Author: Joseph Edward Schoenholtz
Publisher:
ISBN:
Category :
Languages : en
Pages : 390
Book Description
Plasma-enhanced Chemical Vapor Deposition of Silicon Oxynitrides
Author: Joseph Edward Schoenholtz
Publisher:
ISBN:
Category :
Languages : en
Pages : 390
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 390
Book Description
Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source
Author: Giridhar Nallapati
Publisher:
ISBN:
Category :
Languages : en
Pages : 108
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 108
Book Description
Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Silicon Nitride
Author: William H. Ritchie
Publisher:
ISBN:
Category : Plasma (Ionized gases)
Languages : en
Pages : 118
Book Description
Publisher:
ISBN:
Category : Plasma (Ionized gases)
Languages : en
Pages : 118
Book Description
Thermal and Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films
Author: Sui-Yuan Lynn
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 212
Book Description
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 212
Book Description
Study of Plasma-enhanced Chemical Vapor Deposition of Silicon Thin Films
Author: Guanghui Yao
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 148
Book Description
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 148
Book Description
Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films
Author: DW. Hess
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 8
Book Description
The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 8
Book Description
The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (
Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films
Author: Kevin John Grannen
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Plasma Enhanced Chemical Vapor Deposition of Silicon Oxycarbide Thin Films
Author: Gina Marie Buccellato
Publisher:
ISBN:
Category :
Languages : en
Pages : 230
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 230
Book Description
Deposition of Fluorinated Silicon Nitride Using Plasma Enhanced Chemical Vapor Deposition
Author: Mohammad Ibrahim Khan
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 334
Book Description
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 334
Book Description
Remote plasma enhanced chemical vapor deposition of silicon on silicon
Author: Brian George Anthony
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 172
Book Description
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 172
Book Description