Solid Freeform and Additive Fabrication - 2000: Volume 625

Solid Freeform and Additive Fabrication - 2000: Volume 625 PDF Author: Stephen C. Danforth
Publisher: Mrs Proceedings
ISBN:
Category : Computers
Languages : en
Pages : 240

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Solid Freeform and Additive Fabrication - 2000: Volume 625

Solid Freeform and Additive Fabrication - 2000: Volume 625 PDF Author: Stephen C. Danforth
Publisher: Mrs Proceedings
ISBN:
Category : Computers
Languages : en
Pages : 240

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Magnetic Materials, Processes, and Devices VI

Magnetic Materials, Processes, and Devices VI PDF Author:
Publisher: The Electrochemical Society
ISBN: 9781566772969
Category : Magnetic disks
Languages : en
Pages : 636

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Book Description


Polycrystalline Metal and Magnetic Thin Films 2000:

Polycrystalline Metal and Magnetic Thin Films 2000: PDF Author: Bruce M. Clemens
Publisher: Cambridge University Press
ISBN: 9781107413122
Category : Technology & Engineering
Languages : en
Pages : 204

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Book Description
The unprecedented growth in the semiconductor, electronics, and storage industries is the result of continued miniaturization of circuit devices, increases in chip functionality, and increased storage capacity and performance, along with a decrease in per-function cost. Hardware shrinkage has taken place leading to similar decreases in the dimensions of interconnection wires, contact metallization, and magnetic storage footprints. The important role of surfaces, interfaces, defects, and impurities has raised serious materials questions about how to control the properties of polycrystalline thin films used in applications requiring tight performance tolerances and the understanding of these, during the evolution of various film properties with time and temperature, is critical to the successful design and development of smaller devices. This book, first published in 2001, focuses on the directions taken to understand and control the properties of polycrystalline materials. Topics include: magnetic thin films and structures; polycrystalline metal films - microstructure and grain evolution and stress and mechanical properties of thin films.

Magnetic Materials, Structures and Processing for Information Storage: Volume 614

Magnetic Materials, Structures and Processing for Information Storage: Volume 614 PDF Author: Materials Research Society. Fall Meeting
Publisher:
ISBN:
Category : Computers
Languages : en
Pages : 200

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Thermoelectric Materials 2000 - The Next Generation Materials for Small-Scale Refrigeration and Power Generation Applications: Volume 626

Thermoelectric Materials 2000 - The Next Generation Materials for Small-Scale Refrigeration and Power Generation Applications: Volume 626 PDF Author: Terry M. Tritt
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 434

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Book Description
The presentations from the symposium are grouped into the following topics: skutterudites, superlattice, new materials, quantum wires and dots, half-heusler alloys and quasicrystals, TE theory, thermionics, clathrates, and thin films TE. In addition, poster sessions include the following: semiconductors with tetrahedral anions as potential thermoelectric materials, lattice dynamics study of anisotropic heat conduction in supperlattices, structure and thermoelectric properties of new quaternary tin and lead Bismuth selenides, attributes of the Seebeck coefficient of Bismuth microwire array composites, and High-Z Lanthanum-Cerium Hexaborate thin films for low-temperature applications. c. Book News Inc.

Atomic Layer Deposition Applications 2

Atomic Layer Deposition Applications 2 PDF Author: Ana Londergan
Publisher: The Electrochemical Society
ISBN: 1566775426
Category : Atomic layer deposition
Languages : en
Pages : 300

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Book Description
This issue gives an overview of the cutting edge research in the various areas where Atomic Layer Deposition (ALD) can be used, enabling the identification of issues, challenges, and areas where further research is needed. Contributions include: Memory applications, Interconnects and contacts, ALD Productivity enhancement and precursor development, ALD for optical and photonic applications, and Applications in other areas, such as MEMs, nanotechnology, fabrication of sensors and catalysts, etc.

The Granular State: Volume 627

The Granular State: Volume 627 PDF Author: Surajit Sen
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 338

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Book Description
These 38 papers from the April 2000 symposium study granular structure, granular flows, nonlinear waves in granular media, vibrated and rotated granular media, and stress distributions. Topics include jamming in liquids and granular materials, nuclear magnetic resonance studies of granular flows, the blueprint of a concept for a nozzle- free inkjet printer, mixing and segregation processes in a Turbula blender, persistence of granular structure during die compaction of ceramic powders, and humidity-induced cohesion effects in granular media. c. Book News Inc.

Molecular Electronics: Volume 582

Molecular Electronics: Volume 582 PDF Author: Sokrates T. Pantelides
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 144

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Characterization and Measurement of Magnetic Materials

Characterization and Measurement of Magnetic Materials PDF Author: Fausto Fiorillo
Publisher: Academic Press
ISBN: 0080528929
Category : Technology & Engineering
Languages : en
Pages : 667

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Book Description
Correct and efficient measurements are vital to the understanding of materials properties and applications. This is especially so for magnetic materials for which in last twenty years, our understanding and use have changed dramatically. New or improved materials have been created and have reached the market. The Soft amorphous alloys, the Fe-based rare-earth magnets and the giant magnetorestrictive and magnetoresistive materials have all posed challenges to measurement. At the same time new digital measurement techniques have forced a change in laboratory and commercial measuring setups. A revision of measuring standards also occurred in the 1990s with the result that there is now a lack of up-to-date works on the measurement of magnetic materials. The basic objective of this work is to provide a comprehensive overview of the properties of the hard and soft magnetic materials relevant to applications and of thoroughly discussing the modern methodologies for employed in the measurement of these properties. The balance of these topics results in a complete text on the topic, which will be invaluable to researchers, students and practitioners in industry. It will be of significant interest not only to scientists working in the fields of power engineering and materials science but also to specialists in measurement who be able to easily find all the information they need. - Comprehensive overview of the properties of the hard and soft magnetic materials - Provides applications and discusses thoroughly the modern methodologies for employed in the measurement of these properties - Provides the latest up-to-date works on the measurement of magnetic materials

Si Front End Processing - Physics and Technology II of Dopant-Defect Interactions II: Volume 610

Si Front End Processing - Physics and Technology II of Dopant-Defect Interactions II: Volume 610 PDF Author: Aditya Agarwal
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 448

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Book Description
This proceedings of the April 2000 symposium deals with formation of electrical junctions in the front-end processing of devices for the approaching end-of-the-roadmap. The 60 papers address 2D dopant characterization, ion implantation and shallow junction technology, group III diffusion and activation, carbon diffusion and activation, group V diffusion and activation, vacancy-type defects, regrown amorphous layers, and structure and properties of point and extended defects. Topics include ultra-shallow junction formation and gate activation in deep-submicron CMOS, low energy implantation of boron with decaborane ions, modeling ramp rate effects on shallow junction formation, clustering equilibrium and deactivation kinetics in As doped silicon, and atomistic modeling of complex silicon processing scenarios. c. Book News Inc.