Author: Richard H. Huddlestone
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 650

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Book Description

Author: I. H. Hutchinson
Publisher: Cambridge University Press
ISBN: 9780521675741
Category : Science
Languages : en
Pages : 460

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Book Description
This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.

Author: Orlando Auciello
Publisher: Academic Press
ISBN: 1483216241
Category : Science
Languages : en
Pages : 470

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Book Description
Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well as Langmuir probes. The text also describes the mass spectroscopy of plasmas, microwave diagnostics, paramagnetic resonance diagnostics, and diagnostics in thermal plasma processing. Electrical engineers, nuclear engineers, microwave engineers, chemists, and technical personnel in universities, industry, and national laboratories will find the book invaluable.

Author: Kenneth J. H. Phillips
Publisher: Cambridge University Press
ISBN: 0521841607
Category : Science
Languages : en
Pages : 0

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Book Description
This book explores features of the Sun's atmosphere, for graduate students/researchers in astrophysics and solar physics.

Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Category : Technology & Engineering
Languages : en
Pages : 664

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Book Description
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Author: I. Podgornyi
Publisher: Springer Science & Business Media
ISBN: 1468407244
Category : Science
Languages : en
Pages : 225

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Book Description
The present volume is essentially a qualitative survey of modern trends in the diagnostics of high-temperature plasmas, with particular orientation toward laboratory plasmas of interest in connection with research in controlled thermonuclear fusion. Among the broad topics considered are probe diagnostics, optical methods (including the use of lasers and holography), microwave diagnostics, and diagnostics with particle beams. Having infor mation on these methods available in compact form and in one place, as is the case in the present volume, should make it pos sible to evaluate different diagnostic approaches to specific prob lems. The volume will be useful as an introduction for advanced students making their first contact with experimental plasma physics and for physicists and engineers who are entering the field and desire a rapid survey of principles and modern trends in the diagnostics of high-temperature plasmas. v Foreword to the American Edition The material in this book is based on lectures given at Mos cow State University. It is intended to acquaint the reader with the basic aspects of plasma diagnostics and contains information re quired for the experimental physicist who wishes to carry out straightforward measurements of laboratory plasmas. It will be evident that in choosing the material we have been guided pri marily by the scientific interests of the author, and the great bulk of the material is based on work carried out in the USSR.

Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88

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Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.

Author: NN Misra
Publisher: Academic Press
ISBN: 012801489X
Category : Technology & Engineering
Languages : en
Pages : 382

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Book Description
Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications. Food scientists and food engineers interested in understanding the theory and application of nonthermal plasma for food will find this book valuable because it provides a roadmap for future developments in this emerging field. This reference is also useful for biologists, chemists, and physicists who wish to understand the fundamentals of plasma physics, chemistry, and technology and their biological interactions through applying novel plasma sources to food and other sensitive biomaterials. Examines the topic of cold plasma technology for food applications Demonstrates state-of-the-art developments in plasma technology and potential solutions to improve food safety and quality Presents a solid introduction for readers on the topics of plasma physics and chemistry that are required to understand biological applications for foods Serves as a roadmap for future developments for food scientists, food engineers, and biologists, chemists, and physicists working in this emerging field

Author: Hans-Joachim Kunze
Publisher: Springer Science & Business Media
ISBN: 3642022332
Category : Science
Languages : en
Pages : 242

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Book Description
Although based on lectures given for graduate students and postgraduates starting in plasma physics, this concise introduction to the fundamental processes and tools is as well directed at established researchers who are newcomers to spectroscopy and seek quick access to the diagnostics of plasmas ranging from low- to high-density technical systems at low temperatures, as well as from low- to high-density hot plasmas. Basic ideas and fundamental concepts are introduced as well as typical instrumentation from the X-ray to the infrared spectral regions. Examples, techniques and methods illustrate the possibilities. This book directly addresses the experimentalist who actually has to carry out the experiments and their interpretation. For that reason about half of the book is devoted to experimental problems, the instrumentation, components, detectors and calibration.

Author: Da Ruan
Publisher: World Scientific
ISBN: 9812799478
Category : Computers
Languages : en
Pages : 1201

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Book Description
FLINS, originally an acronym for Fuzzy Logic and Intelligent Technologies in Nuclear Science, is now extended to Computational Intelligence for applied research. The contributions to the eighth edition in the series of FLINS conferences cover state-of-the-art research, development, and technology for computational intelligence systems in general, and for intelligent decision and control in particular.