Author: L. B. Rothman
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 288
Book Description
Proceedings of the Symposium on Multilevel Metallization, Interconnection, and Contact Technologies
Author: L. B. Rothman
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 288
Book Description
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 288
Book Description
Proceedings of the ... International Symposium on Semiconductor Wafer Bonding
Author:
Publisher:
ISBN:
Category : Semiconductor wafers
Languages : en
Pages : 524
Book Description
Publisher:
ISBN:
Category : Semiconductor wafers
Languages : en
Pages : 524
Book Description
Proceedings of the Symposium on Interconnect and Contact Metallization
Author: Harzara S. Rathore
Publisher: The Electrochemical Society
ISBN: 9781566771849
Category : Computers
Languages : en
Pages : 292
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771849
Category : Computers
Languages : en
Pages : 292
Book Description
Proceedings of the Symposia on Interconnects, Contact Metallization, and Multilevel Metallization and Reliability for Semiconductor Devices, Interconnects, and Thin Insulator Materials
Author: T. O. Herndon
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 520
Book Description
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 520
Book Description
Proceedings of the Symposium on High Voltage and Smart Power ICs
Author: Muhammed Ayman Shibib
Publisher:
ISBN:
Category : High voltages
Languages : en
Pages : 562
Book Description
Publisher:
ISBN:
Category : High voltages
Languages : en
Pages : 562
Book Description
Proceedings of the Symposia on Reliability of Semiconductor Devices and Interconnection and Multilevel Metallization, Interconnection, and Contact Technologies
Author: Harzara S. Rathore
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 516
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 516
Book Description
Proceedings .... International IEEE VLSI Multilevel Interconnection Conference
Author:
Publisher:
ISBN:
Category : Hybrid integrated circuits
Languages : en
Pages : 530
Book Description
Publisher:
ISBN:
Category : Hybrid integrated circuits
Languages : en
Pages : 530
Book Description
Proceedings
Author:
Publisher:
ISBN:
Category : Electronic apparatus and appliances
Languages : en
Pages : 572
Book Description
Publisher:
ISBN:
Category : Electronic apparatus and appliances
Languages : en
Pages : 572
Book Description
Advanced CMOS Process Technology
Author: J Pimbley
Publisher: Elsevier
ISBN: 0323156800
Category : Technology & Engineering
Languages : en
Pages : 305
Book Description
Advanced CMOS Process Technology is part of the VLSI Electronics Microstructure Science series. The main topic of this book is complementary metal-oxide semiconductor or CMOS technology, which plays a significant part in the electronics systems. The topics covered in this book range from metallization, isolation techniques, reliability, and yield. The volume begins with an introductory chapter that discusses the microelectronics revolution of the 20th century. Then Chapter 2 puts focus on the CMOS devices and circuit background, discussing CMOS capacitors and field effect transistors. Metallization topics and concepts are covered in Chapter 3, while isolation techniques are tackled in Chapter 4. Long-term reliability of CMOS is the topic covered in Chapter 5. Finally, the ability of semiconductor technology to yield circuits is discussed in Chapter 6. The book is particularly addressed to engineers, scientists, and technical managers.
Publisher: Elsevier
ISBN: 0323156800
Category : Technology & Engineering
Languages : en
Pages : 305
Book Description
Advanced CMOS Process Technology is part of the VLSI Electronics Microstructure Science series. The main topic of this book is complementary metal-oxide semiconductor or CMOS technology, which plays a significant part in the electronics systems. The topics covered in this book range from metallization, isolation techniques, reliability, and yield. The volume begins with an introductory chapter that discusses the microelectronics revolution of the 20th century. Then Chapter 2 puts focus on the CMOS devices and circuit background, discussing CMOS capacitors and field effect transistors. Metallization topics and concepts are covered in Chapter 3, while isolation techniques are tackled in Chapter 4. Long-term reliability of CMOS is the topic covered in Chapter 5. Finally, the ability of semiconductor technology to yield circuits is discussed in Chapter 6. The book is particularly addressed to engineers, scientists, and technical managers.
Index of Conference Proceedings
Author: British Library. Document Supply Centre
Publisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 836
Book Description
Publisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 836
Book Description