Author: S. M. Silverman
Publisher:
ISBN:
Category : Ionization of gases
Languages : en
Pages : 36
Book Description
Processes for the Production and Removal of Electrons and Negative Ions in Gases
Author: S. M. Silverman
Publisher:
ISBN:
Category : Ionization of gases
Languages : en
Pages : 36
Book Description
Publisher:
ISBN:
Category : Ionization of gases
Languages : en
Pages : 36
Book Description
GRD Research Notes
Author: Air Force Cambridge Research Laboratories (U.S.). Geophysics Research Directorate
Publisher:
ISBN:
Category : Geophysics
Languages : en
Pages : 36
Book Description
Publisher:
ISBN:
Category : Geophysics
Languages : en
Pages : 36
Book Description
Fundamental Electron Interactions with Plasma Processing Gases
Author: Loucas G. Christophorou
Publisher: Springer Science & Business Media
ISBN: 1441989714
Category : Science
Languages : en
Pages : 791
Book Description
This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.
Publisher: Springer Science & Business Media
ISBN: 1441989714
Category : Science
Languages : en
Pages : 791
Book Description
This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.
Advances in Atomic, Molecular, and Optical Physics
Author:
Publisher: Elsevier
ISBN: 0080526055
Category : Science
Languages : en
Pages : 329
Book Description
This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such asatmospheric science, astrophysics, surface physics, and laser physics. Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments.
Publisher: Elsevier
ISBN: 0080526055
Category : Science
Languages : en
Pages : 329
Book Description
This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such asatmospheric science, astrophysics, surface physics, and laser physics. Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments.
Nuclear Science Abstracts
Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 978
Book Description
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 978
Book Description
Journal of Research
Author: United States. National Bureau of Standards
Publisher:
ISBN:
Category : Radio
Languages : en
Pages : 934
Book Description
Publisher:
ISBN:
Category : Radio
Languages : en
Pages : 934
Book Description
Handbook of Ion Sources
Author: Bernhard Wolf
Publisher: CRC Press
ISBN: 9780849325021
Category : Technology & Engineering
Languages : en
Pages : 558
Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Publisher: CRC Press
ISBN: 9780849325021
Category : Technology & Engineering
Languages : en
Pages : 558
Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Monthly Catalog of United States Government Publications
Author:
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages :
Book Description
Electron-Emission Gas Discharges
Author:
Publisher:
ISBN:
Category : Electric discharge through gases
Languages : en
Pages : 668
Book Description
Publisher:
ISBN:
Category : Electric discharge through gases
Languages : en
Pages : 668
Book Description
Fundamental processes of plasma and reactive gas surface treatment for the recovery of hydrogen isotopes from carbon co-deposits in fusion devices
Author: Sören Möller
Publisher: Forschungszentrum Jülich
ISBN: 3893369775
Category :
Languages : en
Pages : 107
Book Description
Publisher: Forschungszentrum Jülich
ISBN: 3893369775
Category :
Languages : en
Pages : 107
Book Description