionals in understanding the main points of each technique, such as principles, capabilities and requirements, at a glance. It is a contemporary encyclopedia for selecting the appropriate method depending on the reader's purpose.
Author: Ernst Bauer
Publisher: Springer
ISBN: 1493909355
Category : Technology & Engineering
Languages : en
Pages : 513
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Book Description
This book, written by a pioneer in surface physics and thin film research and the inventor of Low Energy Electron Microscopy (LEEM), Spin-Polarized Low Energy Electron Microscopy (SPLEEM) and Spectroscopic Photo Emission and Low Energy Electron Microscopy (SPELEEM), covers these and other techniques for the imaging of surfaces with low energy (slow) electrons. These techniques also include Photoemission Electron Microscopy (PEEM), X-ray Photoemission Electron Microscopy (XPEEM), and their combination with microdiffraction and microspectroscopy, all of which use cathode lenses and slow electrons. Of particular interest are the fundamentals and applications of LEEM, PEEM, and XPEEM because of their widespread use. Numerous illustrations illuminate the fundamental aspects of the electron optics, the experimental setup, and particularly the application results with these instruments. Surface Microscopy with Low Energy Electrons will give the reader a unified picture of the imaging, diffraction, and spectroscopy methods that are possible using low energy electron microscopes.
Author: Gertjan Koster
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 295
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Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. - Chapters review electron diffraction techniques, including the methodology for observations and measurements - Discusses the principles and applications of photoemission techniques - Examines alternative in situ characterisation techniques
Author: Claude Weisbuch
Publisher: Springer Science & Business Media
ISBN: 1475700911
Category : Science
Languages : en
Pages : 414
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Book Description
Low-dimensional materials are of fundamental interest in physics and chemistry and have also found a wide variety of technological applica tions in fields ranging from microelectronics to optics. Since 1986, several seminars and summer schools devoted to low-dimensional systems have been supported by NATO. The present one, Physics, Fabrication and Applications of Multilayered structures, brought together specialists from different fields in order to review fabrication techniques, charac terization methods, physics and applications. Artificially layered materials are attractive because alternately layering two (or more) elements, by evaporation or sputtering, is a way to obtain new materials with (hopefully) new physical properties that pure materials or alloys do not allow. These new possibilities can be ob tained in electronic transport, optics, magnetism or the reflectivity of x-rays and slow neutrons. By changing the components and the thickness of the layers one can track continuously how the new properties appear and follow the importance of the multilayer structure of the materials. In addition, with their large number of interfaces the study of inter face properties becomes easier in multilayered structures than in mono layers or bilayers. As a rule, the role of the interface quality, and also the coupling between layers, increases as the thickness of the layer decreases. Several applications at the development stage require layer thicknesses of just a few atomic layers.
Author: S. Amelinckx
Publisher: John Wiley & Sons
ISBN: 3527614559
Category : Technology & Engineering
Languages : en
Pages : 527
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Book Description
Derived from the successful three-volume Handbook of Microscopy, this book provides a broad survey of the physical fundamentals and principles of all modern techniques of electron microscopy. This reference work on the method most often used for the characterization of surfaces offers a competent comparison of the feasibilities of the latest developments in this field of research. Topics include: * Stationary Beam Methods: Transmission Electron Microscopy/ Electron Energy Loss Spectroscopy/ Convergent Electron Beam Diffraction/ Low Energy Electron Microscopy/ Electron Holographic Methods * Scanning Beam Methods: Scanning Transmission Electron Microscopy/ Scanning Auger and XPS Microscopy/ Scanning Microanalysis/ Imaging Secondary Ion Mass Spectrometry * Magnetic Microscopy: Scanning Electron Microscopy with Polarization Analysis/ Spin Polarized Low Energy Electron Microscopy Materials scientists as well as any surface scientist will find this book an invaluable source of information for the principles of electron microscopy.
