Preparation and Characterization of Thin Films of Alumina by Metalorganic Chemical Vapor Deposition PDF Download
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Author: J. Fournier
Publisher:
ISBN:
Category :
Languages : en
Pages : 11
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Book Description
A simple novel horizontal reactor was used to prepare 2000 angstrom films of alumina on silicon substrates by the thermal decomposition of aluminum tri isopropoxide at temperatures between 350 and 500 C. The films were annealed in oxygen to test suitability towards shrinkage and were characterized as to porosity, the presence of OH absorption bands in the infrared transmittance spectra and breakdown voltage. Keywords: Material index; Alumina tri-isopropoxide; Silicon.
Author: J. Fournier
Publisher:
ISBN:
Category :
Languages : en
Pages : 11
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Book Description
A simple novel horizontal reactor was used to prepare 2000 angstrom films of alumina on silicon substrates by the thermal decomposition of aluminum tri isopropoxide at temperatures between 350 and 500 C. The films were annealed in oxygen to test suitability towards shrinkage and were characterized as to porosity, the presence of OH absorption bands in the infrared transmittance spectra and breakdown voltage. Keywords: Material index; Alumina tri-isopropoxide; Silicon.
Author: Kenneth Michael Gustin
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 656
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Author: Cristian Antonio Soto Lenz
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 368
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Author: Mark Joseph Waner
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 178
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Author: William Joseph DeSisto
Publisher:
ISBN:
Category :
Languages : en
Pages : 242
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Author: Tyau-Jeen Lin
Publisher:
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Category :
Languages : en
Pages : 160
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Author:
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Category : Aeronautics
Languages : en
Pages : 704
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Author: Siddhartha Kumar Pradhan
Publisher:
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Category :
Languages : en
Pages : 304
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Author: Panagiotis Dimitrakis
Publisher: Elsevier
ISBN: 0128146303
Category : Technology & Engineering
Languages : en
Pages : 534
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Book Description
Metal Oxides for Non-volatile Memory: Materials, Technology and Applications covers the technology and applications of metal oxides (MOx) in non-volatile memory (NVM) technology. The book addresses all types of NVMs, including floating-gate memories, 3-D memories, charge-trapping memories, quantum-dot memories, resistance switching memories and memristors, Mott memories and transparent memories. Applications of MOx in DRAM technology where they play a crucial role to the DRAM evolution are also addressed. The book offers a broad scope, encompassing discussions of materials properties, deposition methods, design and fabrication, and circuit and system level applications of metal oxides to non-volatile memory. Finally, the book addresses one of the most promising materials that may lead to a solution to the challenges in chip size and capacity for memory technologies, particular for mobile applications and embedded systems. - Systematically covers metal oxides materials and their properties with memory technology applications, including floating-gate memory, 3-D memory, memristors, and much more - Provides an overview on the most relevant deposition methods, including sputtering, CVD, ALD and MBE - Discusses the design and fabrication of metal oxides for wide breadth of non-volatile memory applications from 3-D flash technology, transparent memory and DRAM technology
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 556
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Book Description
