Rapid Thermal and Integrated Processing, II, Symposium Held 1993, San Francisco, California, U.S.A. PDF Download
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Author: Materials Research Society
Publisher:
ISBN:
Category :
Languages : en
Pages : 424
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Book Description
Author: Materials Research Society
Publisher:
ISBN:
Category :
Languages : en
Pages : 424
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Book Description
Author: Jeffrey C. Gelpey
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 448
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author:
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 434
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Book Description
Author: Materials Research Society
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 432
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Book Description
Author: Jeffrey C. Gelpey
Publisher: Cambridge University Press
ISBN: 9781107409491
Category : Technology & Engineering
Languages : en
Pages : 444
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Jeffrey C. Gelpey
Publisher: Cambridge University Press
ISBN: 9781558991187
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: British Library. Document Supply Centre
Publisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 870
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: Kokuritsu Kokkai Toshokan (Japan)
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1596
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Book Description
Author: Michael Liehr
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 440
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Book Description
Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
