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Author: Mehmet C. Öztürk
Publisher: Cambridge University Press
ISBN: 9781107413672
Category : Technology & Engineering
Languages : en
Pages : 422
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Book Description
The MRS proceedings series on rapid thermal processing (RTP) has become the predominant international forum for research in this exciting and fast-growing field. In particular, thisvolume in the series presents work in traditional RTP processes such as dielectric growth, annealing and silicides, as well as developments in novel modelling and integrated processes. Papers on equipment issues illustrate that problems such as temperature uniformity and measurement, traditionally viewed as limitations for RTP technology, are well on the way to being resolved. Manufacturing aspects of RTP and the successful integration of RTP into production semiconductor fabs are also addressed. Topics include: RTP equipment - modelling and new concepts; temperature measurement and control in RTP equipment; MOSFET gate stack engineering; MOSFET channel and source/drain engineering; silicides; and new applications of rapid thermal processing.
Author: Mehmet C. Öztürk
Publisher: Cambridge University Press
ISBN: 9781107413672
Category : Technology & Engineering
Languages : en
Pages : 422
Get Book Here
Book Description
The MRS proceedings series on rapid thermal processing (RTP) has become the predominant international forum for research in this exciting and fast-growing field. In particular, thisvolume in the series presents work in traditional RTP processes such as dielectric growth, annealing and silicides, as well as developments in novel modelling and integrated processes. Papers on equipment issues illustrate that problems such as temperature uniformity and measurement, traditionally viewed as limitations for RTP technology, are well on the way to being resolved. Manufacturing aspects of RTP and the successful integration of RTP into production semiconductor fabs are also addressed. Topics include: RTP equipment - modelling and new concepts; temperature measurement and control in RTP equipment; MOSFET gate stack engineering; MOSFET channel and source/drain engineering; silicides; and new applications of rapid thermal processing.
Author: Materials Research Society
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 432
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Book Description
Author: Fred Roozeboom
Publisher: The Electrochemical Society
ISBN: 9781566772327
Category : Technology & Engineering
Languages : en
Pages : 470
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Book Description
Author:
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 914
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Book Description
Author: John D. Cressler
Publisher: CRC Press
ISBN: 1351834797
Category : Technology & Engineering
Languages : en
Pages : 373
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Book Description
What seems routine today was not always so. The field of Si-based heterostructures rests solidly on the shoulders of materials scientists and crystal growers, those purveyors of the semiconductor “black arts” associated with the deposition of pristine films of nanoscale dimensionality onto enormous Si wafers with near infinite precision. We can now grow near-defect free, nanoscale films of Si and SiGe strained-layer epitaxy compatible with conventional high-volume silicon integrated circuit manufacturing. SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices tells the materials side of the story and details the many advances in the Si-SiGe strained-layer epitaxy for device applications. Drawn from the comprehensive and well-reviewed Silicon Heterostructure Handbook, this volume defines and details the many advances in the Si/SiGe strained-layer epitaxy for device applications. Mining the talents of an international panel of experts, the book covers modern SiGe epitaxial growth techniques, epi defects and dopant diffusion in thin films, stability constraints, and electronic properties of SiGe, strained Si, and Si-C alloys. It includes appendices on topics such as the properties of Si and Ge, the generalized Moll-Ross relations, integral charge-control relations, and sample SiGe HBT compact model parameters.
Author: Dim-Lee Kwong
Publisher: The Electrochemical Society
ISBN: 9781566773157
Category : Technology & Engineering
Languages : en
Pages : 458
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Book Description
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Author: Arthur H. Heuer
Publisher:
ISBN:
Category : Microelectromechanical systems
Languages : en
Pages : 274
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Book Description
Author:
Publisher:
ISBN:
Category : Inorganic compounds
Languages : en
Pages : 568
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Book Description
Author: Thomas Neenan
Publisher:
ISBN:
Category : Animal cell biotechnology
Languages : en
Pages : 400
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Book Description
Author: Terry M. Tritt
Publisher:
ISBN:
Category : Electric power production
Languages : en
Pages : 552
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Book Description
This volume, the 3rd in a series from the Materials Research Society, examines the current state of the art in thermoelectric materials research. The focus is on both the scientific capabilities currently employed, and those which are needed to provide new classes of thermoelectric materials with significant enhancement in the figure of merit, Z (100% or greater). This is a challenge for the thermoelectrics community, and thus drives the discussion towards new and innovative directions. Potential applications for thermoelectric technologies are discussed, with emphasis on typing specific materials properties/issues to the desired applications. Overviews of current application needs from thermoelectric devices, and thus the requirements for new materials or device design, are also featured. The volume is multidisciplinary in nature, with representation from the fields of physics, chemistry and materials science. Theoretical studies are presented, as well as experimental efforts in solid-state synthesis, new bulk materials, think-film and superlattice development, nanostructure materials, and new developments in property measurement, especially thermal conductivity.
