Author: Theodore T. Pekny
Publisher:
ISBN:
Category :
Languages : en
Pages : 138

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Author: Robert Eason
Publisher: John Wiley & Sons
ISBN: 0470052112
Category : Science
Languages : en
Pages : 754

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Book Description
Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Author: Blaine D. Johs
Publisher:
ISBN:
Category :
Languages : en
Pages : 104

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Author: Kenneth Scott
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Author: Dušan Kopecký
Publisher:
ISBN: 9781612096230
Category : Conducting polymers
Languages : en
Pages : 0

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Book Description
The development of new types of electronic devices based on conductive polymers requires precise and controlled deposition of these materials in thin layers. This book examines the latest results in research of deposition of polypyrrole (PPY) thin films by advanced method - Matrix Assisted Pulsed Laser Evaporation (MAPLE). It also provides a brief survey of the laser deposition of conductive polymers, theoretical analysis of the mechanisms of deposition by MAPLE method, definition of both source-PPY properties and deposition conditions necessary for successful thin layer fabrication.

Author: Hui Fang
Publisher:
ISBN:
Category : Indium compounds
Languages : en
Pages : 150

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Book Description

Author:
Publisher: Allied Publishers
ISBN: 9788177643787
Category : Lasers
Languages : en
Pages : 680

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Book Description

Author: Anna Infortuna
Publisher:
ISBN:
Category :
Languages : en
Pages : 190

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Author: Chenglin Chen
Publisher:
ISBN:
Category : Calorimeters
Languages : en
Pages : 144

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Author: Yilu Li
Publisher:
ISBN:
Category : Electronic dissertations
Languages : en
Pages : 97

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Book Description
Pulsed ultraviolet light from a XeF excimer laser was used to grow thin films of zinc oxide and tin dioxide on (111) p-type silicon wafers within a versatile high vacuum laser deposition system. This pulsed laser deposition system was self-designed and self-built. Parameters such as pressure, target temperature, and distance from the target to the substrate can be adjusted in the system. Scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction spectroscopy, Raman spectroscopy and ellipsometry were used to analyze the structures and properties of ZnO and SnO2 thin films. The critical temperature required to fabricate a crystalline ZnO thin film by pulsed laser deposition was found and has been confirmed. For the SnO2 thin film, the critical temperature required to generate a crystalline structure could not be found because of the temperature limit of the substrate heater used in the experiment. In SnO2 thin films, thermal annealing has been used to convert into crystalline structure with (110), (101) and (211) orientations. After fabricating the amorphous SnO2 thin films, they were put into an oven with specific temperatures to anneal them. The minimum annealing temperature range was found for converting the amorphous SnO2 thin films into SnO2 thin films with a crystalline structure. Thermal annealing has also been applied to some amorphous ZnO thin films which were fabricated under the critical temperature required to produce crystalline ZnO thin films. The minimum annealing temperature range for amorphous ZnO thin films was found and only one orientation (002) shown after annealing. Laser annealing technology has also been applied for converting both amorphous ZnO and SnO2 thin films, and results show that this method was not well suited for this attempt. ZnO thin films and SnO2 thin films with a crystalline structure have inportant widely used in industry, for example, application in devices such as solar cells and UV or blue-light-emitting devices. The aim of this research is to help improving the manufacturing process of ZnO and SnO2 thin films.